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IDW '13 proceedings of the International Display Workshops volume 20

映像情報メディア学会

詳細情報

タイトル IDW '13 proceedings of the International Display Workshops
著者標目 映像情報メディア学会
出版地(国名コード) JP
出版地[Tokyo]
出版社The Institute of Image Information and Television Engineers
出版年月日等 2013.12
大きさ、容量等 CD-ROM 1枚 ; 12cm
注記 会期・会場: December 4-6, 2013 Sapporo Convention Center
注記 共同刊行: The Society for Information Display
注記 資料種別 : [電子資料]
注記 電子的内容 : テキスト・データ
注記 PDF形式
注記 システム要件 : PDF viewer (Adobe Reader, etc.)
ISSN 18832504
JP番号 22369625
ISSN-L 18832490
巻次 volume 20
出版年(W3CDTF) 2013
NDLC YH245
対象利用者 一般
資料の種別 電子資料
資料の種別 DVD・CD
資料の種別 文書データ
言語(ISO639-2形式) eng : English

目次
 

  • IDW '13 proceedings of the International Display Workshops. volume 20. 
  • IDW'13 December 4-6, 2013Sapporo Convention Center, Sapporo, Japan
  • Special Topics of Interest on Oxide TFT
  • FMC3: Oxide TFT : Process Technologies
  • Thu., Dec. 5 9:00-10:20 Main Hall A
  • Chair: T. Kamiya (Tokyo Inst. of Tech., Japan)Co-Chair: T. Arikado (Tokyo Electron, Japan)
  • FMC3-1 Invited Structural Relaxation, Crystallization, and Defect Passivation in Amorphous In-Ga-Zn-O T. Kamiya (Tokyo Inst. of Tech., Japan),K. Ide (Tokyo Inst. of Tech., Japan),K. Nomura (Tokyo Inst. of Tech., Japan),H. Kumomi (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • FMC3-2 Wet Chemical, Damage Free In-Ga-Zn-O TFT Processin P. Vermeulen (Sachem, USA),P. Janssen (Sachem, USA),L. Robichaux (Sachem, USA),C. Allen (Sachem, USA)
  • FMC3-3 In-Line Process Monitoring for Amorphous Oxide SemiconductorTFT Fabrication Using Microwave-Detected Photoconductivity Decay Technique H. Goto (Kobe Steel, Japan),H. Tao (Kobe Steel, Japan),S. Morita (Kobe Steel, Japan),Y. Takahashi (Kobe Steel, Japan),A. Hino (Kobe Steel, Japan),T. Kishi(Kobelco Res. Inst., Japan),M. Ochi (Kobe Steel, Japan),K. Hayashi (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan)
  • FMC3-4 Manufacturing Process of Oxide TFT Using Solution-Processed Photosensitive Passivation Layer M. Takeshita (ZEON, Japan),S. Abe (ZEON, Japan),T. Kojiri (ZEON, Japan),M. Hanmura (ZEON, Japan),T. Goto (Tohoku Univ., Japan),T. Ohmi(Tohoku Univ., Japan)
  • AMD2: Oxide TFT: Applications
  • Thu., Dec. 5 10:40-12:25 Main Hall B
  • Chair: M. Wong (Hong Kong Univ. of S&T, Hong Kong)Co-Chair: N. Morosawa (Sony, Japan)
  • AMD2-1 Invited 65-in. OLED TV Developed by Oxide TFT and Fine Metal Mask Technologies L.-F. Lin (AU Optronics, Taiwan),T.-H. Shih (AU Optronics, Taiwan),J.-Y. Lee (AU Optronics, Taiwan),W.-H. Wu (AU Optronics, Taiwan),S.-C. Wang (AU Optronics, Taiwan),Y.-H. Chen (AU Optronics, Taiwan),C.-C. Chen (AU Optronics, Taiwan),C.-L. Chen (AU Optronics, Taiwan),P. P. Lin (AU Optronics, Taiwan),Y.-H. Chen (AU Optronics, Taiwan),S.-J. Yu (AU Optronics, Taiwan),C.-H. Liu (AU Optronics, Taiwan),H.-C. Ting (AU Optronics, Taiwan),H.-H. Lu (AU Optronics, Taiwan),L. Tsai (AU Optronics, Taiwan),H.-S. Lin (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan),L.-H. Chang (AU Optronics, Taiwan),Y.-H. Lin (AU Optronics, Taiwan)
  • AMD2-2 Invited Flexible AMOLED Display Driven by Amorphous InGaZnO TFTs K. Miura (Toshiba, Japan),T. Ueda (Toshiba, Japan),N. Saito (Toshiba, Japan),S. Nakano (Toshiba, Japan),T. Sakano (Toshiba, Japan),H. Yamaguchi (Toshiba, Japan),I. Amemiya (Toshiba, Japan)
  • AMD2-3 12.1-in. WXGA Plastic AMLCDs Driven by Low Temperature Amorphous IGZO TFTs S.-Y. Sun (AU Optronics, Taiwan),W.-C. Huang (AU Optronics, Taiwan),W.-T. Lin (AU Optronics, Taiwan),L.-Y. Lin (AU Optronics, Taiwan),C.-C. Cheng (AU Optronics, Taiwan),C.-Y. Liu (AU Optronics, Taiwan),M.-F. Chiang (AU Optronics, Taiwan)
  • AMD2-4 A Novel Embedded Non-Volatile Memory Utilizing IGZO Conductor Transformation for System-on-Glass Application N. Ueda (Sharp, Japan),S. Katoh (Sharp, Japan),T. Matsuo (Sharp, Japan)
  • AMD2-5L Electron-Beam-Induced Crystallization of Amorphous In-Ga-Zn-O Thin Films Fabricated by UHV Sputtering T. Kamiya (Tokyo Inst. of Tech., Japan),K. Kimoto (NIMS, Japan),N. Ohashi (Tokyo Inst. of Tech., Japan, NIMS, Japan),K. Abe (Tokyo Inst. of Tech., Japan),Y. Hanyu (Tokyo Inst. of Tech., Japan),H. Kumomi (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • AMD3: Oxide TFT: Reliability (1)
  • Thu., Dec. 5 13:30-14:55 Main Hall B
  • Chair: B. D. Ahn (Samsung Display, Korea)Co-Chair: H. Hamada, (Kinki Univ., Japan)
  • AMD3-1 Invited Photo-Bias Instability of Metal Oxide Thin Film Transistors for Next Generation Active Matrix Display J. K. Jeong (Inha Univ., Korea),J. H. Song (Inha Univ., Korea)
  • AMD3-2 Influence of Charge Trapping on Hysteresis in InGaZnO Thin-Film Transistors under Negative Bias and Illumination Stress M. P. Hung (Kochi Univ. of Tech., Japan),D. Wang (Kochi Univ. of Tech., Japan),J. Jiang (Kochi Univ. of Tech., Japan),M. Furuta (Kochi Univ. of Tech., Japan)
  • AMD3-3 The Negative-Bias-Illumination-Stress with Channel Length Dependence in a-IGZO TFTs J. G. Urn (Kyung Hee Univ., Korea),S. H. Park (Kyung Hee Univ., Korea),J. U. Han (Kyung Hee Univ., Korea),J. Jang (Kyung Hee Univ., Korea)
  • AMD3-4 Photo-Response Elimination of Amorphous InGaZnO Thin Film Transistors by Introducing a Mo-doped-ZnO Passivation Layer Y.-C. Tsai (Nat. Chiao Tung Univ., Taiwan),M.-Y. Tsai (Nat. Chiao Tung Univ., Taiwan),L.-F. Teng (Nat. Chiao Tung Univ., Taiwan),P.-T. Liu (Nat. Chiao Tung Univ., Taiwan),H.-P. D. Shieh (Nat. Chiao Tung Univ., Taiwan)
  • AMD4: Oxide TFT: Reliability (2)
  • Thu., Dec. 5 15:10-16:40 Main Hall B
  • Chair: J. K. Jeong (Inha Univ., Korea)Co-Chair: H. Kumomi (Tokyo Inst. of Tech., Japan)
  • AMD4-1 Invited Stability of Oxide TFTs J. Jang (Kyung Hee Univ., Korea),M. Mativenga (Kyung Hee Univ., Korea),J. G. Urn (Kyung Hee Univ., Korea),M. D. H. Chowdhury (Kyung Hee Univ., Korea)
  • AMD4-2 Invited Enhancement of a-IGZO Oxide TFT Performance by Novel Method Including Ultraviolet and Thermal Annealing B. D. Ahn (Samsung Display, Korea),Y. J. Tak (Samsung Display, Korea, Yonsei Univ., Korea),H. J. Kim (Yonsei Univ., Korea)
  • AMD4-3 Effect of Back Channel on the Characteristics of Solution-Derived Amorphous InZnO Thin-Film Transistors Y. Osada (Nara Inst. of S&T, Japan),Y. Ishikawa (Nara Inst. of S&T, Japan),L. Lu (Nara Inst. of S&T, Japan),Y. Uraoka (Nara Inst. of S&T, Japan)
  • AMD4-4 Fabrication and Electrical Properties of Highly Stable Amorphous InGaZnO Thin-Film Transistors P.-L. Chen (Shenzhen China Star Optoelect. Tech., China),C.-L. Chiang (Shenzhen China Star Optoelect. Tech., China),Y.-L. Chou (Shenzhen China Star Optoelect. Tech., China),S. Li (Shenzhen China Star Optoelect. Tech., China),Y.-F. Liu (Shenzhen China Star Optoelect. Tech., China),Q. Shang (Shenzhen China Star Optoelect. Tech., China)
  • AMD5: Oxide TFT: Modeling & Devices
  • Thu., Dec. 5 16:50-18:10 Main Hall B
  • Chair: J. Jang, (Kyung Hee Univ., Korea)Co-Chair: K. Takatori (NLT Techs., Japan)
  • AMD5-1 Invited Modeling of Transparent Amorphous Oxide Semiconductor Thin-Film Transistor K. Abe (Tokyo Inst. of Tech., Japan),H. Kumomi (Tokyo Inst. of Tech., Japan),T. Kamiya (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • AMD5-2 Solution-Processed Metal Oxide TFTs for AMOLED Applications L.-Y. Lin (AU Optronics, Taiwan),C.-C. Cheng (AU Optronics, Taiwan),C.-Y. Liu (AU Optronics, Taiwan),M.-F. Chiang (AU Optronics, Taiwan),S.-Y. Sun (AU Optronics, Taiwan),P.-H. Wu (AU Optronics, Taiwan),M.-T. Lee (AU Optronics, Taiwan),H.-H. Wang (AU Optronics, Taiwan)
  • AMD5-3 A High Mobility Metal Oxide Thin Film Transistor with Solution Coating Process K.-H. Su (Evonik Inds., Germany),D.-V. Pham (Evonik Inds., Germany),A. Merkulov (Evonik Inds., Germany),A. Hoppe (Evonik Inds., Germany),J. Steiger (Evonik Inds., Germany),R. Anselmann (Evonik Inds., Germany)
  • AMD5-4L Effect of Annealing on Oxygen Content in SiO2/a-IGZO/SiO2 Stacks S. Oh (LG Display, Korea),J.-H. Baeck (LG Display, Korea),H. S. Shin (LG Display, Korea),J. U. Bae (LG Display, Korea),W. Shin (LG Display, Korea),I. Kang (LG Display, Korea)
  • FLX6: Flexible Oxide TFT
  • Fri., Dec. 6 13:30-14:15 Conference Hall
  • Chair: M. Ito (Toppan Printing, Japan)Co-Chair: K. Uemura (Nippon Steel Sumitomo Metal, Japan)
  • FLX6-1L High Performance Top-Gate Oxide TFT on Plastic Substrate for Flexible OLED Displays H. S. Shin (LG Display, Korea),S. M. Lee (LG Display, Korea),S. Oh (LG Display, Korea),J.-U. Bae (LG Display, Korea),W. Shin (LG Display, Korea),I. B. Kang (LG Display, Korea)
  • FLX6-2L Evaluation of Two Flexible Substrate Technologies by Low Temperature (200℃) IGZO TFT Process C.-C. Chen (Tianma Micro-Elect. Group, China),H.-C. Zang (Tianma Micro-Elect. Group, China),S.-T. Huo (Tianma Micro-Elect. Group, China),Z.-H. Ling (Tianma Micro-Elect. Group, China),J. Ma (Tianma Micro-Elect. Group, China),X.-F. Li (Shanghai Univ., China),L.-L. Chen (Shanghai Univ., China),J.-H. Zhang (Shanghai Univ., China)
  • FLX6-3L Low-Temperature IGZO TFT Backplane and Its Application in Flexible AMOLED Displays on Ultrathin Polymer Films J.-L. P.J. van der Steen (Hoist Ctr., the Netherlands),A. K. Tripathi (Hoist Ctr., the Netherlands),J. Maas (Hoist Ctr., the Netherlands),K. van Diesen-Tempelaars (Hoist Ctr., the Netherlands),L. van Leuken (Hoist Ctr., the Netherlands),G. de Haas (Hoist Ctr., the Netherlands),B. van der Putten (Hoist Ctr., the Netherlands),I. Yakimets (Hoist Ctr., the Netherlands),F. Li (Hoist Ctr., the Netherlands),T. Ellis (Hoist Ctr., the Netherlands),T. van Mol (Hoist Ctr., the Netherlands),G. Gelinck (Hoist Ctr., the Netherlands),K. Myny (imec, Belgium),P. Vicca (imec, Belgium),S. Smout (imec, Belgium),M. Ameys (imec, Belgium),T. H. Ke (imec, Belgium),S. Steudel (imec, Belgium),M. Nag (imec, Belgium),S. Schols (imec, Belgium),J. Genoe (imec, Belgium),P. Heremans (imec, Belgium),Y. Fukui (Panasonic, Japan),S. Green (Victrex Polymer Solutions, UK)
  • Poster AMDp1: Oxide TFT
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp1-1 Investigation on the Oxide TFT Gate Driver Circuits Using Bias Offset Method Y. H. Jang (LG Display, Korea),H. N. Cho (LG Display, Korea),W. S. Choi (LG Display, Korea),K. I. Chun (LG Display, Korea),M.-G. Kang (LG Display, Korea),K. Choo (LG Display, Korea),B. Cho (LG Display, Korea),J. U. Bae (LG Display, Korea),W. Shin (LG Display, Korea),I. Kang (LG Display, Korea)
  • AMDp1-2 A 32-in. HD LCD-TV Display Driven by Amorphous IGZO TFT5 S.-C. Liu (Shenzhen China Star Optoelect. Tech., China),C.-Y. Su (Shenzhen China Star Optoelect. Tech., China),W.-H. Li (Shenzhen China Star Optoelect. Tech., China),L.-Q. Shi (Shenzhen China Star Optoelect. Tech., China),X.-W. Lv (Shenzhen China Star Optoelect. Tech., China),Y.-T. Hu (Shenzhen China Star Optoelect. Tech., China),H.-J. Zhang (Shenzhen China Star Optoelect. Tech., China),C.-Y. Tseng (Shenzhen China Star Optoelect. Tech., China),Y.-F. Wang (Shenzhen China Star Optoelect. Tech., China),C.-C. Lo (Shenzhen China Star Optoelect. Tech., China),A. Lien (TCL Corporate Res., China)
  • AMDp1-3 Electrical Performance Enhancement of a-AZTO by a Low Temperature Treatment P.-T. Liu (Nat. Chiao Tung Univ., Taiwan),C.-S. Fuh (Nat. Chiao Tung Univ., Taiwan),L.-F. Teng (Nat. Chiao Tung Univ., Taiwan),Y.-S. Fan (Nat. Chiao Tung Univ., Taiwan),C.-H. Chang (Nat. Chiao Tung Univ., Taiwan)
  • AMDp1-4 New a-IGZO TFT Gate Driver Circuit with AC-Driven Pull-Down Circuit C.-E. Wu (Nat. Cheng Kung Univ., Taiwan),F.-H. Chen (Nat. Cheng Kung Univ., Taiwan),M.-H. Cheng (Nat. Cheng Kung Univ., Taiwan),C.-L. Lin (Nat. Cheng Kung Univ., Taiwan)
  • AMDp1-5 In-Situ Threshold Voltage Shift Monitoring of Amorphous InGaZnO Thin-Film Transistors J. H. Kang (Yonsei Univ., Korea),E. N. Cho (Yonsei Univ., Korea),I. Yun (Yonsei Univ., Korea)
  • AMDp1-6 High Reliability of Back Channel Etch-Type TFTs Using New Oxide Semiconducting Material M. Ochi (Kobe Steel, Japan),S. Morita (Kobe Steel, Japan),Y. Takanashi (Kobe Steel, Japan),H. Tao (Kobe Steel, Japan),H. Goto (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan),M. Kanamaru (Kobelco Res. Inst., Japan)
  • AMDp1-7 The Study on Sol-Gel IGZO Thin Film Transistors with Top Polymer Gate Insulators Y. W. Wang (Nat. Changhua Univ. of Education, Taiwan),M. S. Lai (Nat. Changhua Univ. of Education, Taiwan),C. Y. Huang (Nat. Changhua Univ. of Education, Taiwan),W.-C. Su (Nat. Changhua Univ. of Education, Taiwan)
  • AMDp1-8 Process Improvement for Reliability of Oxide TFT Display M. Zhang (Hefei BOE Optoelect. Tech., China),Y. Zhang (Hefei BOE Optoelect. Tech., China),J. Hu (Hefei BOE Optoelect. Tech., China),Y. Shi (Hefei BOE Optoelect. Tech., China),X. Zhang (Hefei BOE Optoelect. Tech., China),Y.-C. Chung (Hefei BOE Optoelect. Tech., China),J.-K. Kim (Hefei BOE Optoelect. Tech., China),G. Tion (Hefei BOE Optoelect. Tech., China),Y. Xu (Hefei BOE Optoelect. Tech., China)
  • AMDp1-9 Self-Aligned Top-Gate a-IGZO Thin-Film Transistor with N2 Plasma-Treated Source/Drain Regions S. Chi (Peking Univ., China),X. Xiao (Peking Univ., China),X. He (Peking Univ., China),S. Zhang (Peking Univ., China)
  • AMDp1-10 Influence of Temperature Annealing on Electrical Performances of Oxide TFT B.-L. Yeh (AU Optronics, Taiwan),C.-N. Lin (AU Optronics, Taiwan),C.-C. Wu (AU Optronics, Taiwan),C.-M. Chang (AU Optronics, Taiwan),W.-B. Wu (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan)
  • AMDp1-11L High Mobility Atmospheric-Pressure-Processed IGZO TFT with AIOx/IGZO Stack Fabricated by Mist Chemical Vapor Deposition M. Furuta (Kochi Univ. of Tech., Japan),T. Kawaharamura (Kochi Univ. of Tech., Japan),T. Kaida (Kochi Univ. of Tech., Japan),D. Wang (Kochi Univ. of Tech., Japan)
  • Poster AMDp2: Active-Matrix Devices
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp2-8 An AMOLED Pixel Circuit with Negative VTH Compensation Function C. Leng (Peking Univ., China),L. Wang (Peking Univ., China),S. Zhang (Peking Univ., China)
  • Poster AMDp3/OLEDp2: AMOLED
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp3/OLEDp2-3 New Pixel Circuit Using a-IGZO TFTs to Compensating for OLED Luminance Drop of AMOLED Displays P.-S. Chen (Nat. Cheng Kung Univ., Taiwan),W.-Y. Chang (Nat. Cheng Kung Univ., Taiwan),F.-C. Chang (Nat. Cheng Kung Univ., Taiwan),C.-L. Lin (Nat. Cheng Kung Univ., Taiwan)
  • Poster FLXp: Flexible Display Technologies
  • Thu., Dec. 5 9:00-12:00 Main Hall C
  • FLXp-2 Preparation of Ruthenium Metal and Ruthenium Oxide Thin Films by a Low-Temperature Solution Process Y. Murakami (JSR, Japan, JAIST, Japan),P. T. Tue (JAIST, Japan),H. Tsukada (JAIST, Japan, MitsubishiMaterials Elect. Chems., Japan),J. Li (JAIST, Japan, JST-ERATO, Japan),T. Shimoda (JAIST, Japan, JST-ERATO, Japan)
  • FLXp-9L A 5-in. Flexible AMOLED on PEN Substrate Driven by Ln-IZO TFTs Based on Anodic Aluminum Oxide H. Xu (South China Univ. of Tech., China),M. Xu (South China Univ. of Tech., China),J. Pang (Guangzhou New Vision Opto-Elect. Tech., China),J. Zou (South China Univ. of Tech., China),H. Tao (South China Univ. of Tech., China),M. Li (South China Univ. of Tech., China),D. Luo (South China Univ. of Tech., China),L. Wang (South China Univ. of Tech., China),J. Peng (South China Univ. of Tech., China, Guangzhou New Vision Opto-Elect. Tech., China)
  • Poster FMCp: FPD Manufacturing, Materials & Components
  • Fri., Dec. 6 9:00-12:00 Main Hall C
  • FMCp-15 Effect of Anneal Temperature on Local Structures of In-Ga-Zn-O Films Evaluated by X-ray Absorption Fine Structure Analysis S. Yasuno (Kobelco Res. Inst., Japan),M. Inaba (Kobelco Res. Inst., Japan),S. Kosaka (Kobelco Res. Inst., Japan),S. Morita (Kobe Steel, Japan),A. Hino (Kobe Steel, Japan),K. Hayashi (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan),Y. Taniguchi (JASRI, Japan),I. Hirosawa (JASRI, Japan)
  • FMCp-16 Withdrawn
  • FMCp-24L Characterization of SiO2/In-Ga-Zn-O Interface by Hard X-ray Photoelectron Spectroscopy and X-ray Reflectometry I. Hirosawa (JASRI, Japan),Y. Taniguchi (JASRI, Japan, SPring-8 Service, Japan),Y.-T. Cui (JASRI, Japan),H. Oji (JASRI, Japan, SPring-8 Service, Japan)
  • Special Topics of Interest on Augmented Reality and Virtual Reality
  • PRJ1: Projection AR
  • Wed., Dec. 4 14:00-15:00 Mid-sized Hall B
  • Chair: D. Cuypers (imec, Belgium)Co-Chair: S. Shikama (Setsunan Univ., Japan)
  • PRJ1-1 Invited Wearable Communication Device Leads the Future of Optical Technology M. Takaso (Telepathy, USA),K. Suzuki (Telepathy, USA),T. Iguchi (Telepathy, USA)
  • PRJ1-2 Invited Projector-Based Augmented Reality in Medicine T. Nakaguchi (Chiba Univ., Japan)
  • PRJ1-3 Invited Projection Mapping Technology and Advanced Optical Features of Digital Projectors H. Yoshida (Christie Digital Syss., Japan),M. Hanzawa (Christie Digital Syss., Japan),P. Salvini (Christie Digital Syss., Canada),R. Anthony (Christie Digital Syss., Canada)
  • INP2/DES2: AR/VR Interactive Systems
  • Wed., Dec. 4 15:40-17:20 Mid-sized Hall B
  • Chair: N. Sakata (Osaka Univ., Japan)Co-Chair: N. Hashimoto (Citizen Holdings, Japan)
  • INP2/DES2-1 Invited Reality Beyond Its Physicality M. Inami (Keio Univ., Japan)
  • INP2/DES2-2 Invited A Tablet Interface for Laying Out AR Objects - Outlook of Relationship with Smartphone and AR- N. Sakata (Osaka Univ., Japan),R. Nagashima (Osaka Univ., Japan),S. Nishida (Osaka Univ., Japan)
  • INP2/DES2-3 Invited The Possibility of the Eyeglass-Type Mobile Phone T. Horikoshi (NTT DoCoMo, Japan)
  • INP2/DES2-4 A Cartoon-Character Costume with Active Facial Expression Y. Oka, M. Yamamoto (Niigata Univ., Japan)
  • 3D1: Practical 3D Systems
  • Thu., Dec. 5 9:00-10:15 Mid-sized Hall B
  • Chair: J.-Y. Son (Konyang Univ., Korea)Co-Chair: S. Yano (Shimane Univ., Japan)
  • 3D1-1 Invited 3DTV Broadcasting Technologies, Trials, and Standardization Effort in Korea J. Kim (ETRI, Korea),S. Cho (ETRI, Korea),S.-H. Kim (ETRI, Korea),J. S. Choi (ETRI, Korea)
  • 3D1-2 A Service Compatible 3DTV Broadcasting System Based on MPEG-2 and HEVC S. Cho (ETRI, Korea),J. Kim (ETRI, Korea),S. Jeong (ETRI, Korea),H.-G. Choo (ETRI, Korea),J. S. Choi (ETRI, Korea),J. Kim (ETRI, Korea)
  • 3D1-3 Description of a Stereoscopic Display System with Integrated Motion Parallax M. F. Flynn (zSpace, USA),J. C. Tu (zSpace, USA)
  • 3D1-4L Inpainting Embedded Virtualized-Reality Indoor Modeler K. Thangamani (AIST, Japan),T. Ishikawa (Kodo Lab, Japan),K. Makita (AIST, Japan),R. Ichikari (AIST, Japan),T. Kurata (AIST, Japan)
  • DES3: Human Perceptions in Augmented Reality
  • Thu., Dec. 5 10:40-12:10 Mid-sized Hall B
  • Chair: T. Kuroda (Kyoto Univ. Hospital, Japan)Co-Chair: K. Makita (AIST, Japan)
  • DES3-1 Invited How AR Reforms Social Medical System? T. Kuroda (Kyoto Univ. Hospital, Japan),Y. Kuroda (Osaka Univ., Japan),K. Hori (Gunma Pref. College of Health Sci., Japan),N. Ohboshi (Kinki Univ., Japan)
  • DES3-2 Invited Augmenting Human Experience with Perception-Based Displays Utilizing Illusions T. Narumi (Univ. of Tokyo, Japan)
  • DES3-3 Invited Blue Light Matters: The Eye Is a Camera and a Clock! K. Tsubota (Keio Univ., Japan)
  • DES3-4L Effectiveness of Freehand Modeling by BlueGrotto for CSCW in VR Space T. Oyoshi (Muroran Inst. of Tech., Japan),Y. Miwa (Muroran Inst. of Tech., Japan),N. Shichijo (Muroran Inst. of Tech., Japan),S. Saga (Muroran Inst. of Tech., Japan)
  • DES4/VHF1: Sensing Technologies for Virtual/Augmented Reality
  • Thu., Dec. 5 13:30-14:45 Mid-sized Hall B
  • Chair: M. Kanbara (Nara Inst. of S&T, Japan)Co-Chair: J. Bergquist (Nokia, Japan)
  • DES4/VHF1-1 Invited Position and Direction Estimation System of User's Viewpoint for Wide Indoor Environment M. Kanbara (Nara Inst. of S&T, Japan)
  • DES4/VHF1-2 Useful Field of View in Augmented Reality: Comparison Between Distribution of Attention under Binocular and Monocular Observation A. Kitamura (Osaka Univ., Japan),H. Naito (Osaka Univ., Japan),T. Kimura (Kansai Univ. of Welfare Scis., Japan),K. Shinohara (Osaka Univ., Japan),T. Sasaki (Toshiba, Japan),H. Okumura (Toshiba, Japan)
  • DES4/VHF1-3 Invited e-Heritage, Cyber Archaeology, and Cloud Museum T. Oishi (Univ. of Tokyo, Japan),K. Ikeuchi (Univ. of Tokyo, Japan)
  • Poster VHFp1: Applied Vision and Human Factors (AR)
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • VHFp1-1 A Cognitive Model for Fast Recognition in Images Displayed by Automotive Augmented Interface Systems H. Hasegawa (Meijo Univ., Japan),S. Yano (Meijo Univ., Japan),S. Okabayashi (Meijo Univ., Japan),T. Wake (Kanagawa Univ., Japan)
  • Poster DESp: Display Electronics and Systems
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • DESp-4 Eyeglass-Based Hands-Free Videophone Using Fish-Eye Cameras and HMD S. Kimura (NTT DoCoMo, Japan),T. Horikoshi (NTT DoCoMo, Japan)
  • Special Topics of Interest on Lighting Technologies
  • OLED5: OLED for Lighting Applications
  • Thu., Dec. 5 16:50-18:15 Conference Hall
  • Chair: Y. Kijima (Sony, Japan)Co-Chair: T. Ikuta (JNC Petrochem., Japan)
  • OLED5-1 Invited Recent Progress of OLED Performance for Lighting Application K. Furukawa (Konica Minolta, Japan),K. Kato (Konica Minolta, Japan),T. Iwasaki (Konica Minolta, Japan)
  • OLED5-2 Out-Coupling Enhancement of OLEDs with Diffractive Micrc Lens Film Y. Kurita (Mitsubishi Rayon, Japan),H. Koshitouge (Mitsubishi Rayon, Japan),K. Mizuhara (Mitsubishi Rayon, Japan),D. Okuno (Mitsubishi Rayon, Japan),T. Tokimitsu (Mitsubishi Rayon, Japan)
  • OLED5-3 Highly Transmissive One-Side-Emission OLED Panel with Solid Encapsulation and Peripheral Grid Electrode D. Kato (Toshiba, Japan),K. Sugi (Toshiba, Japan),T. Ono (Toshiba, Japan),A. Amano (Toshiba, Japan),T. Sawabe (Toshiba, Japan),T. Sugizaki (Toshiba, Japan),H. Kakizoe (Toshiba, Japan),Y. Mizuno (Toshiba, Japan),Y. Shinjo (Toshiba, Japan),S. Enomoto (Toshiba, Japan),I. Amemiya (Toshiba, Japan)
  • PH3: Phosphors for Lighting
  • Friday, Dec. 6 9:00-9:55 Main Hall A
  • Chair: Y. Li (Appotronics, China)Co-Chair: K. Kara (Shizuoka Univ., Japan)
  • PH3-1 Invited New Blue Light Excitable Red-Emitting Phosphate Phosphor K. Toda (Niigata Univ., Japan),S.-W. Kim(Niigata Univ., Japan),T. Ishigaki(Niigata Univ., Japan),T. Hasegawa(Niigata Univ., Japan),K. Uematsu(Niigata Univ., Japan),M. Sato (Niigata Univ., Japan)
  • PH3-2 Synthesis and Luminescence Characterizations of New Thiosilicates Phosphors for LED Lighting S.-P. Lee (Nat. Chiao Tung Univ., Taiwan),T.-M. Chen (Nat. Chiao Tung Univ., Taiwan),C.-H. Huang (ITRI, Taiwan),T. S. Chan (Nat. Synchrotron Radiation Res. Ctr., Taiwan)
  • PH3-3 Comparison of ACELs Formed on Copper, Silver and Gold Back Electrodes J. Silver (Brunel Univ., UK),G. Fern (Brunel Univ., UK),P. G. Harris (Brunel Univ., UK),P. Reip (Intrinsiq Materials, UK),A. Kong (Intrinsiq Materials, UK),P. Bishop (Johnson-Matthey, UK),A. Berzins (Johnson-Matthey, UK),S. Jones (Printed Elect., UK)
  • FMC8: Lighting Technologies
  • Friday, Dec. 6 13:30-15:05 Main Hall A
  • Chair: K. Kalantar (Global Optical Solutions, Japan)Co-Chair: Y. Yang (Japan Display, Japan)
  • FMC8-1 Quantum Dot Enhancement of Color for LCD Systems J. V. Derlofske (3M, USA),G. Benoit (3M, USA),A. Lathrop (3M, USA),D. Lamb (3M, USA)
  • FMC8-2 New LED Design Concept for High Color Gamut Application S. J. Chang (AU Optronics, Taiwan)
  • FMC8-3 Switchable Dual Directional Backlight for Energy Saving in Automotive Displays A. Yuuki (Mitsubishi Elec., Japan),K. Itoga (Mitsubishi Elec., Japan),T. Satake (Mitsubishi Elec., Japan)
  • FMC8-4 Optical Characteristics of Directional Backlight Unit for Field-Alternative Full Resolution Auto-Stereoscopic 3D LCD K. Käläntär (Global Optical Solutions, Japan)
  • FMC8-5L Optical Design of Novel Microstructure Film for Wide Viewing TN-LCD S. Katsuta (Sharp, Japan),H. Yui (Sharp, Japan),Y. Asaoka (Sharp, Japan),E. Yamamoto (Sharp, Japan),T. Maeda (Sharp, Japan),T. Kamada (Sharp, Japan),Y. Tsuda (Sharp, Japan)
  • Poster OLEDp1: OLED Technologies
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • OLEDp1-14 OLED Deposition System Using Plane-Source Evaporation Techniques S.-H. Lai (ITRI, Taiwan),C.-C. Chen (ITRI, Taiwan),C.-C. Wang (ITRI, Taiwan),F.-C. Tung (ITRI, Taiwan),S.-H. Chen (ITRI, Taiwan),Y.-S. Wang (ITRI, Taiwan)•
  • OLEDp1-15 High Color Rendition White Organic Light-Emitting Diodes with Excimer and Fluorescent Emitter for Lighting Application Y. Jiang (Hong Kong Univ. of S&T, Hong Kong),Z. Xie (Hong Kong Baptist Univ., Hong Kong),W.-Y. Wong (Hong Kong Baptist Univ., Hong Kong),H.-S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • OLEDp1-16 Electroluminescence Improvement of Quantum Dots Light Emitting Diodesthrough Organic Hole Transport Layer Optimization M. D. Ho (Sungkyunkwan Univ., Korea),D. Kim (Sungkyunkwan Univ., Korea),N. Kim (Sungkyunkwan Univ., Korea),H. Chae (Sungkyunkwan Univ., Korea)
  • Poster PHp: Phosphors
  • Thu., Dec. 5 9:00-12:00 Main Hall C
  • PHp-15 Wavelength Conversion Material Phosphor-Glass Composites for High Power Solid-State Lighting N. Fujita (Nippon Elec. Glass, Japan),M. Iwao (Nippon Elec. Glass, Japan),S. Fujita (Nippon Elec. Glass, Japan),M. Ohji (Nippon Elec. Glass, Japan)
  • PHp-16 Double-Layered CuInS2/ZnS Quantum Dot-Polymer Plate-Based High-Color Rendering White Light-Emitting Diode J.-H. Kim (Hongik Univ., Korea),W.-S. Song (Hongik Univ., Korea),J.-H. Lee (Hongik Univ., Korea),H.-D. Kang (Hongik Univ., Korea),H. Yang (Hongik Univ., Korea)
  • PHp-17 Silica-Embedded Quantum Dot-Based White LED and Effect of Silica on Device Stability Behavior W.-S. Song (Hongik Univ., Korea),J.-H. Kim (Hongik Univ., Korea),K.-H. Lee (Hongik Univ., Korea),H.-S. Lee (Hongik Univ., Korea),S.-H. Lee (Hongik Univ., Korea),H. Yang (Hongik Univ., Korea)
  • PHp-18 Withdrawn
  • PHp-19 A Study on Thermal Characteristics for High Power LEDs S. Park (Samsung Display, Korea),Y. Kim (Samsung Display, Korea),G. Kim (Samsung Display, Korea)
  • PHp-25L Improve the Stability of Quantum Dots with Silica and Applying Quantum Dot Film as a New Type White Light Packaging System I. S. Sohn (Chonnam Nat. Univ., Korea),W. B. Im (Chonnam Nat. Univ., Korea)
  • Poster FMCp: FPD Manufacturing, Materials & Components
  • Friday, Dec. 6 9:00-12:00 Main Hall C
  • FMCp-18 Designing of Side Emitting Lens for Slim Direct LED Back Light Unit S. Park (Samsung Display, Korea),J. Seo (Samsung Display, Korea),G. Kim (Samsung Display, Korea)
  • FMCp-19 Fiber Optic Illuminator Using Recycling Light Technology for Signage Applications K. Li (Wavien, USA)
  • FMCp-20 Efficient LED Hard Edge Spot Light Using Recycling Light Technology K. Li (Wavien, USA)
  • FMCp-21 The Design of High EfficiencyLight-Guide Platewith Multi Step Wedge Structure Y. W. Chang (AU Optronics, Taiwan)
  • FMCp-22 Surface Diffusing System LCDs with Small Viewing Angle Dependence of Contrast Ratio and Color Shift N. Munemura (Keio Univ., Japan),D. Sekine (Keio Univ., Japan),A. Tagaya (Keio Univ., Japan),Y. Koike (Keio Univ., Japan)
  • FMCp-23 Thin Seamless LED Flat Lighting Panel Using Highly Scattered Optical Transmission Polymer K. Mochizuki (Nittoh Kogaku, Japan),K. Sakurai (Nittoh Kogaku, Japan),T. Iwamoto (Nittoh Kogaku, Japan),K. Oosumi (Nittoh Kogaku, Japan),Y. Shinohara (Nittoh Kogaku, Japan),A. Tagaya (Keio Univ., Japan),Y. Koike (Keio Univ., Japan)
  • Workshop on LC Science and Technologies
  • LCT1: Keynote & Special Session (1)
  • Wed., Dec. 4 14:00-15:00 Mid-sized Hall A
  • Chair: H. Okada (Univ. of Toyama, Japan)Co-Chair: M. Ozaki, (Osaka Univ., Japan)
  • LCT1-1 Invited TFT-LCD Manufacturing Technology; Current Status and Future Prospects Y. Ukai (Ukai Display Device Inst., Japan)
  • LCT1-2 Invited IGZO Technology for the Innovative LCD Y. Kataoka (Sharp, Japan),H. Imai (Sharp, Japan),Y. Nakata (Sharp, Japan),T. Daitoh (Sharp, Japan),T. Matsuo (Sharp, Japan),N. Kimura (Sharp, Japan),T. Nakano (Sharp, Japan),Y. Mizuno (Sharp, Japan),T. Oketani (Sharp, Japan),S. Yamazaki (Semiconductor Energy Lab., Japan),J. Koyama (Semiconductor Energy Lab., Japan),M. Takahashi (Semiconductor Energy Lab., Japan),M. Tsubuku (Semiconductor Energy Lab., Japan),H. Miyake (Semiconductor Energy Lab., Japan),T. Ishitani (Semiconductor Energy Lab., Japan),Y. Hirataka (Semiconductor Energy Lab., Japan),J. Koezuka (Advanced Film Device, Japan),K. Okazaki (Advanced Film Device, Japan)
  • LCT2: Special Session (2)
  • Wed., Dec. 4 15:40-16:55 Mid-sized Hall A
  • Chair: Y. Ukai (Ukai Display Device Inst., Japan)Co-Chair: T. Ishinabe (Tohoku Univ., Japan)
  • LCT2-1 Invited Recent LC Material's Development and Its Challenge toward Future K. Tarumi (Merck KGaA, Germany)
  • LCT2-2 Invited Past, Present, and Future of FFS-LCD S. H. Lee (Chonbuk Nat. Univ., Korea),I. W. Jang (Chonbuk Nat. Univ., Korea),D. H. Kim (Chonbuk Nat. Univ., Korea)
  • LCT2-3L Invited High Performance IPS Technology Suitable for High Resolution LCDs K. Ono (Panasonic Liquid Crystal Display, Japan),H. Matsukawa (Panasonic Liquid Crystal Display, Japan)
  • LCT3: Display Mode (1)
  • Thu., Dec. 5 9:00-10:25 Mid-sized Hall A
  • Chair: M. Funahashi (Kagawa Univ., Japan)Co-Chair: S. H. Lee (Chonbuk Nat. Univ., Korea)
  • LCT3-1 Invited Evolution of Super Fast Response VA-LCD M. Murata (Sharp, Japan),Y. Iwata (Sharp, Japan),K. Tanaka (Sharp, Japan),H. Yoshida (Sharp, Japan),K. Miyachi (Sharp, Japan)
  • LCT3-2 Bidirectional Field Switching Mode for Fast Nematic LC Modulators A. R. Geivandov (Inst. of Crystallography RAS, Russia),M. I. Barnik (Inst. of Crystallography RAS, Russia),V. S. Palto (Inst. of Crystallography RAS, Russia),S. P. Palto (Inst. of Crystallography RAS, Russia)
  • LCT3-3 Reflective Field Sequential Color Displays Based on Electrically Suppressed Helix FLC Y. Ma (Hong Kong Univ. of S&T, Hong Kong),A. Srivastava (Hong Kong Univ. of S&T, Hong Kong),V. G. Chigrinov (Hong Kong Univ. of S&T, Hong Kong),H. S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • LCT3-4 Viewing Angle Switchable LCD Based on 3-Electrode FFS Mode C.-H. Yang (AU Optronics, Taiwan),C.-F. Fan (AU Optronics, Taiwan),C.-W. Yeh (AU Optronics, Taiwan),C.-H. Liao (AU Optronics, Taiwan),W.-H. Hsu (AU Optronics, Taiwan)
  • LCT4: LC Materials
  • Thu., Dec. 5 10:40-12:00 Mid-sized Hall A
  • Chair: K. Tarumi (Merck KGaA, Germany)Co-Chair: S. Komura (Japan Display, Japan)
  • LCT4-1 Temperature-Independent Hole Mobility in an Ordered Smectic Phase of Phenylterthiophene Derivative and a Columnar Phase of Perylene Tetracarboxylic Bisimide Derivatives M. Funahashi (Kagawa Univ., Japan),Y. Funatsu (Kagawa Univ., Japan),T. Ishii (Kagawa Univ., Japan),A. Sonoda (AIST, Japan)
  • LCT4-2 A New Patterning Technology with Polymerizable LCs R. Goto (FUJIFILM, Japan),W. Hoshino (FUJIFILM, Japan),N. Iwahashi (FUJIFILM, Japan),K. Takahashi (FUJIFILM, Japan),S. Morishima (FUJIFILM, Japan),N. Yanagihara (FUJIFILM, Japan),T. Yamaguchi (FUJIFILM, Japan),K. Takada (FUJIFILM, Japan),Y. Ito (FUJIFILM, Japan),K. Oki (FUJIFILM, Japan)
  • LCT4-3 Comparison of Surface Characteristics on Rubbed Polyimide by Rubbing Condition with NEXAFS M. Kwak (LG Display, Korea),K. Kim (LG Display, Korea),B. Kim (LG Display, Korea),S. Choi (LG Display, Korea),N. Kim (LG Display, Korea),D. Kang (LG Display, Korea),Y. Choi (LG Display, Korea),S. Jeon (LG Display, Korea),J. Jeon (LG Display, Korea),K. Kim (Pohang Accelerator Lab., Korea),B. Kim (Pohang Accelerator Lab., Korea)
  • LCT4-4 Study of Polymer Bump Morphology in PS-VA LCD X. Ma (Shenzhen China Star Optoelect. Tech., China),X. Zhong (Shenzhen China Star Optoelect. Tech., China),H. J. Huang (Shenzhen China Star Optoelect. Tech., China),K.-C. Lee (Shenzhen China Star Optoelect. Tech., China)
  • LCT5: Display Mode (2)
  • Fri., Dec. 6 9:00-10:20 Mid-sized Hall A
  • Chair: S. Ishihara (Osaka Inst. of Tech., Japan)Co-Chair: K. Miyachi (Sharp, Japan)
  • LCT5-1 Field-Induced Optically Isotropic State in Bent Core Nematic LCs: Proof of Their Optical Biaxiality O. Elamain (Univ. of Gothenburg, Sweden),G. Hegde (Univ. Malaysia Pahang, Malaysia),F. C. Katalin (Hungarian Ac. of Sci., Hungary),L. Komitov (Univ. of Gothenburg, Sweden)
  • LCT5-2 The Improvement for TN-LCD Response Time by Partial Polymer Matrix Formation in the Vicinity of LC Alignment Layer Surfaces K. Takatoh (Tokyo Univ. of Sci. Yamaguchi, Japan),T. Ide (Tokyo Univ. of Sci. Yamaguchi, Japan),A. Harima (Tokyo Univ. of Sci. Yamaguchi, Japan),M. Akimoto (Tokyo Univ. of Sci. Yamaguchi, Japan)
  • LCT5-3 New Electrically-Controllable LC DepolarizersUsing Amorphous-Alignment Structure Y. Nagatsuka (Tokyo Univ. of A&T, Japan),Y. Iimura (Tokyo Univ. of A&T, Japan)
  • LCT5-4 Low Operating Voltage and Good Contrast Ratio Cholesteric LC Applied in Active-Matrix TFT Transparent Display J.-H. Chen (Chunghwa Picture Tubes, Taiwan),C.-W. Su (Chunghwa Picture Tubes, Taiwan),J.-T. Lien (Chunghwa Picture Tubes, Taiwan)
  • LCT6: Evaluation
  • Fri., Dec. 6 10:40-12:15 Mid-sized Hall A
  • Chair: M. Inoue (Apple, Japan)Co-Chair: A. Kubono (Shizuoka Univ., Japan)
  • LCT6-1 Improving the Image Sticking of Photo-Alignment LCD Panel by Polymer Stabilization Technology H.-M. Fu (Chunghwa Picture Tubes, Taiwan),C.-S. Hsieh (Chunghwa Picture Tubes, Taiwan),J.-T. Lien (Chunghwa Picture Tubes, Taiwan)
  • LCT6-2 Image Sticking Improvement by Optimizing Gamma Voltages of Low Grey Levels X. Zhong (Shenzhen China Star Optoelect. Tech., China),H. J. Huang (Shenzhen China Star Optoelect. Tech., China),X. Ma (Shenzhen China Star Optoelect. Tech., China),K.-C. Lee (Shenzhen China Star Optoelect. Tech., China)
  • LCT6-3 Electric Field Interference among Vertically Aligned In-Plane-Switching Mode Y.-Y. Kung (AU Optronics, Taiwan),S.-W. Tsao (AU Optronics, Taiwan),M.-J. Lu (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan),T.-L. Ting (AU Optronics, Taiwan),W.-H. Hsu (AU Optronics, Taiwan),J.-J. Su (AU Optronics, Taiwan)
  • LCT6-4 Pursuing Peak Performance LCD of Mobile Application S. L. Yang (AU Optronics, Taiwan),J.-P. Yu (AU Optronics, Taiwan)
  • LCT6-5L Novel Microstructure Film for Improving Viewing Angle Characteristics of LCD E. Yamamoto (Sharp, Japan),T. Kanno (Sharp, Japan),S. Katsuta (Sharp, Japan),Y. Asaoka (Sharp, Japan),T. Maeda (Sharp, Japan),T. Kamada (Sharp, Japan),H. Yoshida (Sharp, Japan),Y. Tsuda (Sharp, Japan),K. Kondo (Sharp, Japan)
  • LCT7: Photo Alignment
  • Fri., Dec. 6 13:30-14:30 Mid-sized Hall A
  • Chair: K. Ono (Panasonic, Japan)Co-Chair: T. Nose (Akita Pref. Univ., Japan)
  • LCT7-1 LC Alignment on a New Photo-Alignment Materialwith Liquid Crystalline Properties S. Inoue (Tokyo Univ. of A&T, Japan),K. Obayashi (Tokyo Univ. of A&T, Japan),Y. Iimura (Tokyo Univ. of A&T, Japan)
  • LCT7-2 Polarization Mask by Patterned Rubbing Alignment Technology for Azodye Photoalignment A. A. Muraysky (Inst. of Chem. of New Materials NAS Belarus, Belarus),A. A. Murauski (Inst. of Chem. of New Materials NAS Belarus, Belarus),V. E. Agabekov (Inst. of Chem. of New Materials NAS Belarus, Belarus)
  • LCT7-3 Light-Control of LC Alignment from Vertical to Planar A. A. Rasha (Univ. of Gothenburg, Sweden),G. Hegde (Univ. Malaysia Pahang, Malaysia),L. Komitov (Univ. of Gothenburg, Sweden)
  • Poster LCTp1: LC Alignment
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • LCTp1-1 Alignment and Alignment Transition of BC Nematics O. Elamain (Univ. of Gothenburg, Sweden),G. Hegde (Univ. Malaysia Pahang, Malaysia),L. Komitov (Univ. of Gothenburg, Sweden)
  • LCTp1-2 LC Alignment on Zinc Oxide Nanostructure Surfaces M.-Z. Chen (Nat. Chiao Tung Univ., Taiwan),W.-S. Chen (Nat. Chiao Tung Univ., Taiwan),S.-H. Yang (Nat. Chiao Tung Univ., Taiwan),Y.-F. Chung (Nat. Chiao Tung Univ., Taiwan),S.-C. Jeng (Nat. Chiao Tung Univ., Taiwan)
  • LCTp1-3 Alignment and Electro-Optical Properties of Nematic LCs by Using Dendrimers Y. Takahashi (Yamagata Univ., Japan),T. Sakuma (Yamagata Univ., Japan),O. Haba (Yamagata Univ., Japan),T. Koda (Yamagata Univ., Japan),K. Yonetake (Yamagata Univ., Japan),M. Kwak (LG Display, Korea),N. Kim (LG Display, Korea),S. Choi (LG Display, Korea),D. Kang (LG Display, Korea),Y. Choi (LG Display, Korea),S. Jeon (LG Display, Korea),Y. Momoi (LG Display, Japan)
  • LCTp1-4 The Establishment of UV Curing Polymerization Model for Polymer-Stabilized Vertical Alignment LCDs Y. Song (Shenzhen China Star Optoelect. Tech., China),F. Zhao (Shenzhen China Star Optoelect. Tech., China),C.-C. Hsieh (Shenzhen China Star Optoelect. Tech., China),C.-Y. Chiu (Shenzhen China Star Optoelect. Tech., China)
  • LCTp1-5 Withdrawn
  • LCTp1-6 Monte Carlo Simulation for Molecular Orientation in Mixture of LC and Dendrimers Using Hard Repulsive Model Molecules M. Uchida (Yamagata Univ., Japan),T. Koda (Yamagata Univ., Japan),A. Nishioka (Yamagata Univ., Japan),O. Haba (Yamagata Univ., Japan),K. Yonetake (Yamagata Univ., Japan),M. Kwak (LG Display, Korea),Y. Momoi (LG Display, Korea),S. An (LG Display, Korea),D. Kang (LG Display, Korea),Y. Choi (LG Display, Korea),S. Jeon (LG Display, Korea)
  • LCTp1-7 Cylindrical LC Lens by Photoalignment with Spatially Variable Pretilt Angle F. Fan (Hong Kong Univ. of S&T, Hong Kong),A. K. Srivastava (Hong Kong Univ. of S&T, Hong Kong),T. Du (Hong Kong Univ. of S&T, Hong Kong),M. C. Tseng (Hong Kong Univ. of S&T, Hong Kong),V. G. Chigrinov (Hong Kong Univ. of S&T, Hong Kong),H.-S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • LCTp1-8 Withdrawn
  • LCTp1-9 Enhancement of an Azimuthal Anchoring Energy in a Photo-Alignment Layer by Stacking Planar Alignment Layer Y. Kim (Hanyang Univ., Korea),D.-H. Kim (Hanyang Univ., Korea),Y.-J. Lee (Hanyang Univ., Korea),C.-J. Yu (Hanyang Univ., Korea),J.-H. Kim (Hanyang Univ., Korea)
  • LCTp1-10 Photo-Addressable Bistable LCD T.-H. Lin (Nat. Sun Yat-Sen Univ., Taiwan),C.-T. Wang (Nat. Sun Yat-Sen Univ., Taiwan),H.-C. Jau (Nat. Sun Yat-Sen Univ., Taiwan)
  • LCTp1-11 Study of Electro-Optical Properties of LC/Reactive Mesogen Coated LCD Fabricated by Slit Coater Y. Nagataki (Nagaoka Univ. of Tech., Japan),T. N. Oo (Nagaoka Univ. of Tech., Japan),K. Miyashita (Toray Eng., Japan),H. Hirata (Toray Eng., Japan),M. Kimura (Nagaoka Univ. of Tech., Japan),T. Akahane (Nagaoka Univ. of Tech., Japan)
  • LCTp1-12L Electro-Optical Properties of Unconventional Subphases Between Ferroelectric and Antiferroelectric LC K. Isobe (Tokyo Inst. of Tech., Japan),K. Ishikawa (Tokyo Inst. of Tech., Japan)
  • LCTp1-13L Observation of Dynamic Behavior of Liquid Crystal Molecules at the Alignment Surface Y. Nishikawa (Osaka Inst. of Tech., Japan),M. Sugimoto (Osaka Inst. of Tech., Japan),S. Ishihara (Osaka Inst. of Tech., Japan)
  • Poster LCTp2: Evaluation
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • LCTp2-1 Image Sticking Characteristic of Additive Blended LCD S.-K. Roh (LG Display, Korea),J.-H. Kim (LG Display, Korea),Y.-H. Choi (LG Display, Korea),W.-Y. Choi (LG Display, Korea),J.-H. Baek (LG Display, Korea),M. Jun (LG Display, Korea)
  • LCTp2-2 Azimuthal Anchoring Energy of NLC on the Alignment Film Formed by Time Division Electro-Spray Deposition Method Y. Kudoh (Kogakuin Univ., Japan),Y. Uchida (Kogakuin Univ., Japan),T. Takahashi (Kogakuin Univ., Japan)
  • LCTp2-3 Improving Color Mix of High PPI LCD Y. Feng (BOE Optoelect. Tech., China),J. Lim (BOE Optoelect. Tech., China),J. Zhang (BOE Optoelect. Tech., China),N. Jiang (BOE Optoelect. Tech., China),B. Shi (BOE Optoelect. Tech., China)
  • LCTp2-4 The Flexoelectric Effect Influence of Image Sticking in FFS Mode LCD K.-T. Huang (HannStar Display, Taiwan),Y.-W. Hung (HannStar Display, Taiwan),R.-X. Fang (HannStar Display, Taiwan),Y.-T. Chao (HannStar Display, Taiwan),T. Lee (HannStar Display, Taiwan),C. Lee (HannStar Display, Taiwan),S.-C. Lin (HannStar Display, Taiwan),C.-H. Yu (HannStar Display, Taiwan)
  • LCTp2-5 Optical Evaluation of Two Type Omniwide Film Y. K. Li (Infovision Optoelect., China),D. L. Fu (Infovision Optoelect., China),X. Huang (Infovision Optoelect., China)
  • LCTp2-6 Methods to Improve Contrast Ratio of LCD Under Low Temperature F. Lin (Infovision Optoelect., China),X. Huang (Infovision Optoelect., China),Y.-J. Tang (Infovision Optoelect., China),S. Li (Infovision Optoelect., China),J.-D. Liao (Infovision Optoelect., China)
  • LCTp2-7 The Reason of COG Mura in TFT-LCD to Explore J. Long (BOE Optoelect. Tech., China),Y. Song (BOE Optoelect. Tech., China),H. Zhu (BOE Optoelect. Tech., China),H. Yu (BOE Optoelect. Tech., China),X. Dong (BOE Optoelect. Tech., China),S. Sun (BOE Optoelect. Tech., China),J. Wang (BOE Optoelect. Tech., China),N. Quan (BOE Optoelect. Tech., China),R. Li (BOE Optoelect. Tech., China),H. Zhang (BOE Optoelect. Tech., China),G. Yang (BOE Optoelect. Tech., China),X. An (BOE Optoelect. Tech., China)
  • LCTp2-8L DC Effect to VT Data of the ADS Mode X. Xi (BOE Tech. Group, China),X. Zhou (BOE Tech. Group, China),C. Xie (BOE Tech. Group, China),J. You (BOE Tech. Group, China)
  • LCTp2-9L Analysis of Vertical Crosstalk Phenomenon in Fringe Field Switching Liquid Crystal Display J.-D. Yang (AU Optronics, Taiwan),C.-A. Tseng (AU Optronics, Taiwan),P.-C. Liao (AU Optronics, Taiwan),W.-H. Hsu (AU Optronics, Taiwan)
  • Poster LCTp3: Display Mode
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • LCTp3-1 Optical Compensation of Fringe Field Switching Display with Negative Dielectric Anisotropy LCs Y. Xu (Infovision Optoelect., China),W. Chen (Infovision Optoelect., China),Z. Su (Infovision Optoelect., China),L. Jiang (Infovision Optoelect., China),X. Zhu (Infovision Optoelect., China),P. Liao (Infovision Optoelect., China)
  • LCTp3-2 An Analytical Model for 3-Electrode FFS Mode LCD C. F. Fan (AU Optronics, Taiwan),C. H. Yang (AU Optronics, Taiwan),C. W. Yeh (AU Optronics, Taiwan),C. H. Liao (AU Optronics, Taiwan),W. H. Hsu (AU Optronics, Taiwan)
  • LCTp3-3 Optimize Cell Parameters Design of IPS B. Bai (Infovision Optoelect., China),S. N. Zhang (Infovision Optoelect., China),Z. H. Li (Infovision Optoelect., China),P. Liao (Infovision Optoelect., China)
  • LCTp3-4 High Aperture VA-LCD with CGL Pixel Design S.-H. Lo (Shenzhen China Star Optoelect. Tech., China),B. Han (Shenzhen China Star Optoelect. Tech., China),S.-S. Huang (Shenzhen China Star Optoelect. Tech., China),M.-H. Shih (Shenzhen China Star Optoelect. Tech., China),C.-H. Chen (Shenzhen China Star Optoelect. Tech., China)
  • LCTp3-5 A Novel Transparent Color LCD Using Azobenzene Dye Layer J.-H. Cho (Dong-A Univ., Korea),W. S. Kang (Dong-A Univ., Korea),B.-J. Mun (Dong-A Univ., Korea),J. H. Lee (LG Display, Korea),B. K. Kim (LG Display, Korea),H. C. Choi (LG Display, Korea),G.-D. Lee (Dong-A Univ., Korea)
  • LCTp3-6 Advanced Full Color Cholesteric LCD in a Single-Layered Configuration by Pixel Isolation K. S. Shim (Hanyang Univ., Korea),S. I. Jo (Hanyang Univ., Korea),J. H. Han (Hanyang Univ., Korea),J.-H. Kim (Hanyang Univ., Korea),C.-J. Yu (Hanyang Univ., Korea)
  • LCTp3-7 Electro-Optical Characteristics of Metastable TN-LCDs with Different Pretilt Angles M. Akimoto (Tokyo Univ. of Sci. Yamaguchi, Japan),M. Sannomiya (Tokyo Univ. of Sci. Yamaguchi, Japan),K. Takatoh (Tokyo Univ. of Sci. Yamaguchi, Japan),S. Kobayashi (Tokyo Univ. of Sci. Yamaguchi, Japan)
  • LCTp3-8L Pixel Structure Optimized to Improve Black Line of Fringe-Field Switching LCD B. Shi (Chengdu BOE Optoelect. Tech., China),F. Yang (Chengdu BOE Optoelect. Tech., China),J. Lim (Chengdu BOE Optoelect. Tech., China),J. Zhang (Chengdu BOE Optoelect. Tech., China),Y. Feng (Chengdu BOE Optoelect. Tech., China)
  • LCTp3-9L Optical Compensation Using Uniaxial Films with Normal Dispersion for a Wide-Viewing-Angle IPS LCD S.-W. Oh (Pusan Nat. Univ., Korea),B. W. Park (Pusan Nat. Univ., Korea),J.-H. Lee (Chonbuk Nat. Univ., Korea),T.-H. Yoon (Pusan Nat. Univ., Korea)
  • LCTp3-10L Fast In-Plane Switching of Negative Liquid Crystals by Crossed Patterned Electrodes T.-H. Choi (Pusan Nat. Univ., Korea),J.-W. Kim (Pusan Nat. Univ., Korea),S.-T. Shin (Samsung Display, Korea),T.-H. Yoon (Pusan Nat. Univ., Korea)
  • LCTp3-11L Optical Compensation of Flexible Plastic-Based LCD for Wide Viewing Angle T. Ishinabe (Tohoku Univ., Japan),A. Sato (Tohoku Univ., Japan),H. Fujikake (Tohoku Univ., Japan)
  • LCTp3-12L Surface-Stabilized Single-Domain Fringe-Field-Switching Liquid Crystal Mode with Zero Pretilt Alignment Property S.-W. Oh (Kyungpook Nat. Univ., Korea),M.-K. Park (Kyungpook Nat. Univ., Korea),H. J. Lee (Kyungpook Nat. Univ., Korea),S.-H. Yoo (Kyungpook Nat. Univ., Korea),K. H. Park (LG Display, Korea),J.-H. Lee (LG Display, Korea),B. K. Kim (LG Display, Korea),H.-R. Kim (Kyungpook Nat. Univ., Korea)
  • Poster LCTp4: LC Applications
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • LCTp4-1 Planar Polymeric LC Lens for 2D/3D Image Switching in Auto-Stereoscopic Display B.-J. Mun (Dong-A Univ., Korea),J.-H. Baek (Hanyang Univ., Korea),J. H. Lee (LG Display, Korea),B. K. Kim (LG Display, Korea),H. C. Choi (LG Display, Korea),J.- H. Kim (Hanyang Univ., Korea),G.-D. Lee (Dong-A Univ., Korea)
  • LCTp4-2 Optically Rewritable LC Fresnel Zone Lens with Fast Response X. Wang (Hong Kong Univ. of S&T, Hong Kong),A. Srivastava (Hong Kong Univ. of S&T, Hong Kong),V. Chigrinov (Hong Kong Univ. of S&T, Hong Kong),H. S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • LCTp4-3 The Application of LC Q-Plates for Modulating Gaussian Beam Y.-H. Huang (Nat. Cheng Kung Univ., Taiwan),M.-S. Li (Nat. Cheng Kung Univ., Taiwan),A. Y.-G. Fuh (Nat. Cheng Kung Univ., Taiwan)
  • LCTp4-4 Electro-Optic Modulator Based on Nano/Micro-Sized Polymer-Dispersed LC for TFT Array Inspections J.-Y. Hwang (Hanyang Univ., Korea),Y.-N. Hwang (Hanyang Univ., Korea),K.-S. Park (Hanyang Univ., Korea),J.-H. Kim (Hanyang Univ., Korea),C.-J. Yu (Hanyang Univ., Korea)
  • LCTp4-5 Multi-Level Optical Switch of Diffractive Light from a BCT Photonic Crystal Based on an Azo Component-Doped HPDLC M.-S. Li (Nat. Cheng Kung Univ., Taiwan),A. Y.-G. Fuh (Nat. Cheng Kung Univ., Taiwan),J.-H. Liu (Nat. Cheng Kung Univ., Taiwan),S.-T. Wu (Nat. Cheng Kung Univ., Taiwan)
  • LCTp4-6 Optical Aberration Correction by Polymer Dispersed LC Film C.-T. Hsieh (Nat. Changhua Univ. of Education, Taiwan),C.-W. Chung (Nat. Changhua Univ. of Education, Taiwan),C.-H. Liao (Nat. Changhua Univ. of Education, Taiwan),P.-R. Ding (Nat. Changhua Univ. of Education, Taiwan),W.-C. Su (Nat. Changhua Univ. of Education, Taiwan),C.-Y. Huang (Nat. Changhua Univ. of Education, Taiwan),C.-H. Lin (Nat. Sun Yat-Sen Univ., Taiwan),K.-Y. Lo (Nat. Cheng Kung Univ., Taiwan),C.-J. Tien (Cheng Shiu Univ., Taiwan)
  • LCTp4-7 Fabrication of 180-Fold Helix Spiral Phase Plate Based on PDLC S.-T. Wu (Nat. Cheng Kung Univ., Taiwan),M. S. Li (Nat. Cheng Kung Univ., Taiwan),Y. G. Fuh (Nat. Cheng Kung Univ., Taiwan),Y. H. Huang (Nat. Cheng Kung Univ., Taiwan),C. H. Yan (Nat. Cheng Kung Univ., Taiwan)
  • LCTp4-8 Withdrawn
  • LCTp4-9 A Novel Imaging Method for Cholesteric LCD M.-H. Yang (ITRI, Taiwan),B.-W. Xiao (ITRI, Taiwan),S.-W. Lai (ITRI, Taiwan),Y.-S. Tsai (ITRI, Taiwan),J.-L. Chen (ITRI, Taiwan),M.-H. Yeh (ITRI, Taiwan),Y.-Z. Lee (ITRI, Taiwan)
  • LCTp4-10 An Issue of RA Bright Spot in TN-LCD Y. J. Tang (Infovision Optoelect., China),X. Huang (Infovision Optoelect., China),S. Li (Infovision Optoelect., China),F. Lin (Infovision Optoelect., China)
  • LCTp4-11 Method of Recycling LC from Waste LCD Panel C.-W. Lu (ITRI, Taiwan),H.-Y. Huang (ITRI, Taiwan)
  • LCTp4-12L Fast Switchable Ferroelectric Liquid Crystal Fresnel Zone Lens X. Wang (Hong Kong Univ. of S&T, Hong Kong),Q. Guo (Hong Kong Univ. of S&T, Hong Kong),F. Fan (Hong Kong Univ. of S&T, Hong Kong),J. Sun (Hong Kong Univ. of S&T, Hong Kong),A. Tam (Hong Kong Univ. of S&T, Hong Kong),Y. Ma (Hong Kong Univ. of S&T, Hong Kong),A. K. Srivastava (Hong Kong Univ. of S&T, Hong Kong),V. G. Chigrinov (Hong Kong Univ. of S&T, Hong Kong),H. S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • LCTp4-13L All-Optically Controllable Scattering Mode Light Modulator Based on Azobenzene Liquid Crystals and Poly(N-Vinylcarbazole) Films Y.-C. Liu (Nat. Cheng Kung Univ., Taiwan),K.-T. Cheng (Nat. Central Univ., Taiwan),Y.-D. Chen (Nat. Cheng Kung Univ., Taiwan),A. Y.-G. Fuh (Nat. Cheng Kung Univ., Taiwan, Advanced Optoelect. Tech. Ctr., Taiwan)
  • LCTp4-14L Optical Switch Using Dye-Doped Chiral Nematic Liquid Crystals J.-W. Huh (Pusan Nat. Univ., Korea),B.-H. Yu (Pusan Nat. Univ., Korea),K.-H. Kim (Pusan Nat. Univ., Korea),T.-H. Yoon (Pusan Nat. Univ., Korea)
  • LCTp4-15L Dependence of Cell Thickness on Scattering Property in Reverse Mode Liquid Crystal Cells with Different Morphologies S. Sakurai (Akita Univ., Japan),R. Yamaguchi (Akita Univ., Japan)
  • LCTp4-16L Switchable Liquid Crystal Window for Daylight Control with Asymmetrical Incident Angle T. Takasu (Akita Univ., Japan),R. Yamaguchi (Akita Univ., Japan)
  • LCTp4-17L Top-down Aligned Reactive Mesogen Layer for Polarization-dependent Lenticular Lens in 2D/3D Switchable Display C. Lee (Kyungpook Nat. Univ., Korea),S.-H. Yoo (Kyungpook Nat. Univ., Korea),M. Kim (Kyungpook Nat. Univ., Korea),H.-R. Kim (Kyungpook Nat. Univ., Korea)
  • LCTp4-18L Terahertz Liquid Crystal Grating Fabricated by Using Microrubbing Process R. Ito (Akita Prefectural Univ., Japan),M. Honma (Akita Prefectural Univ., Japan),T. Nozokido (Univ. of Toyama, Japan),T. Nose (Akita Prefectural Univ., Japan)
  • Poster LCTp5: Blue Phase
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • LCTp5-1 Effect of Surface Alignment on the Stability and Electro-Optical Properties of Blue Phase LC I. Yamana (Nagaoka Univ. of Tech., Japan),T. N. Oo (Nagaoka Univ. of Tech., Japan),H. Kikuchi (Kyushu Univ., Japan),M. Kimura (Nagaoka Univ. of Tech., Japan),T. Akahane (Nagaoka Univ. of Tech., Japan)
  • LCTp5-2 Withdrawn
  • LCTp5-3 Withdrawn
  • LCTp5-4 Analysis of Polymer Stabilized Blue Phase Network Structure for Understanding of LC Alignment M. Kwak (LG Display, Korea),K. Kim (LG Display, Korea),S. An (LG Display, Korea),Y. Yi (LG Display, Korea),S. Choi (LG Display, Korea),N. Kim (LG Display, Korea),B. Kim (LG Display, Korea),D. Kang (LG Display, Korea),Y.Choi (LG Display, Korea),S. Jean (LG Display, Korea)
  • LCTp5-5 Withdrawn
  • LCTp5-6 A Single Step Method for Characterizing Blue Phase LCs at Various Temperatures P. Joshi (Gent Univ., Belgium, imec, Belgium),J. D. Smet (Gent Univ., Belgium, imec, Belgium),X. Shang (Gent Univ., Belgium, imec, Belgium),D. Cuypers (Gent Univ., Belgium, imec, Belgium),G. V. Steenberge (Gent Univ., Belgium, imec, Belgium),S. V. Vlierberghe (Gent Univ., Belgium),P. Dubruel (Gent Univ., Belgium),H. D. Smet (Gent Univ., Belgium, imec, Belgium)
  • LCTp5-7L Effect of Polyaniline Functionalized Graphene Doping on Blue Phase Liquid Crystal S.-B. Ni (Shanghai Jiao Tong Univ., China),J.-L. Zhu (Shanghai Jiao Tong Univ., China),H.-J. Huang (China Star Optoelect. Tech., China),K.-C. Lee (China Star Optoelect. Tech., China),J.-G. Lu (Shanghai Jiao Tong Univ., China)
  • LCTp5-8L Cholesteric Blue Phases from a Mixture of Rod-Like Liquid Crystal and Photoresponsive Bent-Core Mesogen M.-J. Gim (Kyung Hee Univ., Korea),K.-W. Park (Kyung Hee Univ., Korea),S.-T. Hur (Kyung Hee Univ., Korea),S.-W. Choi (Kyung Hee Univ., Korea)
  • Workshop on Active Matrix Displays
  • AMD1: Advanced Si TFT
  • Thu., Dec. 5 9:00-10:25 Main Hall B
  • Chair: K. Miura (Toshiba, Japan)Co-Chair: T. Noguchi (Univ. of the Ryukyus, Japan)
  • AMD1-1 Invited The Physics and Technology of Bridged-Grain Polycrystalline Silicon Thin-Film Transistor M. Wong (Hong Kong Univ. of S&T, Hong Kong),H. S. Kwok (Hong Kong Univ. of S&T, Hong Kong),W. Zhou (Hong Kong Univ. of S&T, Hong Kong),R. Chen (Hong Kong Univ. of S&T, Hong Kong),M. Zhang (Hong Kong Univ. of S&T, Hong Kong),S. Chen (Hong Kong Univ. of S&T, Hong Kong),T. Chow (Sinodisplay Tech., China)
  • AMD1-2 Degradation Behaviors of Bridged-Grain Polycrystalline Silicon Thin Film Transistors under DC Bias Stresses M. Zhang (Hong Kong Univ. of S&T, Hong Kong),W. Zhou (Hong Kong Univ. of S&T, Hong Kong),R. Chen (Hong Kong Univ. of S&T, Hong Kong),M. Wong (Hong Kong Univ. of S&T, Hong Kong),H.-S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • AMD1-3 Invited Low-Temperature Formation of Single-Crystalline Silicon on Glass and Plastic Substrates and Its Application to MOSFET Fabrication S. Higashi (Hiroshima Univ., Japan),K. Sakaike (Hiroshima Univ., Japan),S. Hayashi (Hiroshima Univ., Japan),S. Morisaki (Hiroshima Univ., Japan),M. Akazawa (Hiroshima Univ., Japan),S. Nakamura (Hiroshima Univ., Japan),T. Fukunaga (Hiroshima Univ., Japan)
  • AMD1-4L Four-Terminal Planar Metal Double-Gate Low-Temperature Poly-Si TFTs for System-on-Glass R. Kurosu (Tohoku Gakuin Univ., Japan),S. Kamo (Tohoku Gakuin Univ., Japan),T. Sato (Hiroshima Univ., Japan),A. Hara (Tohoku Gakuin Univ., Japan)
  • AMD2: Oxide TFT: ApplicationsSpecial Topics of Interest on Oxide TFT
  • Thu., Dec. 5 10:40-12:25 Main Hall B
  • Chair: M. Wong (Hong Kong Univ. of S&T, Hong Kong)Co-Chair: N. Morosawa (Sony, Japan)
  • AMD2-1 Invited 65-in. OLED TV Developed by Oxide TFT and Fine Metal Mask Technologies L.-F. Lin (AU Optronics, Taiwan),T.-H. Shih (AU Optronics, Taiwan),J.-Y. Lee (AU Optronics, Taiwan),W.-H. Wu (AU Optronics, Taiwan),S.-C. Wang (AU Optronics, Taiwan),Y.-H. Chen (AU Optronics, Taiwan),C.-C. Chen (AU Optronics, Taiwan),C.-L. Chen (AU Optronics, Taiwan),P. P. Lin (AU Optronics, Taiwan),Y.-H. Chen (AU Optronics, Taiwan),S.-J. Yu (AU Optronics, Taiwan),C.-H. Liu (AU Optronics, Taiwan),H.-C. Ting (AU Optronics, Taiwan),H.-H. Lu (AU Optronics, Taiwan),L. Tsai (AU Optronics, Taiwan),H.-S. Lin (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan),L.-H. Chang (AU Optronics, Taiwan),Y.-H.Lin (AU Optronics, Taiwan)
  • AMD2-2 Invited Flexible AMOLED Display Driven by Amorphous InGaZnO TFTs K. Miura (Toshiba, Japan),T. Ueda (Toshiba, Japan),N. Saito (Toshiba, Japan),S. Nakano (Toshiba, Japan),T. Sakano (Toshiba, Japan),H. Yamaguchi (Toshiba, Japan),I. Amemiya (Toshiba, Japan)
  • AMD2-3 12.1-in. WXGA Plastic AMLCDs Driven by Low Temperature Amorphous IGZO TFTs S.-Y. Sun (AU Optronics, Taiwan),W.-C. Huang (AU Optronics, Taiwan),W.-T. Lin (AU Optronics, Taiwan),L.-Y. Lin (AU Optronics, Taiwan),C.-C. Cheng (AU Optronics, Taiwan),C.-Y. Liu (AU Optronics, Taiwan),M.-F. Chiang (AU Optronics, Taiwan)
  • AMD2-4 A Novel Embedded Non-Volatile Memory Utilizing IGZO Conductor Transformation for System-on-Glass Application N. Ueda (Sharp, Japan),S. Katoh (Sharp, Japan),T. Matsuo (Sharp, Japan)
  • AMD2-5L Electron-Beam-Induced Crystallization of Amorphous In-Ga-Zn-O Thin Films Fabricated by UHV Sputtering T. Kamiya (Tokyo Inst. of Tech., Japan),K. Kimoto (NIMS, Japan),N. Ohashi (Tokyo Inst. of Tech., Japan, NIMS, Japan),K. Abe (Tokyo Inst. of Tech., Japan),Y. Hanyu (Tokyo Inst. of Tech., Japan),H.Kumomi (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • AMD3: Oxide TFT: Reliability (1)Special Topics of Interest on Oxide TFT
  • Thu., Dec. 5 13:30-14:55 Main Hall B
  • Chair: B. D. Ahn (Samsung Display, Korea)Co-Chair: H. Hamada (Kinki Univ., Japan)
  • AMD3-1 Invited Photo-Bias Instability of Metal Oxide Thin Film Transistors for Next Generation Active Matrix Display J. K. Jeong (Inha Univ., Korea),J. H. Song (Inha Univ., Korea)
  • AMD3-2 Influence of Charge Trapping on Hysteresis in InGaZnO Thin-Film Transistors under Negative Bias and Illumination Stress M. P. Hung (Kochi Univ. of Tech., Japan),D. Wang (Kochi Univ. of Tech., Japan),J. Jiang (Kochi Univ. of Tech., Japan),M. Furuta (Kochi Univ. of Tech., Japan)
  • AMD3-3 The Negative-Bias-Illumination-Stress with Channel Length Dependence in a-IGZO TFTs J. G. Urn (Kyung Hee Univ., Korea),S. H. Park (Kyung Hee Univ., Korea),J. U. Han (Kyung Hee Univ., Korea),J. Jang (Kyung Hee Univ., Korea)
  • AMD3-4 Photo-Response Elimination of Amorphous InGaZnO Thin Film Transistors by Introducing a Mo-doped-ZnO Passivation Layer Y.-C. Tsai (Nat. Chiao Tung Univ., Taiwan),M.-Y. Tsai (Nat. Chiao Tung Univ., Taiwan),L.-F. Teng (Nat. Chiao Tung Univ., Taiwan),P.-T. Liu (Nat. Chiao Tung Univ., Taiwan),H.-P. D. Shieh (Nat. Chiao Tung Univ., Taiwan)
  • AMD4: Oxide TFT: Reliability (2)Special Topics of Interest on Oxide TFT
  • Thu., Dec. 5 15:10-16:40 Main Hall B
  • Chair: J. K. Jeong (Inha Univ., Korea)Co-Chair: H. Kumomi (Tokyo Inst. of Tech., Japan)
  • AMD4-1 Invited Stability of Oxide TFTs J. Jang (Kyung Hee Univ., Korea),M. Mativenga (Kyung Hee Univ., Korea),J. G. Urn (Kyung Hee Univ., Korea),M. D. H. Chowdhury (Kyung Hee Univ., Korea)
  • AMD4-2 Invited Enhancement of a-IGZO Oxide TFT Performance by Novel Method Including Ultraviolet and Thermal Annealing B. D. Ahn (Samsung Display, Korea),Y. J. Tak (Samsung Display, Korea, Yonsei Univ., Korea),H. J. Kim (Yonsei Univ., Korea)
  • AMD4-3 Effect of Back Channel on the Characteristics of Solution-Derived Amorphous InZnO Thin-Film Transistors Y. Osada (Nara Inst. of S&T, Japan),Y. Ishikawa (Nara Inst. of S&T, Japan),L. Lu, Y. Uraoka (Nara Inst. of S&T, Japan)
  • AMD4-4 Fabrication and Electrical Properties of Highly Stable Amorphous InGaZnO Thin-Film Transistors P.-L. Chen (Shenzhen China Star Optoelect. Tech., China),C.-L. Chiang (Shenzhen China Star Optoelect. Tech., China),Y.-L. Chou (Shenzhen China Star Optoelect. Tech., China),S. Li (Shenzhen China Star Optoelect. Tech., China),Y.-F. Liu (Shenzhen China Star Optoelect. Tech., China),Q. Shang (Shenzhen China Star Optoelect. Tech., China)
  • AMD5: Oxide TFT: Modeling & DevicesSpecial Topics of Interest on Oxide TFT
  • Thu., Dec. 5 16:50-18:10 Main Hall B
  • Chair: J. Jang (Kyung Hee Univ., Korea)Co-Chair: K. Takatori (NLT Techs., Japan)
  • AMD5-1 Invited Modeling of Transparent Amorphous Oxide Semiconductor Thin-Film Transistor K. Abe (Tokyo Inst. of Tech., Japan),H. Kumomi (Tokyo Inst. of Tech., Japan),T. Kamiya (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • AMD5-2 Solution-Processed Metal Oxide TFTs for AMOLED Applications L.-Y. Lin (AU Optronics, Taiwan),C.-C. Cheng (AU Optronics, Taiwan),C.-Y. Liu (AU Optronics, Taiwan),M.-F. Chiang (AU Optronics, Taiwan),S.-Y. Sun (AU Optronics, Taiwan),P.-H. Wu (AU Optronics, Taiwan),M.-T. Lee (AU Optronics, Taiwan),H.-H. Wang (AU Optronics, Taiwan)
  • AMD5-3 A High Mobility Metal Oxide Thin Film Transistor with Solution Coating Process K.-H. Su (Evonik Inds., Germany),D.-V. Pham (Evonik Inds., Germany),A. Merkulov (Evonik Inds., Germany),A. Hoppe (Evonik Inds., Germany),J. Steiger (Evonik Inds., Germany),R. Anselmann (Evonik Inds., Germany)
  • AMD5-4L Effect of Annealing on Oxygen Content in SiO2/a-IGZO/SiO2 Stacks S. Oh (LG Display, Korea),J.-H. Baeck (LG Display, Korea),H. S. Shin (LG Display, Korea),J. U. Bae (LG Display, Korea),W. Shin, I. Kang (LG Display, Korea)
  • AMD6: Novel Applications
  • Fri., Dec. 6 9:00-10:20 Main Hall B
  • Chair: A. Facchetti (Polyera, USA)Co-Chair: M. Inoue (Innolux, Japan)
  • AMD6-1 Invited Printed Organic TFTs for Interfacing Circuits and Active Matrix M. Charbonneau (Minatec, France),S. Jacob (Minatec, France),M. Benwadih (Minatec, France),J. Bablet (Minatec, France),V. Fischer (Minatec, France),D. Boutry (Minatec, France),R. Coppard (Minatec, France),I. Chartier (Minatec, France),S. Abdinia (Eindhoven Univ. of Tech., the Netherlands),E. Cantatore (Eindhoven Univ. of Tech., the Netherlands),G. Maiellaro (STMicroelectronics, Italy),E. Ragonese (STMicroelectronics, Italy),G. Palmisano (Univ. of Catania, Italy),R. Gwoziecki (Minatec, France)
  • AMD6-2 Invited Device Characterizations and Novel Applications of Thin-Film Transistors M. Kimura (Ryukoku Univ., Japan),T. Matsuda (Ryukoku Univ., Japan)
  • AMD6-3L 3-D Stacked Complementary TFT Devices Using n-Type a-IGZO and p-Type F8T2 TFTs -Comparison between Stacked and Sided Configurations- T. Hasegawa (Ryukoku Univ., Japan),M. Inoue (Ryukoku Univ., Japan),T. Matsuda (Ryukoku Univ., Japan),M. Kimura (Ryukoku Univ., Japan),K. Nomura (Tokyo Inst. of Tech., Japan),T. Kamiya (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • AMD6-4L 512PPI High Resolution Mobile Displays with High Aperture Ratio and Slim Border M.-H. Lee (AU Optronics, Taiwan),H.-W. Wang (AU Optronics, Taiwan),Y.-W. Chang (AU Optronics, Taiwan),C.-H. Wu (AU Optronics, Taiwan),J.-H. Ye (AU Optronics, Taiwan),H.-H. Su (AU Optronics, Taiwan),S.-H. Lu (AU Optronics, Taiwan),A.-J. Tsai (AU Optronics, Taiwan),W.-T. Pai (AU Optronics, Taiwan),A. Huang (AU Optronics, Taiwan),S.-H. Huang (AU Optronics, Taiwan)
  • AMD7: Printed TFT
  • Fri., Dec. 6 10:40-12:20 Main Hall B
  • Chair: M. Kimura (Ryukoku Univ., Japan)Co-Chair: Y. Fujisaki (NHK, Japan)
  • AMD7-1 Invited Metal Oxides and Organic Materials for Flexible Displays Y. Xia (Polyera, USA),P. Tan (Polyera, USA),W. Zhao (Polyera, USA),H. Yan (Polyera, USA),D. Boudinet (Polyera, USA),Z. Chen (Polyera, USA),Y. Zheng (Polyera, USA),H. Usta (Polyera, USA),M. Chen (Polyera, USA),J. Fang (Polyera, USA),S. W. Huang (Polyera, USA),C. C. Hsiao (Polyera, USA),T. J. Marks (Polyera, USA),A.Facchetti (Polyera, USA, Northwestern Univ., USA)
  • AMD7-2 Low Process Temperature Organic TFT on PEN Substrate Y.-Y. Huang (Chunghwa Picture Tubes, Taiwan),S.-C. Chiang (Chunghwa Picture Tubes, Taiwan),Y.-H. Chen (Chunghwa Picture Tubes, Taiwan),I.-H. Lin (Chunghwa Picture Tubes, Taiwan),H.-M. Chang (Chunghwa Picture Tubes, Taiwan),E. Hsu (Chunghwa Picture Tubes, Taiwan)
  • AMD7-3 Flexible Single-Grain Si TFTs Fabricated from Doctor-Blade Coated Cyclopentasilane on Polyimide Substrate J. Zhang (Delft Univ. of Tech., the Netherlands),M. Trifunovic (Delft Univ. of Tech., the Netherlands),M. van der Zwan (Delft Univ. of Tech., the Netherlands),B. Mimoun (Delft Univ. of Tech., the Netherlands),H. Takagishi (JST, Japan),T. Shimoda (JST, Japan, JAIST, Japan),K. Beenakker (Delft Univ. of Tech., the Netherlands),R. Ishihara (Delft Univ. of Tech., the Netherlands)
  • AMD7-4L Invited Self-Aligned Imprint Lithography (SAIL) for Manufacturing High Performance Flexible Display Electronics H.-J. Kim (Phicot, USA),E. Holland (Phicot, USA),J. Maltabes (Phicot, USA),R. Elder (Phicot, USA),A. Jeans (Hewlett Packard, USA),C. Perlov (Hewlett Packard, USA),O. Kwon (Apple, USA),C. Taussig (e-Inc, USA),N. Morrison (Appl. Materials Germany)
  • AMD7-5L A Flexible AMOLED Display Driven by Organic TFTs with an Inkjetted Semiconductor Layer A. Miyamoto (Panasonic, Japan),Y. Okumoto (Panasonic, Japan),K. Sasai (Panasonic, Japan),K. Morita (Panasonic, Japan)
  • Poster AMDp1: Oxide TFTSpecial Topics of Interest on Oxide TFT
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp1-1 Investigation on the Oxide TFT Gate Driver Circuits Using Bias Offset Method Y. H. Jang (LG Display, Korea),H. N. Cho (LG Display, Korea),W. S. Choi (LG Display, Korea),K. I. Chun (LG Display, Korea),M.-G. Kang (LG Display, Korea),K. Choo (LG Display, Korea),B. Cho (LG Display, Korea),J. U. Bae (LG Display, Korea),W. Shin (LG Display, Korea),I. Kang (LG Display, Korea)
  • AMDp1-2 A 32-in. HD LCD-TV Display Driven by Amorphous IGZOTFTs S.-C. Liu (Shenzhen China Star Optoelect. Tech., China),C.-Y. Su (Shenzhen China Star Optoelect. Tech., China),W.-H. Li (Shenzhen China Star Optoelect. Tech., China),L.-Q. Shi (Shenzhen China Star Optoelect. Tech., China),X.-W. Lv (Shenzhen China Star Optoelect. Tech., China),Y.-T. Hu (Shenzhen China Star Optoelect. Tech., China),H.-J. Zhang (Shenzhen China Star Optoelect. Tech., China),C.-Y. Tseng (Shenzhen China Star Optoelect. Tech., China),Y.-F. Wang (Shenzhen China Star Optoelect. Tech., China),C.-C. Lo (Shenzhen China Star Optoelect. Tech., China),A. Lien( TCL Corporate Res., China)
  • AMDp1-3 Electrical Performance Enhancement of a-AZTO by a Low Temperature Treatment P.-T. Liu (Nat. Chiao Tung Univ., Taiwan),C.-S. Fuh (Nat. Chiao Tung Univ., Taiwan),L.-F. Teng (Nat. Chiao Tung Univ., Taiwan),Y.-S. Fan (Nat. Chiao Tung Univ., Taiwan),C.-H. Chang (Nat. Chiao Tung Univ., Taiwan)
  • AMDp1-4 New a-IGZO TFT Gate Driver Circuit with AC-Driven Pull-Down Circuit C.-E. Wu (Nat. Cheng Kung Univ., Taiwan),F.-H. Chen (Nat. Cheng Kung Univ., Taiwan),M.-H. Cheng (Nat. Cheng Kung Univ., Taiwan),C.-L. Lin (Nat. Cheng Kung Univ., Taiwan)
  • AMDp1-5 In-Situ Threshold Voltage Shift Monitoring of Amorphous InGaZnO Thin-Film Transistors J. H. Kang (Yonsei Univ., Korea),E. N. Cho (Yonsei Univ., Korea),I. Yun (Yonsei Univ., Korea)
  • AMDp1-6 High Reliability of Back Channel Etch-Type TFTs Using New Oxide Semiconducting Material M. Ochi (Kobe Steel, Japan),S. Morita (Kobe Steel, Japan),Y. Takanashi (Kobe Steel, Japan),H. Tao (Kobe Steel, Japan),H. Goto (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan),M. Kanamaru (Kobelco Res. Inst., Japan)
  • AMDp1-7 The Study on Sol-Gel IGZO Thin Film Transistors with Top Polymer Gate Insulators Y. W. Wang (Nat. Changhua Univ. of Education, Taiwan),M. S. Lai (Nat. Changhua Univ. of Education, Taiwan),C. Y. Huang (Nat. Changhua Univ. of Education, Taiwan),W.-C. Su (Nat. Changhua Univ. of Education, Taiwan)
  • AMDp1-8 Process Improvement for Reliability of Oxide TFT Display M. Zhang (Hefei BOE Optoelect. Tech., China),Y. Zhang (Hefei BOE Optoelect. Tech., China),J. Hu (Hefei BOE Optoelect. Tech., China),Y. Shi (Hefei BOE Optoelect. Tech., China),X. Zhang (Hefei BOE Optoelect. Tech., China),Y.-C. Chung (Hefei BOE Optoelect. Tech., China),J.-K. Kim (Hefei BOE Optoelect. Tech., China),G. Tian (Hefei BOE Optoelect. Tech., China),Y. Xu (Hefei BOE Optoelect. Tech., China)
  • AMDp1-9 Self-Aligned Top-Gate a-IGZO Thin-Film Transistor with N2 Plasma-Treated Source/Drain Regions S. Chi (Peking Univ., China),X. Xiao (Peking Univ., China),X. He (Peking Univ., China),S. Zhang (Peking Univ., China)
  • AMDp1-10 Influence of Temperature Annealing on Electrical Performances of Oxide TFT B.-L. Yeh (AU Optronics, Taiwan),C.-N. Lin (AU Optronics, Taiwan),C.-C. Wu (AU Optronics, Taiwan),C.-M. Chang (AU Optronics, Taiwan),W.-B. Wu (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan)
  • AMDp1-11L High Mobility Atmospheric-Pressure-Processed IGZO TFT with AIOx/IGZO Stack Fabricated by Mist Chemical Vapor Deposition M. Furuta (Kochi Univ. of Tech., Japan),T. Kawaharamura (Kochi Univ. of Tech., Japan),T. Kaida (Kochi Univ. of Tech., Japan),D. Wang (Kochi Univ. of Tech., Japan)
  • Poster AMDp2: Active-Matrix Devices
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp2-1 Temperature Sensor Using Poly-Si TFT and 1T1C Circuit with Gate Bias Control J. Taya (Ryukoku Univ., Japan),K. Kojima (Ryukoku Univ., Japan),T. Mukuda (Ryukoku Univ., Japan),A. Nakashima (Ryukoku Univ., Japan),Y. Sagawa (Ryukoku Univ., Japan),T. Matsuda (Ryukoku Univ., Japan),M. Kimura (Ryukoku Univ., Japan)
  • AMDp2-2 Operational Amplifier Using Poly-Si TFTs -Characteristic Comparison between Multiple Output Stage Numbers- Y. Ito (Ryukoku Univ., Japan),S. Terada (Ryukoku Univ., Japan),Y. Imuro (Ryukoku Univ., Japan),K. Setsu (Ryukoku Univ., Japan),T. Matsuda (Ryukoku Univ., Japan),M. Kimura (Ryukoku Univ., Japan)
  • AMDp2-3 Bias-Temperature Instability Modeling for On-Glass-Integrated Shift Resister Circuit Design Using Amorphous Silicon TFTs M. Shin (LG Display, Korea),J. Kang (LG Display, Korea),K. Kim (LG Display, Korea),Y. Choi (LG Display, Korea),H. Bang (LG Display, Korea),K. Lee (LG Display, Korea)
  • AMDp2-4 Optimized Pixel Design to Improve Oblique Picture Quality for 12-Domain Polymer Stabilized Vertical Alignment Display C.-H. Chen (Shenzhen China Star Optoelect. Tech., China),Z. Liao (Shenzhen China Star Optoelect. Tech., China)
  • AMDp2-5 PMOS LDD Structure and Conditions for Wide Driving Range of Driving TFT H. Jeon (Sungkyunkwan Univ., Korea, Samsung Display, Korea),S. Lee (Samsung Display, Korea),Y. Lee (Samsung Display, Korea),K. Jang (Sungkyunkwan Univ., Korea),Y.-J. Lee (Sungkyunkwan Univ., Korea),J. Yi (Sungkyunkwan Univ., Korea)
  • AMDp2-6 A Cascaded Type Level Shifter for High-Voltage Generators M. Yamashita (Tokai Univ., Japan),M. Fukuhara (Tokai Univ., Japan),M. Yoshida (Tokai Univ., Japan)
  • AMDp2-7 An Integrated a-Si:H Gate Driver Circuit Design for Low Power Consumption TFT-LCD Application Y. Qiao (Shanghai Jiao Tong Univ., China, Infovision Optoelect., China, Inst. of Jiangsu Flat-Panel-Display Tech., China),Y. Li (Infovision Optoelect., China, Inst. of Jiangsu Flat-Panel-Display Tech., China),H. Zhang (Infovision Optoelect., China, Inst. of Jiangsu Flat-Panel-Display Tech., China),C.-T. Liao (Infovision Optoelect., China, Inst. of Jiangsu Flat-Panel-Display Tech., China),X. Guo (Shanghai Jiao Tong Univ., China),T.-S. Jen (Infovision Optoelect., China, Inst. of Jiangsu Flat-Panel-Display Tech., China)
  • AMDp2-8 An AMOLED Pixel Circuit with Negative VTH Compensation Function C. Leng (Peking Univ., China),L. Wang (Peking Univ., China),S. Zhang (Peking Univ., China)
  • AMDp2-9 Formation of SiO2 Thin Films on Polycrystalline Silicon Thin Films from Polysilazane Solution by CO2 Laser Annealing D. Hishitani (Nara Inst. of S&T, Japan),M. Horita (Nara Inst. of S&T, Japan, CREST, Japan),Y. Ishikawa (Nara Inst. of S&T, Japan, CREST, Japan),Y. Watanabe (Kyushu Univ., Japan),H. Ikenoue (Kyushu Univ., Japan),Y. Uraoka (Nara Inst. of S&T, Japan, CREST, Japan)
  • AMDp2-10L Effect of H2 Annealing after BLDA for Low-Cost Poly Si TFT K. Sugihara (Univ. of the Ryukyus, Japan),K. Shimoda (Univ. of the Ryukyus, Japan),T. Okada (Univ. of the Ryukyus, Japan),T. Noguchi (Univ. of the Ryukyus, Japan)
  • AMDp2-11L Lateral Large-Grained CLC Low-Temperature Poly-Si TFTs with Sputtered High-k Gate Dielectric T. Meguro (Tohoku Gakuin Univ., Japan),A. Hara (Tohoku Gakuin Univ., Japan)
  • AMDp2-12L Self-Aligned Metal Double-Gate Ni-SPC LT Poly-Si TFTs on Glass Substrate T. Meguro (Tohoku Gakuin Univ., Japan),A. Hara (Tohoku Gakuin Univ., Japan)
  • AMDp2-13L Inkjet Printing Technique for Manufacturing Single-Crystal Films for Organic Thin-Film Transistors H. Minemawari (AIST, Japan),T. Yamada (AIST, Japan),M. Tanaka (AIST, Japan),T. Hasegawa (AIST, Japan)
  • AMDp2-14L Elevated-Electrode Structure in Organic Thin-Film Transistors S. K. Kim (Kyushu Univ., Japan),C.-H. Shim (Kyushu Univ., Japan),T. Edura (Kyushu Univ., Japan),K. Tsugita (Kyushu Univ., Japan),S. Yukiwaki (Kyushu Univ., Japan),C. Adachi (Kyushu Univ., Japan),R. Hattori (Kyushu Univ., Japan)
  • Poster AMDp3/OLEDp2: AMOLED
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp3/OLEDp2-1 A Pixel Circuit for AMOLED Displays Compensating for Threshold Voltage and Mobility Variation C.-K. Kang (Samsung Display, Korea, Sungkyunkwan Univ., Korea),B.-D. Choi (Sungkyunkwan Univ., Korea)
  • AMDp3/OLEDp2-2 A Compensation Driving Gear for the Electronic Degradation of AMOLED B.-J. Sun (Chunghwa Picture Tubes, Taiwan),Y.-Y. Huang (Chunghwa Picture Tubes, Taiwan),C.-H. Huang (Chunghwa Picture Tubes, Taiwan),S.-C. Huang (Chunghwa Picture Tubes, Taiwan)
  • AMDp3/OLEDp2-3 New Pixel Circuit Using a-IGZO TFTs to Compensating for OLED Luminance Drop of AMOLED Displays P.-S. Chen (Nat. Cheng Kung Univ., Taiwan),W.-Y. Chang (Nat. Cheng Kung Univ., Taiwan),F.-C. Chang (Nat. Cheng Kung Univ., Taiwan),C.-L. Lin (Nat. Cheng Kung Univ., Taiwan)
  • AMDp3/OLEDp2-4 Low Voltage Operation of Organic Field-Effect Transistors with Embedded Electrodes Y. Kimura (Osaka Pref. Univ., Japan),T. Nagase (Osaka Pref. Univ., Japan),T. Kobayashi (Osaka Pref. Univ., Japan),K. Takimiya (Hiroshima Univ., Japan),M. Ikeda (Nippon Kayaku, Japan),H. Naito (Osaka Pref. Univ., Japan)
  • Workshop on FPD Manufacturing, Materials and Components
  • FMC1: The 20th Anniversary: Past, Present, and Future (1)
  • Wed., Dec. 4 14:00-15:20 Main Hall A
  • Chair: R. Yamaguchi (Akita Univ., Japan)Co-Chair: M. Miyatake (Nitto Denko, Japan)
  • FMC1-1 Invited Whereis Disruptive Innovation by FPD? T. Yunogami (Fine Processing Inst., Japan)
  • FMC1-2 Past, Present, and Future: Photoresist for FPD Fabrication Y. Toyama (AZ Elect. Materials Manufacturing Japan, Japan),K. Taniguchi (AZ Elect. Materials Manufacturing Japan, Japan),T. Suzuki (AZ Elect. Materials Manufacturing Japan, Japan),H. Ikeda (AZ Elect. Materials Manufacturing Japan, Japan)
  • FMC1-3 Past, Present, and Future: Color Filters and Surface Films T. Hotta (Dai Nippon Printing, Japan)
  • FMC1-4 Past, Present, and Future: Large Size Photo-Mask for Fine Patterning at FPD Manufacturing T. Hirano (HOYA, Japan),H. Ihara (HOYA, Japan),Y. Iwanaga (HOYA, Japan),Y. Yoshikawa (HOYA, Japan),N. Imashiki (HOYA, Japan),K. Yoshida (HOYA, Japan)
  • FMC2: The 20th Anniversary: Past, Present, and Future (2)
  • Wed., Dec. 4 15:40-17:00 Main Hall A
  • Chair: K. Käläntär (Global Optical Solutions, Japan)Co-Chair: R. Yamaguchi (Akita Univ., Japan)
  • FMC2-1 Past, Present, and Future: Polarizing Film M. Miyatake (Nitto Denko, Japan),Y. Saiki (Nitto Denko, Japan)
  • FMC2-2 Past, Present, and Future: Retardation Films and Plastic Base Films T. Toyoshima (ZEON, Japan)
  • FMC2-3 Past, Present, and Future: Evolution of Mobile Phone LED Backlight Unit K. Käläntär (Global Optical Solutions, Japan),M. Shinohara (Omron, Japan)
  • FMC2-4 Invited Past, Present, and Future: Transport of Gas Molecules through Plastic Films and Organic Adhesives for Electronic Devices K. Nagai (Meiji Univ., Japan)
  • FMC3: Oxide TFT: Process TechnologiesSpecial Topics of Interest on Oxide TFT
  • Thu., Dec. 5 9:00-10:20 Main Hall A
  • Chair: T. Kamiya (Tokyo Inst. of Tech., Japan)Co-Chair: T. Arikado (Tokyo Electron, Japan)
  • FMC3-1 Invited Structural Relaxation, Crystallization, and Defect Passivation in Amorphous In-Ga-Zn-O T. Kamiya (Tokyo Inst. of Tech., Japan),K. Ide (Tokyo Inst. of Tech., Japan),K. Nomura (Tokyo Inst. of Tech., Japan),H. Kumomi (Tokyo Inst. of Tech., Japan),H. Hosono (Tokyo Inst. of Tech., Japan)
  • FMC3-2 Wet Chemical, Damage Free In-Ga-Zn-O TFT Processing P. Vermeulen (Sachem, USA),P. Janssen (Sachem, USA),L. Robichaux (Sachem, USA),C. Allen (Sachem, USA)
  • FMC3-3 In-Line Process Monitoring for Amorphous Oxide Semiconductor TFT Fabrication Using Microwave-Detected Photoconductivity Decay Technique H. Goto (Kobe Steel, Japan),H. Tao (Kobe Steel, Japan),S. Morita (Kobe Steel, Japan),Y. Takahashi (Kobe Steel, Japan),A. Hino (Kobe Steel, Japan),T. Kishi (Kobelco Res. Inst., Japan),M. Ochi (Kobe Steel, Japan),K. Hayashi (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan)
  • FMC3-4 Manufacturing Process of Oxide TFT Using Solution-Processed Photosensitive Passivation Layer M. Takeshita (ZEON, Japan),S. Abe (ZEON, Japan),T. Kojiri (ZEON, Japan),M. Hanmura (ZEON, Japan),T. Goto (Tohoku Univ., Japan),T. Ohmi (Tohoku Univ., Japan)
  • FMC4: Materials
  • Thu., Dec. 5 10:40-12:00 Main Hall A
  • Chair: R. Yamaguchi (Akita Univ., Japan)Co-Chair: T. Tomono (Toppan Printing, Japan)
  • FMC4-1 Invited Potential of Nonlinear Optical Organic Material for Green Light Source in Laser Projector T. Tomono (Toppan Printing, Japan)
  • FMC4-2 Invited Novel Non-Alkaline Glass Substrate with Ultra-Low Thermal Shrinkage for Higher Resolution Active Matrix Displays A. Koike (Asahi Glass, Japan),M. Nishizawa (Asahi Glass, Japan),H. Tokunaga (Asahi Glass, Japan),J. Akiyama (Asahi Glass, Japan),T. Tsujimura (Asahi Glass, Japan),K. Hayashi (Asahi Glass, Japan)
  • FMC4-3 Optically Specific Inkjet Inks for Displays K. Eguchi (JNC Petrochem., Japan)
  • FMC4-4 Development of Transparent Adhesive Sheet for Optical Applications A. Murakami (Nitto Denko, Japan),T. Nonaka (Nitto Denko, Japan)
  • FMC5/FLX1: Flexible Materials
  • Thu., Dec. 5 13:30-14:30 Main Hall A
  • Chair: Y. Mizushima (Corning, Japan)Co-Chair: M. Kimura (Nagaoka Univ. of Tech., Japan)
  • FMC5/FLX1-1 Invited Highly Transparent and Conductive Carbon Nanotube Film on Plastic: Cellulose-Assisted Film Deposition Followed by Solution and Photonic Processing Y. Kim (AIST, Japan),Y. Yokota (AIST, Japan),S. Shimada (AIST, Japan),R. Azumi (AIST, Japan),T. Saito (AIST, Japan),N. Minami (AIST, Japan)
  • FMC5/FLX1-2 Invited Challenges toward Reliable Evaluation of High Water Barrier Property S. Hara (AIST, Japan, CEREBA, Japan),A. Suzuki (CEREBA, Japan),H. Takahagi (CEREBA, Japan)
  • FMC5/FLX1-3 Invited Novel Materials for Printable Electronics Y. Ikeda (Teijin, Japan),T. Imamura (Teijin, Japan),Y. Tomizawa (Teijin, Japan),T. Shiro (Teijin, Japan, NanoGram, USA)
  • FMC6: Optical Films
  • Thu., Dec. 5 15:10-16:30 Mid-sized Hall A
  • Chair: T. Ishinabe (Tohoku Univ., Japan)Co-Chair: I. Amimori (A51 Tech, Japan)
  • FMC6-1 Analysis of 3D Viewing Angle Characteristics for Film Type Patterned Retarder Panel Using Extended Jones Calculus H.-H. Son (LG Display, Korea, Yonsei Univ., Korea),J.-U. Park (LG Display, Korea),W.-N. Jeong (LG Display, Korea),K.-M. Lim (LG Display, Korea),K. Oh (Yonsei Univ., Korea)
  • FMC6-2 Novel Film Patterned Retarder for Improving Viewing Angle Properties in 3D-LCDs K. Takada (FUJIFILM, Japan),T. Otani (FUJIFILM, Japan),M. Nakao (FUJIFILM, Japan),K. Ohmuro (FUJIFILM, Japan),K. Amemiya (FUJIFILM, Japan),R. Goto (FUJIFILM, Japan),A. Matsumoto (FUJIFILM, Japan),T. Katagiri (FUJIFILM, Japan),H. Kagawa (FUJIFILM, Japan),Y. Suga (FUJIFILM, Japan),Y. Ito (FUJIFILM, Japan)
  • FMC6-3 Analysis of Grayscale Inversion and Image Quality Improvement of TN-LCDs Using New Wide View Film H. Sato (FUJIFILM, Japan),A. Yamamoto (FUJIFILM, Japan),Y. Yanai (FUJIFILM, Japan),Y. Saitoh (FUJIFILM, Japan),T. Arai (FUJIFILM, Japan),Y. Ito (FUJIFILM, Japan)
  • FMC6-4 Ellipsoidal Light Diffusing Film by Controlling Collimation Angle of UV Irradiation B. Katagiri (Lintec, Japan),K. Kusama (Lintec, Japan),T. Orui (Lintec, Japan),S. Shoshi (Lintec, Japan)
  • FMC7: Manufacturing
  • Thu., Dec. 5 16:50-18:10 Mid-sized Hall A
  • Chair: R. Hattori (Kyushu Univ., Japan)Co-Chair: T. Arikado (Tokyo Electron, Japan)
  • FMC7-1 Invited Printing and Coating Technologies for Organic Electron Devices H. Okada (Univ. of Toyama, Japan),S. Naka (Univ. of Toyama, Japan)
  • FMC7-2 Invited Wireless Power Transmitting System for Mobile Devices R. Hattori (Kyushu Univ., Japan),K. Miyamoto (Kyushu Univ., Japan),H. Kanaya (Kyushu Univ., Japan),S. Tsukamoto (Kyushu Univ., Japan),H. Ishinishi (Network Appl. Eng. Lab., Japan)
  • FMC7-3 Influence of Heating on the Direct Imprinting of ZrO2 and an Idea to Improve Heating Condition for High Throughput K. Fukada (JAIST, Japan),H. Koyama (JAIST, Japan, Toppan Printing, Japan),S. Inoue (JAIST, Japan),T. Shimoda (JAIST, Japan, JST-ERATO, Japan)
  • FMC7-4 Single Crystalline ZnO Nanorods Fabricated by Mist Chemical Vapor Deposition for Optical Applications C. Li (Kochi Univ. of Tech., Japan),X. Li (Kochi Univ. of Tech., Japan),D. Wang (Kochi Univ. of Tech., Japan),T. Kawaharumura (Kochi Univ. of Tech., Japan),M. Furuta (Kochi Univ. of Tech., Japan),A. Hatta (Kochi Univ. of Tech., Japan)
  • FMC8: Lighting TechnologiesSpecial Topics of Interest on Lighting Technologies
  • Fri., Dec. 6 13:30-15:05 Main Hall A
  • Chair: K. Käläntär (Global Optical Solutions, Japan)Co-Chair: Y. Yang (Japan Display, Japan)
  • FMC8-1 Quantum Dot Enhancement of Color for LCD Systems J. V. Derlofske (3M, USA),G. Benoit (3M, USA),A. Lathrop (3M, USA),D. Lamb (3M, USA)
  • FMC8-2 New LED Design Concept for High Color Gamut Application S. J. Chang (AU Optronics, Taiwan)
  • FMC8-3 Switchable Dual Directional Backlight for Energy Saving in Automotive Displays A. Yuuki (Mitsubishi Elec., Japan),K. Itoga (Mitsubishi Elec., Japan),T. Satake (Mitsubishi Elec., Japan)
  • FMC8-4 Optical Characteristics of Directional Backlight Unit for Field-Alternative Full Resolution Auto-Stereoscopic 3D LCD K. Käläntär (Global Optical Solutions, Japan)
  • FMC8-5L Optical Design of Novel Microstructure Film for Wide Viewing TN-LCD S. Katsuta (Sharp, Japan),H. Yui (Sharp, Japan),Y. Asaoka (Sharp, Japan),E. Yamamoto (Sharp, Japan),T. Maeda (Sharp, Japan),T. Kamada (Sharp, Japan),Y. Tsuda (Sharp, Japan)
  • Poster FMCp: FPD Manufacturing, Materials & Components
  • Fri., Dec. 6 9:00-12:00 Main Hall C
  • FMCp-1 Evaluations of Reduced Graphene Oxide and Nano Graphene for Printable Transparent Conductors M. Hasegawa (Merck, Japan),Y. Hirayama (Merck, Japan)
  • FMCp-2 Transparent Polyimides with Low Coefficient of Thermal Expansion and Low Birefringence for Flexible Display M. Okazaki (Mitsui Chems., Japan),K. Fukukawa (Mitsui Chems., Japan),T. Urakami (Mitsui Chems., Japan),Y. Sakata (Mitsui Chems., Japan),A. Okubo (Mitsui Chems., Japan)
  • FMCp-3 Low Thermal Shrinkage Glass Substrate for High Definition Display M. Hayashi (Nippon Elec. Glass, Japan),S. Miwa (Nippon Elec. Glass, Japan),M. Ohji (Nippon Elec. Glass, Japan)
  • FMCp-4 Refractive Index Control by Siloxane/Nano Particle Hybrid N. Yoshida (AZ Elect. Materials Manufacturing Japan, Japan),Y. Tashiro (AZ Elect. Materials Manufacturing Japan, Japan),T. Nonaka (AZ Elect. Materials Manufacturing Japan, Japan)
  • FMCp-5 A Novel Primer for Cycloolefin Polymer with Strong Adhesion and High Durability T. Yamate (Nippon Soda, Japan),K. Kumazawa (Nippon Soda, Japan),S. Yamada (Nippon Soda, Japan),H. Suzuki (Nippon Soda, Japan)
  • FMCp-6 Materials Design for High-Resolution Performance of Resin Black Matrix at the 6th Generation Color Filters Mass Production C. H. Park (LG Display, Korea),Y. S. Na (LG Display, Korea),M. C. Sakong (LG Display, Korea),M. S. Kwak (LG Display, Korea),M. W. Nam (LG Display, Korea),S. J. Yu (LG Display, Korea),K. D. Jeong (LG Display, Korea)
  • FMCp-7 Withdrawn
  • FMCp-8 Roll-to-Roll Deposition on 100 .tm Thick Flexible Glass Substrate H. Tamagaki (Kobe Steel, Japan),Y. Ikari (Kobe Steel, Japan),N. Ohba (Kobe Steel, Japan)
  • FMCp-9 Metal Oxide Thin Films with Excellent Step Coverage Achieved by Pyrosol Process S. Kodama (Nippon Soda, Japan),K. Arai (Nippon Soda, Japan),T. Oashi (Nippon Soda, Japan),Y. Seta (Nippon Soda, Japan),K. Ogawa (Nippon Soda, Japan),S. Yamada (Nippon Soda, Japan),H. Suzuki (Nippon Soda, Japan)
  • FMCp-10 Improvement of Stamping Mura for Overcoat Layer and Column Spacer Fabricated by Imprint Lithography H.-S. Cho (LG Display, Korea),D. Kwon (LG Display, Korea),D.-H. Jang (LG Display, Korea),Y.-S. Choi (LG Display, Korea),S.-H. Jeon (LG Display, Korea)
  • FMCp-11 Development of High Optical Density Black Column Spacefor Black Matrix-Less Color Filter on TFT Y. Na (LG Display, Korea),Y. Kim (LG Display, Korea),C. Park (LG Display, Korea),M. Kwak (LG Display, Korea),D. Kang (LG Display, Korea),Y. Choi (LG Display, Korea),S. Jeon (LG Display, Korea)
  • FMCp-12 Optimization of Heat Treatment Profile Prior to Low Temperature Poly-Si TFT Fabrication Process J. Akiyama (Asahi Glass, Japan),K. Hayashi (Asahi Glass, Japan),M. Nishizawa (Asahi Glass, Japan),A. Koike (Asahi Glass, Japan)
  • FMCp-13 Triple-View and Secure Dual-View Display by Use of Three-Layered LCD Panels K. Uchida (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan)
  • FMCp-14 A Reversed Gaussian-Like Algorithm for Reducing Mask Spliced Mura on 110-in. TFT LCD Y.-Y. Chen (Shenzhen China Star Optoelect. Tech., China),Y.-H. Chen (Shenzhen China Star Optoelect. Tech., China),X. Tan (Shenzhen China Star Optoelect. Tech., China),L. Sun (Shenzhen China Star Optoelect. Tech., China),W. Chen (Shenzhen China Star Optoelect. Tech., China)
  • FMCp-15 Effect of Anneal Temperature on Local Structures of In-Ga-Zn-0 Films Evaluated by X-ray Absorption Fine Structure Analysis S. Yasuno (Kobelco Res. Inst., Japan),M. Inaba (Kobelco Res. Inst., Japan),S. Kosaka (Kobelco Res. Inst., Japan),S. Morita (Kobe Steel, Japan),A. Hino (Kobe Steel, Japan),K. Hayashi (Kobe Steel, Japan),T. Kugimiya (Kobe Steel, Japan),Y. Taniguchi (JASRI, Japan),I. Hirosawa (JASRI, Japan)
  • FMCp-16 Withdrawn
  • FMCp-17 Full High Definition Mobile Phone Screen Based on a-Si TFT Technology C. Yan (BOE Optoelect. Tech., China),K. Lu (BOE Optoelect. Tech., China),Z. Xie (BOE Optoelect. Tech., China),J. Guo (BOE Optoelect. Tech., China),X. Chen (BOE Optoelect. Tech., China),W. Wang (BOE Optoelect. Tech., China),T. Y. Min (BOE Optoelect. Tech., China),X. Dong (BOE Optoelect. Tech., China),D. Sha (BOE Optoelect. Tech., China),J. Zhang (BOE Optoelect. Tech., China),X. Chen (BOE Optoelect. Tech., China),L. Shi (BOE Optoelect. Tech., China),Y. Xue (BOE Optoelect. Tech., China),W. Zhang (BOE Optoelect. Tech., China),S. Xu (BOE Optoelect. Tech., China),T. Li (BOE Optoelect. Tech., China),Z. Tian (BOE Optoelect. Tech., China),J. Li (BOE Optoelect. Tech., China),H. Xiao (BOE Optoelect. Tech., China),G. Zhang (BOE Optoelect. Tech., China)
  • FMCp-18 Designing of Side Emitting Lens for Slim Direct LED Back Light Unit S. Park (Samsung Display, Korea),J. Seo (Samsung Display, Korea),G. Kim (Samsung Display, Korea)
  • FMCp-19 Fiber Optic Illuminator Using Recycling Light Technology for Signage Applications K. Li (Wavien, USA)
  • FMCp-20 Efficient LED Hard Edge Spot Light Using Recycling Light Technology K. Li (Wavien, USA)
  • FMCp-21 The Design of High EfficiencyLight-Guide Platewith Multi Step Wedge Structure Y. W. Chang (AU Optronics, Taiwan)
  • FMCp-22 Surface Diffusing System LCDs with Small Viewing Angle Dependence of Contrast Ratio and Color Shift N. Munemura (Keio Univ., Japan),D. Sekine (Keio Univ., Japan),A. Tagaya (Keio Univ., Japan),Y. Koike (Keio Univ., Japan)
  • FMCp-23 Thin Seamless LED Flat Lighting Panel Using Highly Scattered Optical Transmission Polymer K. Mochizuki (Nittoh Kogaku, Japan),K. Sakurai (Nittoh Kogaku, Japan),T. Iwamoto (Nittoh Kogaku, Japan),K. Oosumi (Nittoh Kogaku, Japan),Y. Shinohara (Nittoh Kogaku, Japan),A. Tagaya (Keio Univ., Japan),Y. Koike (Keio Univ., Japan)
  • FMCp-24L Characterization of SiO2/In-Ga-Zn-O Interface by Hard X-ray Photoelectron Spectroscopy and X-ray Reflectometry I. Hirosawa (JASRI, Japan),Y. Taniguchi (JASRI, Japan, SPring-8 Service, Japan),Y.-T. Cui (JASRI, Japan),H. Oji (JASRI, Japan, SPring-8 Service, Japan)
  • FMCp-25L Organic Conducting Polypyrrole-Silica Inks T. Sugiura (Tokai Univ., Japan),S. Maeda (Tokai Univ., Japan)
  • FMCp-26L Carrier Injection by Laser Doping of Doped Silicon Nanoparticles in Silicon Field Effect Transistor for Plastic Electronics T. Imamura (Teijin, Japan),Y. Ikeda (Teijin, Japan),Y. Tomizawa (Teijin, Japan),T. Daidou (Teijin, Japan),T. Shiro (Teijin, Japan, NanoGram, USA)
  • FMCp-27L Flaw Inspection and Detection for Small-Pixel TFT-Array Y. C. Wang (Nat. Chiao Tung Univ., Taiwan),B. S. Lin (Nat. Chiao Tung Univ., Taiwan),J. Hsu (ITRI, Taiwan)
  • FMCp-28L Effects of Annealing Temperatures and Substrate on Properties of ZnO Nanorods K. Utashiro (Kitami Inst. of Tech., Japan),T. Umakoshi (Kitami Inst. of Tech., Japan),Y. Abe (Kitami Inst. of Tech., Japan),M. Kawamura (Kitami Inst. of Tech., Japan),K. H. Kim (Kitami Inst. of Tech., Japan)
  • FMCp-29L Improving Crystalline Quality of Si Thin Films Solid-Phase Crystallized on Yttria-Stablized Zirconia Layers by Pulse Laser L. T. K. Mai (JAIST, Japan),S. Horita (JAIST, Japan)
  • FMCp-30L The Effects of Birefringent Fiber Content and the Difference in Refractive Indices of the Constituent Components on the Optical Properties of Isotropic Polymer Diffuser Sheet T. Kim (KIST, Korea),E. S. Lee (KIST, Korea),W. Y. Jeong (KIST, Korea),D. Y. Lim (KIST, Korea)
  • FMCp-31L Roll-to-Roll Fabricated Self-Alignment Microstructure Film for Improving the Viewing-Angle Characteristics of LCD Y. Asaoka (Sharp, Japan),T. Kanno (Sharp, Japan),D. Shinozaki (Sharp, Japan),S. Ochi (Sharp, Japan),S. Katsuta (Sharp, Japan),E. Yamamoto (Sharp, Japan),T. Maeda (Sharp, Japan),Y. Tsuda (Sharp, Japan),Y. Shimada (Sharp, Japan)
  • FMCp-32L Adaptive Solar Illuminating Conduction Components with Helios Orbital Segmented Tracing for LCD Window Display C.-J. Ou (Hsiuping Univ. of S&T, Taiwan),C. H. Lin (Hsiuping Univ. of S&T, Taiwan),C.-W. Lin (Big-Sun Energy Group, Taiwan),B.-W. Lee (Big-Sun Energy Group, Taiwan)
  • FMCp-33L Novel Four-Mask Process Using Copper Metal with ITO Buffer Layer in ADSDS TFT-LCD S. J. Choi (BOE Tech. Group, China),Y. J. Song (BOE Display Tech., China),J. Niu (BOE Tech. Group, China),J. H. Kim (BOE Display Tech., China),B. K. Jung (BOE Display Tech., China),Z. F. Cao (BOE Tech. Group, China),F. Z. Zhang (BOE Tech. Group, China),S. Sun (BOE Tech. Group, China),G. B. Hui (BOE Tech. Group, China),J. S. Xue (BOE Tech. Group, China)
  • Workshop on Plasma Displays
  • PDP1: Advanced Materials and Discharge
  • Wed., Dec. 4 14:00-15:15 Meeting Room 206
  • Chair: L. F. Weber (Consultant, USA)Co-Chair: M. Uchidoi (Japan)
  • PDP1-1 Invited Development of Graphene Coated Cu Powders for BUS Electrodes of AC PDPs Y.-K. Ko (Hongik Univ., Korea),H.-R. Choi (Hongik Univ., Korea),Y.-S. Kim (Hongik Univ., Korea)
  • PDP1-2 Invited Development of the Second Generation Calcium Magnesium Oxide Protective Layer for High Luminous Efficacy PDP Q. F. Yan (Sichuan COC Display Devices, China),K. Kotera (Sichuan COC Display Devices, China),H. Liu (Sichuan COC Display Devices, China),H. Zhou (Sichuan COC Display Devices, China),H. Zhao (Sichuan COC Display Devices, China),X. Deng (Sichuan COC Display Devices, China),P. Wang (Sichuan COC Display Devices, China)
  • PDP1-3 Computational Study on Influence of N2 Addition on Discharge Characteristics of AC PDPs in Xe/Ne Gas Mixture A. Oda (Chiba Inst. of Tech., Japan),Y. Hirano (NHK, Japan),K. Ishii (NHK, Japan)
  • PDP1-4L Electron Traps Formed by Photochromic Transition of ZnSiO Nanoparticle H. Kajiyama (Tokushima Bunri Univ., Japan),Y. Matsuura (Tokushima Bunri Univ., Japan),H. Tanaka (Tokushima Bunri Univ., Japan),A. Otomo (Hiroshima Univ., Japan),S. Inoue (Hiroshima Univ., Japan),K. Takata (Kansai Univ., Japan),K. Uchino (Kyushu Univ., Japan)
  • PDP2: Large Screen and Discharge Applications
  • Wed., Dec. 4 15:50-17:00 Meeting Room 206
  • Chair: Y.-S. Kim (Hongik Univ., Korea)Co-Chair: H. Kajiyama (Tokushima Bunri Univ., Japan)
  • PDP2-1 Invited Reproduction of 22.2 Multichannel Sound with FPD-Integrated Loudspeakers for Home Use K. Matsui (NHK, Japan),S. Oishi (NHK, Japan),S. Oode (NHK, Japan),T. Sugimoto (NHK, Japan),Y. Nakayama (NHK, Japan),H. Okubo (NHK, Japan),A. Ando (NHK, Japan),H. Sato (Foster Elec., Japan),K. Mizuno (Foster Elec., Japan),Y. Morita (Foster Elec., Japan)
  • PDP2-2 Invited Development of Super-Large-Area Film Display with LAFi Technology K. Shinohe (Shinoda Plasma, Japan),T. Hidaka (Shinoda Plasma, Japan),T. Kosako (Shinoda Plasma, Japan),H. Hirakawa (Shinoda Plasma, Japan),K. Awamoto (Shinoda Plasma, Japan),T. Shinoda (Shinoda Plasma, Japan)
  • PDP2-3L Application of AC Plasma Display Panels to Radiation Detectors Y. Shintani (Panasonic, Japan),M. Murata (Panasonic, Japan),R. Murai (Panasonic, Japan)
  • PDP2-4L Address While Display Method with Grouped Subfield Arrangement for Increasing Light Emission Duty Ratio of UHD PDPs Y. Saito (Univ. of Electro-Commun., Japan),K. Komatsu (Univ. of Electro-Commun., Japan),T. Shiga (Univ. of Electro-Commun., Japan)
  • Workshop on EL Displays and Phosphors
  • PH1: Phosphors & Their Applications (1)
  • Thu., Dec. 5 15:10-16:25 Meeting Room 204
  • Chair: T.-M. Chen (Nat. Chiao Tung Univ., Taiwan)Co-Chair: R.-J. Xie (NIMS, Japan)
  • PH1-1 Invited Finding New Eu2+ Doped Phosphors for Light-Emitting Diodes by Computational Chemistry H. Takaba (Kogakuin Univ., Japan),R. Matsui (Kogakuin Univ., Japan)
  • PH1-2 Invited Valence Estimation and Local Structure Analysis of Luminescence Centers in Phosphor Materials by X-ray Absorption Spectroscopy T. Honma (JASRI, Japan),T. Kunimoto(Tokushima Bunri Univ., Japan),K. Ohmi (Tottori Univ., Japan)
  • PH1-3 Invited High Resolution Optical Microscopy with Nanometric Light Source Excited with Electron Beam Y. Kawata (Shizuoka Univ., Japan, JST-CREST, Japan),Y. Nawa (Shizuoka Univ., Japan),S. Kanamori (Shizuoka Univ., Japan),A. Miyake (Shizuoka Univ., Japan, JST-CREST, Japan),W. Inami (Shizuoka Univ., Japan, JST-CREST, Japan),Y. Nakanishi (Shizuoka Univ., Japan)
  • PH2: Phosphors & Their Applications (2)
  • Thu., Dec. 5 16:50-18:20 Meeting Room 204
  • Chair: J. Silver (Brunel Univ., UK)Co-Chair: K. Ohmi (Tottori Univ., Japan)
  • PH2-1 Invited A Phosphor Sheet Providing Wider Color Gamut for LCDs and the Backlight System Using It Y. Ito (Dexerials, Japan),T. Hori (Dexerials, Japan),T. Kusunoki (Dexerials, Japan),H. Nomura (Dexerials, Japan),H. Kondo (Dexerials, Japan)
  • PH2-2 Invited Photoluminescent Quantum Dots in Display Products S. Coe-Sullivan (QD Vision, USA),W. Liu (QD Vision, USA),P. Allen (QD Vision, USA),J. S. Steckel (QD Vision, USA)
  • PH2-3 Invited A Novel Light Source for Projection Display Y. Li (Appotronics, China),Y. Xu (Appotronics, China),F. Hu (Appotronics, China),Z. Tian (Appotronics, China)
  • PH2-4 Nematic Liquid Crystalline Phase of Red-Emitting HEu(MoO4)2 Nanoscroll M. Watanabe (Niigata Univ., Japan),K. Uematsu (Niigata Univ., Japan),S. W. Kim (Niigata Univ., Japan),K. Toda (Niigata Univ., Japan),M. Sato (Niigata Univ., Japan)
  • PH3: Phosphors for LightingSpecial Topics of Interest on Lighting Technologies
  • Friday, Dec. 6 9:00-9:55 Main Hall A
  • Chair: Y. Li (Appotronics, China)Co-Chair: K. Hara (Shizuoka Univ., Japan)
  • PH3-1 Invited New Blue Light Excitable Red-Emitting Phosphate Phosphor K. Toda (Niigata Univ., Japan),S.-W. Kim (Niigata Univ., Japan),T. Ishigaki (Niigata Univ., Japan),T. Hasegawa (Niigata Univ., Japan),K. Uematsu (Niigata Univ., Japan),M. Sato (Niigata Univ., Japan)
  • PH3-2 Synthesis and Luminescence Characterizations of New Thiosilicates Phosphors for LED Lighting S.-P. Lee (Nat. Chiao Tung Univ., Taiwan),T.-M. Chen (Nat. Chiao Tung Univ., Taiwan),C.-H. Huang (ITRI, Taiwan),T. S. Chan (Nat. Synchrotron Radiation Res. Ctr., Taiwan)
  • PH3-3 Comparison of ACELs Formed on Copper, Silver and Gold Back Electrodes J. Silver (Brunel Univ., UK),G. R. Fern (Brunel Univ., UK),P. G. Harris (Brunel Univ., UK),P. Reip (Intrinsiq Materials, UK),A. Kong (Intrinsiq Materials, UK),P. Bishop (Johnson-Matthey Tech. Ctr., UK),A. Berzins (Johnson-Matthey Tech. Ctr., UK),S. Jones (Printed Elect., UK)
  • FED2/PH4: Applications & New Materials
  • Friday, Dec. 6 10:40-12:10 Meeting Room 206
  • Chair: Y. Gotoh (Kyoto Univ., Japan)Co-Chair: T. Kusunoki (Dexerials, Japan)
  • FED2/PH4-1 Invited Performance of Microcolumn for Fine Electron Beam Applications Y. Neo (Shizuoka Univ., Japan),A. Koike (Shizuoka Univ., Japan),H. Mimura (Shizuoka Univ., Japan),H. Murata (Meijo Univ., Japan),T. Yoshida (AIST, Japan),T. Nishi (AIST, Japan),M. Nagao (AIST, Japan)
  • FED2/PH4-2 Cathodoluminescence in Transparent Perovskite Films for RGB Colors H. Takashima (AIST, Japan),M. Nagao (AIST, Japan)
  • FED2/PH4-3 Cathodoluminescence Spectra of Single Gd2O2S:Tb3+ Nanometer Sized Phosphor Crystals Excited in a Field Emission Scanning Transmission Electron Microscope G. R. Fern (Brunel Univ., UK),X. Yan (Brunel Univ., UK),N. Wilkinson (Gatan UK, UK),J. Silver (Brunel Univ., UK)
  • FED2/PH4-4 Cathodoluminescence Spectra of Single Y2O2S:Tb3+ Nanometer Sized Phosphor Crystals Excited in a Field Emission Scanning Transmission Electron Microscope J. Silver (Brunel Univ., UK),X. Yan (Brunel Univ., UK),N. Wilkinson (Gatan UK, UK),G. Fern (Brunel Univ., UK)
  • Poster PHp: Phosphors
  • Thu., Dec. 5 9:00-12:00 Main Hall C
  • PHp-1 Characteristics of SrTiO3 or TiO2 Dispersed Dielectric Layer for Powder EL Devices K. Wani (TAZMO, Japan),T. Kanda (TAZMO, Japan),E. Hashimoto (TAZMO, Japan)
  • PHp-2 Laser Etched AC Electroluminescent Lamps J. Silver (Brunel Univ., UK),G. R. Fern (Brunel Univ., UK),P. G. Harris (Brunel Univ., UK)
  • PHp-3 Factors Affecting the Colour of the Green Emitting Phosphors in the System Sr2SiO4-Ba2SiO4 Activated by Divalent Europium Ions J. Silver (Brunel Univ., UK),G. R. Fern (Brunel Univ., UK),P. J. Marsh (Brunel Univ., UK)
  • PHp-4 Eco-Friendly AC Electroluminescent Lamps II: Comparison of Biodegradable, Rigid Substrates for Electronics J. Silver (Brunel Univ., UK),G. R. Fern (Brunel Univ., UK),P. G. Harris (Brunel Univ., UK)
  • PHp-5 Femtosecond Laser Irradiation to ZnS Phosphor for Inorganic Electroluminescent Displays K. Nabesaka (Nara Inst. of S&T, Japan),Y. Ishikawa (Nara Inst. of S&T, Japan, CREST, Japan),T. Doe (Nara Inst. of S&T, Japan),N. Taguchi (Image Tech, Japan),Y. Hosokawa (Nara Inst. of S&T, Japan),Y. Uraoka (Nara Inst. of S&T, Japan, CREST, Japan)
  • PHp-6 Effect of Manganese on the Crystal Structure of Colloidal Zinc Sulfide in the Presence of Sodium Chloride N. Sergeeva (Saint-Petersburg State Tech. Inst., Russia),M. Tsvetkova (Saint-Petersburg State Tech. Inst., Russia),A. Abizov (Saint-Petersburg State Tech. Inst., Russia),S. Bogdanov (Saint-Petersburg State Tech. Inst., Russia)
  • PHp-7 Electroluminescence from DC Biased ZnS:TbF3 Phosphor Layers Having Oxide Semiconductor K. Yanagihara (Meiji Univ., Japan),N. Miura (Meiji Univ., Japan),H. Matsumoto (Meiji Univ., Japan)
  • PHp-8 Development of ZnO Luminescent Thin Filmsfor Electron Beam Excitation Assisted Optical Microscope S. Kanamori (Shizuoka Univ., Japan),A. Miyake (Shizuoka Univ., Japan, JST-CREST, Japan),W. Inami (Shizuoka Univ., Japan, JST-CREST, Japan),H. Kominami (Shizuoka Univ., Japan),Y. Kawata (Shizuoka Univ., Japan, JST-CREST, Japan),Y. Nakanishi (Shizuoka Univ., Japan)
  • PHp-9 Synthesis of Eu3+ Doped Fluoride Phosphors Using PTFE H. Mizobuchi (Niigata Univ., Japan),K. Uematsu (Niigata Univ., Japan),S. W. Kim (Niigata Univ., Japan),T. Ishigaki (Niigata Univ., Japan),K. Toda (Niigata Univ., Japan),M. Sato (Niigata Univ., Japan)
  • PHp-10 Synthesis and Luminescent Properties of Eu-Doped Sc-Based Phosphors with Perovskite Related Structures Y. Fujita (Tokushima Bunri Univ., Japan),T. Kunimoto (Tokushima Bunri Univ., Japan),T. Honma(JASRI, Japan),M. Mikami (Mitsubishi Chem., Japan),Y. Shimomura (Mitsubishi Chem., Japan)
  • PHp-11 Synthesis and Luminescence Properties of Novel Blue-Emitting Sr6(Y,Ce)2Al4O15 Phosphors Y. Kawano (Niigata Univ., Japan),K. Seki (Niigata Univ., Japan),K. Uematsu (Niigata Univ., Japan),S. W. Kim (Niigata Univ., Japan),T. Ishigaki (Niigata Univ., Japan),M. Sato (Niigata Univ., Japan),K. Toda (Niigata Univ., Japan)
  • PHp-12 Study on Luminescence Properties of New Borogermanate Phosphors T. Hasegawa (Niigata Univ., Japan),N. Sato (Niigata Univ., Japan),T. Ishigaki (Niigata Univ., Japan),S. W. Kim (Niigata Univ., Japan),K. Uematsu (Niigata Univ., Japan),K. Toda (Niigata Univ., Japan),M. Sato (Niigata Univ., Japan)
  • PHp-13 Photoluminescence of Perovskite-Type Alkaline-Earth Stannates Thin Films Using a Thick Nanosheet Seed Layer H. Takashima (AIST, Japan)K. Ueda (Kyushu Inst. of Tech., Japan),K. Ikegami (AIST, Japan)
  • PHp-14 Synthesis of YVO4 Nanophosphors by Microemulsion-Mediated Solution Method Y. Yamazaki (Nagaoka Univ. of Tech., Japan),A. Ikeguchi (Nagaoka Univ. of Tech., Japan),A. Isomae (Nagaoka Univ. of Tech., Japan),A. Kato (Nagaoka Univ. of Tech., Japan)
  • PHp-15 Wavelength Conversion Material Phosphor-Glass Composites for High Power Solid-State Lighting N. Fujita (Nippon Elec. Glass, Japan),M. Iwao (Nippon Elec. Glass, Japan),S. Fujita (Nippon Elec. Glass, Japan),M. Ohji (Nippon Elec. Glass, Japan)
  • PHp-16 Double-Layered CuInS2/ZnS Quantum Dot-Polymer Plate-Based High-Color Rendering White Light-Emitting Diode J.-H. Kim (Hongik Univ., Korea),W.-S. Song (Hongik Univ., Korea),J.-H. Lee (Hongik Univ., Korea),H.-D. Kang (Hongik Univ., Korea),H. Yang (Hongik Univ., Korea)
  • PHp-17 Silica-Embedded Quantum Dot-Based White LED and Effect of Silica on Device Stability Behavior W.-S. Song (Hongik Univ., Korea),J.-H. Kim (Hongik Univ., Korea),K.-H. Lee (Hongik Univ., Korea),H.-S. Lee (Hongik Univ., Korea),S.-H. Lee (Hongik Univ., Korea),H. Yang (Hongik Univ., Korea)
  • PHp-18 Withdrawn
  • PHp-19 A Study on Thermal Characteristics for High Power LEDs S. Park (Samsung Display, Korea),Y. Kim (Samsung Display, Korea),G. Kim (Samsung Display, Korea)
  • PHp-20L Improvement of Light Out-Coupling Efficiency by Coating MgO Nanoparticles in Inorganic TFEL Devices S. Kunioka (Tottori Univ., Japan),Y. Itagaki (Tottori Univ., Japan),K. Ohmi (Tottori Univ., Japan)
  • PHp-21L Photo-Luminescence from Carbon Nitride Thin Films Deposited by RF Sputtering Technique M. Satake (Ryukoku Univ., Japan),T. Okawa (Okayama Univ. of Sci., Japan),K. Itoh (Ryukoku Univ., Japan),K. Kametomo (Okayama Univ. of Sci., Japan),K. Takarabe (Okayama Univ. of Sci., Japan),S. Yamamoto (Ryukoku Univ., Japan)
  • PHp-22L Cathodoluminescent Properties of UV Emitting (Zn1-XMgX) Al2O4 Phosphor T. Ishinaga (Shizuoka Univ., Japan),H. Kominami (Shizuoka Univ., Japan),Y. Nakanishi (Shizuoka Univ., Japan),K. Hara (Shizuoka Univ., Japan)
  • PHp-23L Advanced Microreactor System with Glass Mixer Cell for Synthesizing Nanophosphors K. Yamashina (Tottori Univ., Japan),H. Okura (Merck, Japan),R. Sakata (Tottori Univ., Japan),R. Komiyama (Tottori Univ., Japan),H. Miyashita (Tottori Univ., Japan),S.-S. Lee (Tottori Univ., Japan),K. Ohmi (Tottori Univ., Japan)
  • PHp-24L Effect of Temperature and Chemical Potential of Anion on Kinetic Growth of Zinc Sulfide Nanocrystal T. Lee (KAIST, Korea),E. S. Kim (KAIST, Korea),Y. Lee (KAIST, Korea),D. Y. Jeon (KAIST, Korea)
  • PHp-25L Improve the Stability of Quantum Dots with Silica and Applying Quantum Dot Film as a New Type White Light Packaging System I. S. Sohn (Chonnam Nat. Univ., Korea),W. B. Im (Chonnam Nat. Univ., Korea)
  • Workshop on Field Emission Display and CRT
  • FED1: Novel Devices & Applications
  • Fri., Dec. 6 9:10-10:30 Meeting Room 206
  • Chair: M. Nagao (AIST, Japan)Co-Chair: Y. Neo (Shizuoka Univ., Japan)
  • FED1-1 Invited Field Assisted Photocathode with Plasmonic Antennas M. Niigaki (Hamamatsu Photonics, Japan),T. Hirohata (Hamamatsu Photonics, Japan),W. Akahori (Hamamatsu Photonics, Japan)
  • FED1-2 Invited Active-Matrix Drive Circuit for Image Sensor Consisting of Field Emitter Array and Avalanche Photoconductor Y. Honda (NHK, Japan),M. Nanba (NHK, Japan),K. Miyakawa (NHK, Japan),M. Kubota (NHK, Japan),N. Egami (Kinki Univ., Japan)
  • FED1-3 Highly Reliable MIM-Cathode-Arrays for Large-Size FED M. Ikeda (Hitachi, Japan),T. Kusunoki (Hitachi, Japan),M. Sagawa (Hitachi, Japan),M. Suzuki (Hitachi, Japan),E. Nishimura (Hitachi, Japan),T. Hirano (Hitachi, Japan)
  • FED2/PH4: Applications & New Materials
  • Fri., Dec. 6 10:40-12:10 Meeting Room 206
  • Chair: Y. Gotoh (Kyoto Univ., Japan)Co-Chair: T. Kusunoki (Dexerials, Japan)
  • FED2/PH4-1 Invited Performance of Microcolumn for Fine Electron Beam Applications Y. Neo (Shizuoka Univ., Japan),A. Koike (Shizuoka Univ., Japan),H. Mimura (Shizuoka Univ., Japan),H. Murata (Meijo Univ., Japan),T. Yoshida (AIST, Japan),T. Nishi (AIST, Japan),M. Nagao (AIST, Japan)
  • FED2/PH4-2 Cathodoluminescence in Transparent Perovskite Films for RGB Colors H. Takashima (AIST, Japan),M. Nagao (AIST, Japan)
  • FED2/PH4-3 Cathodoluminescence Spectra of Single Gd2O2S:Tb3+ Nanometer Sized Phosphor Crystals Excited in a Field Emission Scanning Transmission Electron Microscope G. R. Fern (Brunel Univ., UK),X. Yan (Brunel Univ., UK),N. Wilkinson (Gatan UK, UK),J. Silver (Brunel Univ., UK)
  • FED2/PH4-4 Cathodoluminescence Spectra of Single Y2O2S:Tb3+ Nanometer Sized Phosphor Crystals Excited in a Field Emission Scanning Transmission Electron Microscope J. Silver (Brunel Univ., UK),X. Yan (Brunel Univ., UK),N. Wilkinson (Gatan UK, UK),G. R. Fern (Brunel Univ., UK)
  • FED3: Fabrication Process & CNT Emitters
  • Fri., Dec. 6 13:30-15:00 Meeting Room 206
  • Chair: H. Mimura (Shizuoka Univ., Japan)Co-Chair: H. Shimawaki (Hachinohe Inst. of Tech., Japan)
  • FED3-1 Invited Fabrication of Spindt-Type FEAs with Volcano-Structured Focusing Electrode M. Nagao (AIST, Japan),T. Yoshida (AIST, Japan)
  • FED3-2 Evaluations for Graphene Flower Cloth as a Field Emitter and Its Applications Y. Iwai (Onizuka Glass, Japan, Shizuoka Univ., Japan),K. Muramatsu (Incubation Alliance, Japan),A. Jyouzuka (Onizuka Glass, Japan),T. Nakamura (Onizuka Glass, Japan),Y. Onizuka (Onizuka Glass, Japan),H. Mimura (Shizuoka Univ., Japan)
  • FED3-3 Fabrication of Carbon Nanotube Field Emitter with Side-Gate Electrode and Its Emission Property S. Okawaki (Osaka Univ., Japan),S. Nitta (Osaka Univ., Japan),S. Abo (Osaka Univ., Japan),F. Wakaya (Osaka Univ., Japan),M. Takai (Osaka Univ., Japan)
  • FED3-4 Microscopic Properties of Carbon Films That Remarkably Improves Field Emission Features S. Horie (Univ. of Tsukuba, Japan),K. Asanagi (Univ. of Tsukuba, Japan),T. Higuchi (Univ. of Tsukuba, Japan),Y. Yamada (Univ. of Tsukuba, Japan),M. Sasaki (Univ. of Tsukuba, Japan)
  • FED4: FE Materials & Mechanisms
  • Fri., Dec. 6 15:10-16:30 Meeting Room 206
  • Chair: M. Sasaki (Univ. of Tsukuba, Japan)Co-Chair: F. Wakaya (Osaka Univ., Japan)
  • FED4-1 Work Function Measurements of W(100) Surface Modified by Neodymium Oxide by Using PEEM and FEM T. Kawakubo (Kagawa Nat. College of Tech., Japan),H. Nakane (Muroran Inst. of Tech., Japan)
  • FED4-2 Measurement of Work Function of Hafnium Nitride Films at Elevated Temperatures in Ultra High Vacuum S. Fujiwara (Kyoto Univ., Japan)S. Hogyoku (Kyoto Univ., Japan)H. Tsuji (Kyoto Univ., Japan)Y. Gotoh (Kyoto Univ., Japan)
  • FED4-3 Evaluation of Radiation Tolerance of Hafnium Nitride Field Emitter Arrays Y. Gotoh (Kyoto Univ., Japan),Y. Yasutomo (Kyoto Univ., Japan),H. Tsuji (Kyoto Univ., Japan)
  • FED4-4 Photoresponse of MOS Cathodes Based on Nanocrystalline Silicon H. Shimawaki (Hachinohe Inst. of Tech., Japan),Y. Neo (Shizuoka Univ., Japan),H. Mimura (Shizuoka Univ., Japan),F. Wakaya (Osaka Univ., Japan),M. Takai (Osaka Univ., Japan)
  • Workshop on OLED Displays and Related Technologies
  • OLED1: Materials and Devices
  • Thu., Dec. 5 9:00-10:30 Conference Hall
  • Chair: T. Wakimoto (Merck, Japan)Co-Chair: T. Inoue (TDK, Japan)
  • OLED1-1 Invited New Routes of Triplet Harvesting in Organic Light Emitting Diodes C. Adachi (Kyushu Univ., Japan)
  • OLED1-2 Invited High Performance All-Phosphorescent Three Color White OLEDs Based on a New Blue Phosphorescent Emitter S. Watanabe (BASF, Germany),S. Metz (BASF, Germany),P. Murer (BASF, Germany),H. Wolleb (BASF, Germany),G. Wagenblast (BASF, Germany),C. Lennartz (BASF, Germany),U. Heinemeyer (BASF, Germany),I. Münster (BASF, Germany)
  • OLED1-3 Development of Highly Efficient and Long-Lived Light-Blue Phosphorescent Material Technology H. Ito (Konica Minolta, Japan),K. Hiyama (Konica Minolta, Japan),H. Kita (Konica Minolta, Japan)
  • OLED1-4L Invited Improving Efficiency of Blue Fluorescent OLED by Controlling Molecular Shape of Dopant K. Okinaka (Idemitsu Kosan, Japan),T. Ogiwara (Idemitsu Kosan, Japan),H. Ito (Idemitsu Kosan, Japan),Y. Mizuki (Idemitsu Kosan, Japan),R. Naraoka (Idemitsu Kosan, Japan),M. Funahashi (Idemitsu Kosan, Japan),H.Kuma (Idemitsu Kosan, Japan)
  • OLED2: Display Technologies
  • Thu., Dec. 5 10:40-12:00 Conference Hall
  • Chair: H. Kuma (Idemitsu, Japan)Co-Chair: S. Enomoto (Toshiba Lighting & Tech., Japan)
  • OLED2-1 Active Matrix OLED Microdisplay for Augmented Reality Applications with Improved Color Space M. Thomschke (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany),K. Fehse (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany),B. Richter (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany),P. Wartenberg (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany),R. Pfeifer (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany),U. Vogel (Fraunhofer Ctr. for Organic Materials & Elect. Devices, Germany)
  • OLED2-2 Improved Bi-Directional Illumination Transparent White Organic Light-Emitting Diodes with Asymmetric Multilayer Electrode C.-H. Yuan (Nat. Taiwan Univ. of S&T, Taiwan),Y.-H. Liu (Ming Chi Univ. of Tech., Taiwan),K.-T. Chen (Ming Chi Univ. of Tech., Taiwan),W.-C. Su (Nat. Taiwan Univ. of S&T, Taiwan),A.-K. Cheng (Nat. Taiwan Univ. of S&T, Taiwan),S.-B. Chen (Nat. Taiwan Univ. of S&T, Taiwan),C.-F. Lin (Ming Chi Univ. of Tech., Taiwan),S.-W. Liu (Ming Chi Univ. of Tech., Taiwan),C.-C. Lee (Nat. Taiwan Univ. of S&T, Taiwan)
  • OLED2-3 Wide View-Angle Top-Emitting Organic Light-Emitting Diodes Based on Green Fluorescent Dopant: Research on Transparent Electrode and Angular Characteristic C.-F. Lin (Ming Chi Univ. of Tech., Taiwan),C.-H. Yuan (Nat. Taiwan Univ. of S&T, Taiwan),Y.-C. Chiu (Ming Chi Univ. of Tech., Taiwan),Y.-H. Liu (Ming Chi Univ. of Tech., Taiwan),K.-T. Chen (Ming Chi Univ. of Tech., Taiwan),Z.-Y. Lin (Ming Chi Univ. of Tech., Taiwan),W.-C. Su (Nat. Taiwan Univ. of S&T, Taiwan),S.-W. Liu (Ming Chi Univ. of Tech., Taiwan),C.-C. Lee (Nat. Taiwan Univ. of S&T, Taiwan)
  • OLED2-4L Enabling Dark Injection SCLC to Characterize Trapping in OLED Charge Transport Layers F. Bloom (Novaled, Germany),O. Langguth (Novaled, Germany),T. Canzler (Novaled, Germany)
  • OLED3: Flexible and Backplane Technologies
  • Thu., Dec. 5 13:30-14:55 Conference Hall
  • Chair: K. Monzen (Nissan Chem. Inds., Japan)Co-Chair: Y. Sakai (Mitsubishi Chem., Japan)
  • OLED3-1 Invited Polymer and Crystalline Small Molecule Organic Semiconductor Materials for Mass Produced Displays M. James (Merck Chems., UK),I. Afonina (Merck Chems., UK),T. Backlund (Merck Chems., UK),R. Bhintade (Merck Chems., UK),S. Bain (Merck Chems., UK),T. Cull (Merck Chems., UK),G. Lloyd (Merck Chems., UK),D. Sparrowe (Merck Chems., UK),L.-W. Tan (Merck Chems., UK),P. Wierzchowiec (Merck Chems., UK),M. Verrall (Merck Chems., UK)
  • OLED3-2 Fabrication of High Performance, Flexible and Solution Processed OTFTs for Display Backplanes K. L. McCall (Ctr. for Process Innovation, UK),B. A. Coombs (Ctr. for Process Innovation, UK),S. D. Ogier (Ctr. for Process Innovation, UK)
  • OLED3-3 Flexible AM-OLED Display on Ultra-Thin Glass C. C. Kuo (Chunghwa Picture Tubes, Taiwan),J.-Y. Chiou (Chunghwa Picture Tubes, Taiwan),S.-F. Liu (Chunghwa Picture Tubes, Taiwan),C.-H. Chiu (Chunghwa Picture Tubes, Taiwan),C.-H. Lin (Chunghwa Picture Tubes, Taiwan),Y.-C. Sun (Chunghwa Picture Tubes, Taiwan),M.-C. Chen (Chunghwa Picture Tubes, Taiwan),Y.-W. Chiu (Chunghwa Picture Tubes, Taiwan)
  • OLED3-4L Invited Flexible and Printed Organic TFT Devices and Integrated Circuits S. Tokito (Yamagata Univ., Japan)
  • OLED4: Process Technologies
  • Thu., Dec. 5 15:10-16:30 Conference Hall
  • Chair: S. Naka (Univ. of Toyama, Japan)Co-Chair: T. Fukuda (Saitama Univ., Japan)
  • OLED4-1 Surface Morphology Control of Organic Semiconductor Layers Using Surface Control Additives on Solution Processes K. Sakanoue (Kyushu Univ., Japan),H. Harada (Kyushu Univ., Japan),K. Ando (Kyushu Univ., Japan),J. Fukai (Kyushu Univ., Japan),M. Aonuma (Panasonic, Japan),C. Adachi (Kyushu Univ., Japan)
  • OLED4-2 Polymer Light Emitting Diodes with PEDOT:PSS Anode Deposited by Inkjet Printing J. Ha (Seoul Nat. Univ., Korea),J. Park (Seoul Nat. Univ., Korea),J. Ha (Seoul Nat. Univ., Korea),D. Kim (Seoul Nat. Univ., Korea),C. Lee (Seoul Nat. Univ., Korea),Y. Hong (Seoul Nat. Univ., Korea)
  • OLED4-3 Withdrawn
  • OLED4-4L Vacuum Based Fine Patterning of Organic Emissive Layers for AMOLED Displays M. Burghart (Von Ardenne, Germany),A. Dutkowiak (Von Ardenne, Germany),G. Haasemann (Von Ardenne, Germany),L. Tandler (Von Ardenne, Germany),R. Seifert (Von Ardenne, Germany),J. Richter (Von Ardenne, Germany),F. Schröter (Von Ardenne, Germany),U. Seifert (Von Ardenne, Germany)
  • OLED4-5L Invited New Transparent Liquid Desiccant for OLED Application Y. Hoshina (Futaba, Japan),T. Niyama (Futaba, Japan),S. Tanaka (Futaba, Japan),M. Miyagawa (Futaba, Japan)
  • OLED5: OLED for Lighting ApplicationsSpecial Topics of Interest on Lighting Technologies
  • 16:50-18:15 Conference Hall
  • Chair: Y. Kijima (Sony, Japan)Co-Chair: T. Ikuta (JNC Petrochem., Japan)
  • OLED5-1 Invited Recent Progress of OLED Performance for Lighting Application K. Furukawa (Konica Minolta, Japan),K. Kato (Konica Minolta, Japan),T. Iwasaki (Konica Minolta, Japan)
  • OLED5-2 Out-Coupling Enhancement of OLEDs with Diffractive Micro Lens Film Y. Kurita (Mitsubishi Rayon, Japan),H. Koshitouge (Mitsubishi Rayon, Japan),K. Mizuhara (Mitsubishi Rayon, Japan),D. Okuno (Mitsubishi Rayon, Japan),T. Tokimitsu (Mitsubishi Rayon, Japan)
  • OLED5-3 Highly Transmissive One-Side-Emission OLED Panel with Solid Encapsulation and Peripheral Grid Electrode D. Kato (Toshiba, Japan),K. Sugi (Toshiba, Japan),T. Ono (Toshiba, Japan),A. Amano (Toshiba, Japan),T. Sawabe (Toshiba, Japan),T. Sugizaki (Toshiba, Japan),H. Kakizoe (Toshiba, Japan),Y. Mizuno (Toshiba, Japan),Y. Shinjo (Toshiba, Japan),S. Enomoto (Toshiba, Japan),I. Amemiya (Toshiba, Japan)
  • OLED5-4L A 56-in. High Mobility Metal Oxide Thin Film Transistors Active-Matrix Organic Light-Emitting Diode Television T.-H. Shih (AU Optronics, Taiwan),P.-L. Lin (AU Optronics, Taiwan),L.-F. Lin (AU Optronics, Taiwan),H.-C. Ting (AU Optronics, Taiwan),C.-L. Chen (AU Optronics, Taiwan),S.-J. Yu (AU Optronics, Taiwan),L. Tsai (AU Optronics, Taiwan),C.-H. Liu (AU Optronics, Taiwan),H.-S. Lin (AU Optronics, Taiwan),C.-Y. Chen (AU Optronics, Taiwan),L.-H. Chang (AU Optronics, Taiwan),Y.-H. Lin (AU Optronics, Taiwan)
  • Poster OLEDp1: OLED Technologies
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • OLEDp1-1 Optical and Electrical Properties of MoO3/Ag/MoO3 Multilayer as Transparent Anode in Inverted Top-Emitting Organic Light Emitting Devices by Using Multistep Vacuum Deposition M. Shibasaki (Tokyo Polytechnic Univ., Japan),T. Matuzaki (Tokyo Polytechnic Univ., Japan),K. Sakurai (Tokyo Polytechnic Univ., Japan),T. Uchida (Tokyo Polytechnic Univ., Japan)
  • OLEDp1-2 Influence of Substrate Temperature on Luminance Characteristics of Organic Light-Emitting Diode Fabricated by Ultrasonic Deposition Method A. Sato (Saitama Univ., Japan),T. Fukuda (Saitama Univ., Japan),N. Kamata (Saitama Univ., Japan),T. Yoshitomi (Calsonic Kansei, Japan)
  • OLEDp1-3 Novel Polymerizable Liquid Crystal and Its Reverse Wavelength Dispersion Property K. Sakamoto (ZEON, Japan),K. Okuyama (ZEON, Japan),S. Kiriki (ZEON, Japan),K. Taira (ZEON, Japan),M. Aimatsu (ZEON, Japan),H. Ooishi (ZEON, Japan),H. Shu (ZEON, Japan)
  • OLEDp1-4 Efficiency Control of Organic Light-Emitting Diodes for High Contrast Ratio M. J. Park (Kyung Hee Univ., Korea),Y. H. Son (Kyung Hee Univ., Korea),Y. J. Kim (Kyung Hee Univ., Korea),J. H. Kwon (Kyung Hee Univ., Korea)
  • OLEDp1-5 Withdrawn
  • OLEDp1-6 High Efficiency Orange-Red Phosphorescent Iridium(III) Complexes for Solution-Processable Organic Light-Emitting Diode Based onSmall-Molecule Mixed Host W.-C. Su (Nat. Taiwan Univ. of S&T, Taiwan),C.-H. Yuan (Nat. Taiwan Univ. of S&T, Taiwan),A.-K. Cheng (Nat. Taiwan Univ. of S&T, Taiwan),S.-B. Chen, C.-F. Lin (Ming Chi Univ. of Tech., Taiwan),Y.-C. Chiu (Ming Chi Univ. of Tech., Taiwan),Z.-Y. Lin (Ming Chi Univ. of Tech., Taiwan),S.W. Liu (Ming Chi Univ. of Tech., Taiwan),C.-C. Lee (Nat. Taiwan Univ. of S&T, Taiwan)
  • OLEDp1-7 Flexible OLEDs on Polyimide-Graphene Composite Film and Properties W. S. Cho (Kyungpook Nat. Univ., Korea),M. Y. Lee (Kyungpook Nat. Univ., Korea),H. H. Kim (Kyungpook Nat. Univ., Korea),G. S. Kwak (Kyungpook Nat. Univ., Korea),S. Y. Park (Kyungpook Nat. Univ., Korea),L. S. Park (Kyungpook Nat. Univ., Korea)
  • OLEDp1-8 Highly Efficient Phosphorescent White Organic Light-Emitting Devices with Theoretical Efficiency Using Single Host Structure J.-M. Do (Soonchunhyang Univ., Korea),J.-H. Jung (Soonchunhyang Univ., Korea),J.-G. Choi, D.-G. Moon (Soonchunhyang Univ., Korea)
  • OLEDp1-9 Highly Efficient Phosphorescent Yellow OLED for Two Peak White Tandem OLED Application Y. J. Kim (Kyung Hee Univ., Korea),Y. H. Son (Kyung Hee Univ., Korea),S. H. Kim (Kyung Hee Univ., Korea),J. H. Kwon (Kyung Hee Univ., Korea)
  • OLEDp1-10 White Organic Light-Emitting Diodes Using p- and n-Type Emissive Host Materials with Single Red Dopantin Emitting Layer J.-A. Yoon (Hoseo Univ., Korea),N. H. Kim (Hoseo Univ., Korea),S. I. Yoo (Hoseo Univ., Korea),J. W. Kim (Hoseo Univ., Korea),C.-B. Moon (Hoseo Univ., Korea),A. Turak (McMaster Univ., Canada),W. Y. Kim (Hoseo Univ., Korea, McMaster Univ., Canada)
  • OLEDp1-11 Yellow Emitting Material for OLED and Remote Phosphor Application for Lighting A. Stankevich (NAS Belarus, Belarus),A. Murauski (NAS Belarus, Belarus),A. Muraysky (NAS Belarus, Belarus),V. Petushok (NAS Belarus, Belarus),V. Olkhovic (NAS Belarus, Belarus),V. Agabekov (NAS Belarus, Belarus)
  • OLEDp1-12 Flexible Thin Film Encapsulation with Spatially Resolved Atomic Layer Deposition S. H. Yong (Sungkyunkwan Univ., Korea),H. S. Yoo (Sungkyunkwan Univ., Korea),S. M. Cho (Sungkyunkwan Univ., Korea),H. Chae (Sungkyunkwan Univ., Korea)
  • OLEDp1-13 Characterization of Metal Nanowire Synthesis for Flexible Transparent Electrodes S. Choi (Sungkyunkwan Univ., Korea),W. Hwang (Sungkyunkwan Univ., Korea),S. M. Cho, H. Chae (Sungkyunkwan Univ., Korea)
  • OLEDp1-14 OLED Deposition System Using Plane-Source Evaporation Techniques S.-H. Lai (ITRI, Taiwan),C.-C. Chen (ITRI, Taiwan),C.-C. Wang (ITRI, Taiwan),F.-C. Tung (ITRI, Taiwan),S.-H. Chen (ITRI, Taiwan),Y.-S. Wanc (ITRI, Taiwan)
  • OLEDp1-15 High Color Rendition White Organic Light-Emitting Diodes with Excimer and Fluorescent Emitter for Lighting Application Y. Jiang (Hong Kong Univ. of S&T, Hong Kong),Z. Xie (Hong Kong Baptist Univ., Hong Kong),W.-Y. Wong (Hong Kong Baptist Univ., Hong Kong),H.-S. Kwok (Hong Kong Univ. of S&T, Hong Kong)
  • OLEDp1-16 Electroluminescence Improvement of Quantum Dots Light Emitting Diodesthrough Organic Hole Transport Layer Optimization M. D. Ho (Sungkyunkwan Univ., Korea),D. Kim (Sungkyunkwan Univ., Korea),N. Kim (Sungkyunkwan Univ., Korea),H. Chae (Sungkyunkwan Univ., Korea)
  • OLEDp1-17L Withdrawn
  • OLEDp1-18L An Organic-Inorganic Hybrid Light-Emitting Diode Containing Molybdenum Disulfide Flakes inside the Emissive Layer T.-H. Song (Univ. of Seoul, Korea),H. S. Lee (Yonsei Univ., Korea),J. H. Jeon (Korea Aerospace Univ., Korea),S. Im (Yonsei Univ., Korea),W.-S. Hong (Univ. of Seoul, Korea)
  • OLEDp1-19L MoO3/Metal/MoO3 Transparent Electrode for OLEDs K. Banzai (Univ. of Toyama, Japan),S. Naka (Univ. of Toyama, Japan),H. Okada (Univ. of Toyama, Japan)
  • OLEDp1-20L Solution-Processed White Organic Light-Emitting Diodes J.-Y. Liao (ITRI, Taiwan),H.-C. Yeh (ITRI, Taiwan),T.-C. Chao (ITRI, Taiwan),J.-S. Lin (ITRI, Taiwan),C.-H. Chou (ITRI, Taiwan),M.-R. Tseng (ITRI, Taiwan)
  • OLEDD1-21L Withdrawn
  • Poster AMDp3/OLEDp2: AMOLED
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • AMDp3/OLEDp2-1 A Pixel Circuit for AMOLED Displays Compensating for Threshold Voltage and Mobility Variation C.-K. Kang (Samsung Display, Korea, Sungkyunkwan Univ., Korea),B.-D. Choi (Sungkyunkwan Univ., Korea)
  • AMDp3/OLEDp2-2 A Compensation Driving Gear for the Electronic Degradation of AMOLED B.-J. Sun (Chunghwa Picture Tubes, Taiwan),Y.-Y. Huang (Chunghwa Picture Tubes, Taiwan),C.-H. Huang (Chunghwa Picture Tubes, Taiwan),S.-C. Huang (Chunghwa Picture Tubes, Taiwan)
  • AMDp3/OLEDp2-3 New Pixel Circuit Using a-IGZO TFTs to Compensating for OLED Luminance Drop of AMOLED Displays P.-S. Chen (Nat. Cheng Kung Univ., Taiwan),W.-Y. Chang (Nat. Cheng Kung Univ., Taiwan),F.-C. Chang (Nat. Cheng Kung Univ., Taiwan),C.-L. Lin (Nat. Cheng Kung Univ., Taiwan)
  • AMDp3/OLEDp2-4 Low Voltage Operation of Organic Field-Effect Transistors with Embedded Electrodes Y. Kimura, T. Nagase (Osaka Pref. Univ., Japan),T. Kobayashi (Osaka Pref. Univ., Japan),K. Takimiya (Hiroshima Univ., Japan),M. Ikeda (Nippon Kayaku, Japan),H. Naito (Osaka Pref. Univ., Japan)
  • Workshop on 3D/Hyper-Realistic Displays and Systems
  • 3D1: Practical 3D SystemsSpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Thu., Dec. 5 9:00-10:15 Mid-sized Hall B
  • Chair: J.-Y. Son (Konyang Univ., Korea)Co-Chair: S. Yano (Shimane Univ., Japan)
  • 3D1-1 Invited 3DTV Broadcasting Technologies, Trials, and Standardization Effort in Korea J. Kim (ETRI, Korea),S. Cho (ETRI, Korea),S.-H. Kim (ETRI, Korea),J. S. Choi (ETRI, Korea)
  • 3D1-2 A Service Compatible 3DTV Broadcasting System Based on MPEG-2 and HEVC S. Cho (ETRI, Korea),J. Kim (ETRI, Korea),S. Jeong (ETRI, Korea),H.-G. Choo (ETRI, Korea),J. S. Choi (ETRI, Korea),J. Kim (ETRI, Korea)
  • 3D1-3 Stereoscopic Display System with Integrated Motion Parallax M. F. Flynn (zSpace, USA),J. C. Tu (zSpace, USA)
  • 3D1-4L Inpainting Embedded Virtualized-Reality Indoor Modeler K. Thangamani (AIST, Japan),T. Ishikawa (Kodo Lab, Japan),K. Makita (AIST, Japan),R. Ichikari (AIST, Japan),T. Kurata (AIST, Japan)
  • 3D2/VHF2: Visual Comfort for 3D Display
  • Thu., Dec. 5 15:10-16:30 Mid-sized Hall B
  • Chair: K. Utsugi (Hitachi, Japan)Co-Chair: S. Clippingdale (NHK, Japan)
  • 3D2/VHF2-1 Invited Evaluation of Fatigue Caused by Watching 3DTV T. Morita (NHK, Japan)
  • 3D2/VHF2-2 An Algorithm to Reduce Background Distractions for Improving Visual Comfort of Stereoscopic Images P.-L. Sun (Nat. Taiwan Univ. of S&T, Taiwan),I.-T. Chang (Nat. Taiwan Univ. of S&T, Taiwan),N. Chang (AU Optronics, Taiwan),H. Tsao (AU Optronics, Taiwan)
  • 3D2/VHF2-3 The Effects of Viewing a Lengthy Film in Stereoscopic on the Human Body K. Yoshikawa (Nagoya Univ., Japan),Y. Okada (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),H. Takada (Univ. of Fukui, Japan),M. Miyao (Nagoya Univ., Japan)
  • 3D2/VHF2-4 Assessing the Impact of Crosstalk on 3D Image Quality Using EEG Y. He (Southeast Univ., China),Y. Tu (Southeast Univ., China),L. Wang (Southeast Univ., China),W. Zhang (Shenzhen China Star Optoelect. Tech., China)
  • 3D3: Holography
  • Thu., Dec. 5 16:50-18:10 Mid-sized Hall B
  • Chair: J.-W. Kim (ETRI, Korea)Co-Chair: K. Yamamoto (NICT, Japan)
  • 3D3-1 Invited New Multi-Color and Rewritable Holographic Polymer Film for 3D Holographic DisplayS. Miura (Toyo Kohan, Japan)★S. Kobayashi (Toyo Kohan, Japan)
  • 3D3-2 Display Chips for Electro-Holographic Display J.-Y. Son (Konyang Univ., Korea),C.-H. Lee (Joongbu Univ., Korea),V. P. Guschin (Konyang Univ., Korea),M.-C. Park (KIST, Korea)
  • 3D3-3 Enlargement of Viewing Zone of a Holographic Image Generated from an Image Captured by Integral Photography T. Hayashi (NICT, Japan, Chiba Univ., Japan),N. Hirata (NICT, Japan, Chiba Univ., Japan),Y. Ichihashi (NICT, Japan),K. Yamamoto (NICT, Japan),T. Kakue (Chiba Univ., Japan),T. Shimobaba (Chiba Univ., Japan),T. Ito (Chiba Univ., Japan)
  • 3D3-4 Initial Study of Vision Training Used CGH Book with Head-Mounted Display Q.-L. Deng (Nat. Chiao Tung Univ., Taiwan),B.-S. Lin (Nat. Chiao Tung Univ., Taiwan),H.-T. Chang (Nat. Yunlin Univ. of S&T, Taiwan),P.-L. Fan (Nat. Taipei Univ. of Education, Taiwan),C.-Y. Chen (Nat. Yunlin Univ. of S&T, Taiwan)
  • 3D4: 3D Display(1)
  • Fri., Dec. 6 9:00-10:20 Mid-sized Hall B
  • Chair: H. Y. Lin (Nat. Taiwan Univ., Taiwan)Co-Chair: M. Tsuchida (NTT, Japan)
  • 3D4-1 Invited Content-Aware Image Manipulations Based on Depth of Scene K. Utsugi (Hitachi, Japan,T. Naemura (Univ. of Tokyo, Japan)
  • 3D4-2 Withdrawn
  • 3D4-3 A Time-Division Multiplexing Parallax Barrier System with Wider Viewing Zone Q. Zhang (Univ. of Tsukuba, Japan),H. Kakeya (Univ. of Tsukuba, Japan)
  • 3D4-4 Optimized 3D Still-Gamma to Perform Better 3D Quality in a 120 Hz Frame Rate Display C. Ho (Shenzhen China Star Optoelect. Tech., China),Y. Jin (Shenzhen China Star Optoelect. Tech., China),S. Syu (Shenzhen China Star Optoelect. Tech., China),Y. Chen (Shenzhen China Star Optoelect. Tech., China),C. Li (Shenzhen China Star Optoelect. Tech., China)
  • 3D4-5L Comfort Fusion Evaluations of a Stereo Image Pair Using the Structure Similarity C.-H. Wen (Nat. Taiwan Univ. of S&T, Taiwan),Y.-H. Li (Nat. Taiwan Univ. of S&T, Taiwan),N. Chang (AU Optronics, Taiwan),H. Tsao (AU Optronics, Taiwan)
  • 3D5: 3D Display (2)
  • Fri., Dec. 6 10:40-11:55 Mid-sized Hall B
  • Chair: S. Miura (Toyo Kohan, Japan)Co-Chair: H. Yamamoto (Tokushima Univ., Japan)
  • 3D5-1 Invited Study of Designated Eye Position and Viewing Zone for Two-View Autostereoscopic 3D Displays K.-C. Huang (Nat. Taiwan Univ., Taiwan, ITRI, Taiwan),Y.-H. Chou (ITRI, Taiwan),L.-C. Lin (ITRI, Taiwan),H. Y. Lin (Nat. Taiwan Univ., Taiwan),F.-H. Chen (ITRI, Taiwan),C.-C. Liao (ITRI, Taiwan),Y.-H. Chen (ITRI, Taiwan),K. Lee (ITRI, Taiwan),W.-H. Hsu (Nat. Taiwan Univ., Taiwan)
  • 3D5-2 Modification of Lenslet Shape of Lenticular Lens Array for Auto-Stereoscopic Multi-View Display F. Mukhtarov (Samsung Elect., Korea),S. D. Hwang (Samsung Elect., Korea)
  • 3D5-3 A Novel Electrode Structure of LCL Lens Designed for 55-in. 3D/2D Switchable Auto-Stereoscopic Display Q. S. Liao (Shenzhen China Star Optoelect. Tech., China),C. M. Yang (Shenzhen China Star Optoelect. Tech., China),C. W. Chen (Shenzhen China Star Optoelect. Tech., China),C. C. Hsiao (Shenzhen China Star Optoelect. Tech., China)
  • 3D5-4L Super Multi-view Display with 1-mm-pitch Viewpoints and Accommodation Measurements Y. Toda (Tokyo Univ. of A&T, Japan),J. Takagi (Tokyo Univ. of A&T, Japan),Y. Takaki (Tokyo Univ. of A&T, Japan)
  • Poster 3Dp: 3D and Hyper-Realistic Displays
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • 3Dp-1 Development of 55-in. Active Retarder 3D Displays W. H. Hu (Beijin BOE Display Tech., China),Y. P. Liao (Beijin BOE Display Tech., China),L. Q. Guo (Beijin BOE Display Tech., China),Y. F. Du (Beijin BOE Display Tech., China),C. G. Huang (Beijin BOE Display Tech., China),X. B. Shao (Beijin BOE Display Tech., China),D. K. Yoon (Beijin BOE Display Tech., China),D. Wang (Beijin BOE Display Tech., China),Z. Z. He (Beijin BOE Display Tech., China),Y. B. Yu (Beijin BOE Display Tech., China),Z. M. Meng (Beijin BOE Display Tech., China),L. Liu (Beijin BOE Display Tech., China),J. M. Wang (Beijin BOE Display Tech., China),R. Guo (Beijin BOE Display Tech., China),W. G. Su (Beijin BOE Display Tech., China)
  • 3Dp-2 Multiple Line R/L Inversion Method for 4K 2K 3DLCDs K. Matsuhiro (Arisawa Manufacturing, Japan, Asuna, Japan)
  • 3Dp-3 An Apparatus with Easy Processes Used to Visually Evaluate Imaging Performance with Respect to Color Subpixel Arrangements in Autostereoscopy via Lenticular Lenses C.-Y. Yeh (Nat. Cheng Kung Univ., Taiwan),Y.-C. Wang (Nat. Cheng Kung Univ., Taiwan),C.-R. Sheu (Nat. Cheng Kung Univ., Taiwan)
  • 3Dp-4 Viewing Zone Expansion for Autostereoscopic Display with Directional Backlight Using Convex Lens Array T. Mukai (Univ. of Tsukuba, Japan),H. Kakeya (Univ. of Tsukuba, Japan)
  • 3Dp-5 Enhanced Diffraction Efficiency of Switchable Holographic Splitter for Stereo-Display W.-C. Su (Nat. Changhua Univ. of Education, Taiwan),H.-Y. Hsiao (Nat. Changhua Univ. of Education, Taiwan)
  • 3Dp-6 ADS Mode Shutter Glasses 3D Display System Research of Crosstalk W. H. Hu (Beijing BOE Display Tech., China),L. Liu (Beijing BOE Display Tech., China),L. Zhang (Beijing BOE Display Tech., China),Y. P. Liao (Beijing BOE Display Tech., China),X. B. Shao (Beijing BOE Display Tech., China),D. K. Yoon (Beijing BOE Display Tech., China),D. Wang (Beijing BOE Display Tech., China),L. Q. Guo (Beijing BOE Display Tech., China),Y. F. Du (Beijing BOE Display Tech., China),Z. Z. He (Beijing BOE Display Tech., China),Y. B. Yu (Beijing BOE Display Tech., China),Z. M. Meng (Beijing BOE Display Tech., China),J. M. Wang (Beijing BOE Display Tech., China),R. Guo (Beijing BOE Display Tech., China),W. G. Su (Beijing BOE Display Tech., China)
  • 3Dp-7 Visual Comfort for Advanced 3D Image Scaling Y.-J. Li (Nat. Taiwan Univ. of S&T, Taiwan),H.-F. Wang (Nat. Taiwan Univ. of S&T, Taiwan),H.-S. Chen (Nat. Taiwan Univ. of S&T, Taiwan),C.-H. Tsao (AU Optronics, Taiwan),N.-W. Chang (AU Optronics, Taiwan)
  • 3Dp-8 The Effects of Environmental Illumination and Screen Brightness on Accommodation and Convergence in Handheld 3D Game Console Y. Okada (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),K. Yoshikawa (Nagoya Univ., Japan),T. Ohashi (Nagoya Univ., Japan),M. Miyao (Nagoya Univ., Japan)
  • 3Dp-9 Withdrawn
  • 3Dp-10 Scent Presentation to Food Image and Its Psychological Effect K. Tomono (Tokai Univ., Japan),M. Tanaka (Tokai Univ., Japan),R. Shu (Tokai Univ., Japan),A. Tomono (Tokai Univ., Japan)
  • 3Dp-11 Depth-Fused 3D (DFD) Display with Non-Overlapped Pixels Using Layered LED Displays J. Kawakami (Univ. of Tokushima, Japan),A. Tsunakawa (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan)
  • 3Dp-12 DFD Viewer Composed of Two DFD Images with a Large Gap for Estimating Background Effect on Perceived Depth of 2D/3D Image M. Takahashi (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan)
  • 3Dp-13 Magnifying a Three-Dimensional Image Displayed by a Volumetric Display Based on Optical Scanning of an Inclined Image Plane Y. Maeda (Osaka City Univ., Japan),D. Miyazaki (Osaka City Univ., Japan),T. Mukai (Osaka City Univ., Japan)
  • 3Dp-14 Reduction of Ghost 3D Image in the Volumetric 3D Display by Using a Half-Wave Plate to Polarization-Switching Device T. Kurokawa (Univ. of Tokushima, Japan),R. Tanimoto (Univ. of Tokushima, Japan),Y. Okada (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan)
  • 3Dp-15 One-Colored Time-Division Electroholography Using a NVIDIA GeForce GTX TITAN H. Niwase (Kochi Univ., Japan),H. Araki (Kochi Univ., Japan),N. Takada (Kochi Univ., Japan),H. Nakayama (VASA Entertainment, Japan),A. Sugiyama (Chiba Univ., Japan),T. Kakue (Chiba Univ., Japan),T. Shimobaba (Chiba Univ., Japan),T. Ito (Chiba Univ., Japan)
  • 3Dp-16 Large-Scale Digital Holographic Display with Wide Viewing Angle M. Park (ETRI, Korea),H. Kim (ETRI, Korea),B. G. Chae (ETRI, Korea),J. Hahn (Kyungpook Nat. Univ., Korea),H. Kim (Korea Univ., Korea),C. H. Park (Chungnam Nat. Univ., Korea),K. Moon (ETRI, Korea),J. Kim (ETRI, Korea)
  • 3Dp-17L Semi-Portable Full-Color Electro-Holographic Display with See-Through Vision T. Yoneyama (Hokkaido Univ., Japan),T. Ichikawa (Hokkaido Univ., Japan),Y. Sakamoto (Hokkaido Univ., Japan)
  • 3Dp-18L Computer-Generated Hologram on GRAPE-DR A. Sugiyama (Chiba Univ., Japan),M. Oikawa (Chiba Univ., Japan),N. Okada (Chiba Univ., Japan),H. Nakayama (Chiba Univ., Japan),N. Masuda (Nagaoka Univ. of Tech., Japan),T. Fukushige (K&F Computing Res., Japan),T. Shimobaba (Chiba Univ., Japan),T. Ito (Chiba Univ., Japan)
  • 3Dp-19L Parallel Algorithm for Computer-Generated Hologram Calculation Using Multi-GPU Cluster System with a Single Display Device and Infiniband Network N. Takada (Kochi Univ., Japan),H. Niwase (Kochi Univ., Japan),H. Araki (Kochi Univ., Japan),H. Nakayama (VASA Entertainment, Japan),A. Sugiyama (Chiba Univ., Japan),T.Kakue (Chiba Univ., Japan),T. Shimobaba (Chiba Univ., Japan),T. Ito (Chiba Univ., Japan)
  • 3Dp-20L Real-Time Time-Division Color Electroholography Using Message Passing Interface H. Araki (Kochi Univ., Japan),H. Niwase (Kochi Univ., Japan),N. Takada (Kochi Univ., Japan),H. Nakayama (VASA Entertainment, Japan),A. Sugiyama (Chiba Univ., Japan),T.Kakue (Chiba Univ., Japan),T. Shimobaba (Chiba Univ., Japan),T. Ito (Chiba Univ., Japan)
  • 3Dp-21L Improving Viewpoint Interpolation Image Quality by Displaying Images in Stereoscopic 3D M. Date (NH, Japan),Y. Honda (Nagoya Univ., Japan)H. Takada (NH, Japan),S. Ozawa (NH, Japan),S. Mieda (NH, Japan),A. Kojima (NH, Japan)
  • 3Dp-22L Accommodative Response while Gazing Moving 3D Objects and the Effects of Aging T. Ikeda (Nagoya Univ., Japan),Y. Okada (Nagoya Univ., Japan),M. Miyao (Nagoya Univ., Japan)
  • 3Dp-23L The Degree of Recognition of the 3D Image Jumping Out in a Very Large Disparity T. Ohashi (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),Y. Honda (Nagoya Univ., Japan),M. Miyao (Nagoya Univ., Japan)
  • 3Dp-24L Influence of Latency on Perceived Depth with a 3D Display Based on Monocular Motion Parallax K. Tatehata (Univ. of Tokushima, Japan),K. Sato (Univ. of Tokushima, Japan),S. Yamada (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),I. Ishii (Hiroshima Univ., Japan),H. Yamamoto (Univ. of Tokushima, Japan)
  • 3Dp-25L Analysis of the Depth of Field by Lens-Tilt Imaging Y. Yoshida (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan)
  • 3Dp-26L Perceived Depth Change in Edge-Based DFD Display by Shifting Edge Pattern outside from Overlapped Position T. Soumiya (Univ. of Tokushima, Japan),A. Tsunakawa (Univ. of Tokushima, Japan),H. Yamamoto (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),H. Kuribayashi (Nikon, Japan)
  • Workshop on Applied Vision and Human Factors
  • DES4/VHF1: Sensing Technologies for Virtual/Augmented RealitySpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Thu., Dec. 5 13:30-14:45 Mid-sized Hall B
  • Chair: M. Kanbara (Nara Inst. of S&T, Japan)Co-Chair: J. Bergquist (Nokia, Japan)
  • DES4/VHF1-1 Invited Position and Direction Estimation System of User's Viewpoint for Wide Indoor Environment M. Kanbara (Nara Inst. of S&T, Japan)
  • DES4/VHF1-2 Useful Field of View in Augmented Reality: Comparison Between Distribution of Attention Under Binocular and Monocular Observation A. Kitamura (Osaka Univ., Japan),H. Naito (Osaka Univ., Japan),T. Kimura (Kansai Univ. of Welfare Scis., Japan),K. Shinohara (Osaka Univ., Japan),T. Sasaki (Toshiba, Japan),H. Okumura (Toshiba, Japan)
  • DES4/VHF1-3 Invited e-Heritage, Cyber Archaeology, and Cloud Museum T. Oishi (Univ. of Tokyo, Japan),K. Ikeuchi (Univ. of Tokyo, Japan)
  • 3D2/VHF2: Visual Comfort for 3D Display
  • Thu., Dec. 5 15:10-16:30 Mid-sized Hall B
  • Chair: K. Utsugi (Hitachi, Japan)Co-Chair: S. Clippingdale (NHK, Japan)
  • 3D2/VHF2-1 Invited Evaluation of Fatigue Caused by Watching 3DTV T. Morita (NHK, Japan)
  • 3D2/VHF2-2 An Algorithm to Reduce Background Distractions for Improving Visual Comfort of Stereoscopic Images P.-L. Sun (Nat. Taiwan Univ. of S&T, Taiwan),I.-T. Chang (Nat. Taiwan Univ. of S&T, Taiwan),N. Chang (AU Optronics, Taiwan),H. Tsao (AU Optronics, Taiwan)
  • 3D2/VHF2-3 The Effects of Viewing a Lengthy Film in Stereoscopic on the Human Body K. Yoshikawa (Nagoya Univ., Japan),Y. Okada (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),H. Takada (Univ. of Fukui, Japan),M. Miyao (Nagoya Univ., Japan)
  • 3D2/VHF2-4 Assessing the Impact of Crosstalk on 3D Image Quality Using EEG Y. He (Southeast Univ., China),Y. Tu (Southeast Univ., China),L. Wang (Southeast Univ., China),W. Zhang (Shenzhen China Star Optoelect. Tech., China)
  • VHF3: Improving Visual Experience
  • Fri., Dec. 6 9:00-10:15 Meeting Room 204
  • Chair: T. Kurita (NHK, Japan)Co-Chair: A. Yoshida (Sharp, Japan)
  • VHF3-1 Invited Using Image Dimension Dissection to Study Viewer Preferences of Luminance Range in Displayed Imagery S. Daly (Dolby Labs., USA),T. Kunkel (Dolby Labs., USA),S. Farrell (Dolby Labs., USA)
  • VHF3-2 Invited UHDTV Systems for Wide-Gamut Color Reproduction K. Masaoka (NHK, Japan),T. Soeno (NHK, Japan),T. Yamashita (NHK, Japan),Y. Nishida (NHK, Japan),M. Sugawara (NHK, Japan)
  • VHF3-3L Real-Time Virtual Fitting System by Using Morphing with Skeletal Tracking W. Naya (Hokkaido Univ., Japan),K. Fukumoto (Hokkaido Univ., Japan),T. Yamamoto (Hokkaido Univ., Japan),Y. Dobashi (Hokkaido Univ., Japan)
  • VHF4: Visual Perception
  • Fri., Dec. 6 10:40-12:10 Meeting Room 204
  • Chair: S. Daly (Dolby Labs., USA)Co-Chair: K. Masaoka (NHK, Japan)
  • VHF4-1 Invited Surface Quality and Material Perception S. Nakauchi (Toyohashi Univ. of Tech., Japan)
  • VHF4-2 Higher Resolution Stimulus Enhances Depth Perception Even When the Resolution Difference is Undetectable Y. Tsushima (NHK, Japan),K. Komine (NHK, Japan),Y. Sawahata (NHK, Japan),N. Hiruma (NHK, Japan)
  • VHF4-3 Evaluating CIE Unified Glare Rating of a Scene Using a Panoramic Camera P.-L. Sun (Nat. Taiwan Univ. of S&T, Taiwan),H.-C. Li (Nat. Taiwan Univ. of S&T, Taiwan),P. Green (Nat. Taiwan Univ. of S&T, Taiwan)
  • VHF4-4 Simulation of Ambient Light Impact on Public Displays S. Maeda (Mitsubishi Elec., Japan),Y. Inoue (Mitsubishi Elec., Japan),T. Sasagawa (Mitsubishi Elec., Japan)
  • VHF5: Color
  • Fri., Dec. 6 13:30-15:00 Meeting Room 204
  • Chair: Y. Tani (Toyohashi Univ. of Tech., Japan)Co-Chair: Y. Shimodaira (Shizuoka Univ., Japan)
  • VHF5-1 Invited Quantifying Observer and Display Metamerism Effects When Evaluating Accuracy of Spot Color Matching in Mixed Media Presentations T. Lianza (X-rite, USA)
  • VHF5-2 New Generation of Optics for Imaging Video-colorimetry: Application to OLED Displays P. Boher (ELDIM, France),T. Leroux (ELDIM, France),T. Bignon (ELDIM, France),V. Collomb-Patton (ELDIM, France)
  • VHF5-3 Color Treatment Index: A New Metric for Mobile Displays S. L. Yang (AU Optronics, Taiwan)
  • VHF5-4 A Self-Adaptive Method for Image Enhancement Based on CIELAB Color Difference Analysis L.-X. Chen (Shenzhen China Star Optoelect. Tech., China),C.-T. Kang (Shenzhen China Star Optoelect. Tech., China)
  • VHF6: Display Parameters and Human Performance
  • Fri., Dec. 6 15:10-16:10 Meeting Room 204
  • Chair: T. Lianza (X-rite, USA)Co-Chair: Y. Hisatake (Japan Display, Japan)
  • VHF6-1 Visual Search of Colour Patches Shown on a Tablet Computer J.-Y. Wu (Nat. Taiwan Univ. of S&T, Taiwan),L.-C. Ou (Nat. Taiwan Univ. of S&T, Taiwan)
  • VHF6-2 Theoretical Derivation of Accommodation-Optimized Line Space for Actual Documents in Kanji Characters N. Ishikawa (Gunma Univ., Japan),T. Miyata (Gunma Univ., Japan),T. Matsui (Gunma Univ., Japan)
  • VHF6-3 Characterization of Methods for Resolution and Noise in Medical Displays A. Yamazaki (U.S. Food and Drug Admin., USA, Nagoya Univ., Japan),C.-L. Wu (U.S. Food and Drug Admin., USA),W.-C. Cheng (U.S. Food and Drug Admin., USA),A. Badano (U.S. Food and Drug Admin., USA)
  • Poster VHFp1: Applied Vision and Human Factors (AR)Special Topics of Interest on Augmented Reality and Virtual Reality
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • VHFp1-1 A Cognitive Model for Fast Recognition in Images Displayed by Automotive Augmented Interface Systems H. Hasegawa (Meijo Univ., Japan),S. Yano (Meijo Univ., Japan),S. Okabayashi (Meijo Univ., Japan),T. Wake (Kanagawa Univ., Japan)
  • Poster VHFp2: Applied Vision and Human Factors
  • Wed., Dec. 4 13:40-16:40 Main Hall C
  • VHFp2-1 Kansei Evaluation of Skin Colors under Different Color Temperatures of White LEDs C.-J. Chou (Nat. Taiwan Univ. of S&T, Taiwan),J.-W. Huang (Nat. Taiwan Univ. of S&T, Taiwan),H.-S. Chen (Nat. Taiwan Univ. of S&T, Taiwan)
  • VHFp2-2 Calculated and Measured Values of the Helmholtz-Kohlrausch Effect in Natural Images T. Shizume (Shizuoka Univ., Japan),G. Ohashi (Shizuoka Univ., Japan),Y. Onuki (Shizuoka Univ., Japan),H. Takamatsu (NEC Display Solutions, Japan),Y. Shimodaira (Shizuoka Univ., Japan)
  • VHFp2-3 Evaluation of Color Channels and Gamut in OLED RGB to RGBW Conversions J.-W. Huang (Nat. Taiwan Univ. of S&T, Taiwan),C.-J. Chou (Nat. Taiwan Univ. of S&T, Taiwan),H.-S. Chen (Nat. Taiwan Univ. of S&T, Taiwan),R. Luo (Univ. of Leeds, UK)
  • VHFp2-4 Evaluation of Brightness and Visual Comfort of LED Light Fixtures T.-X. Lee (Nat. Taiwan Univ. of S&T, Taiwan),H.-Y. Sung (Nat. Taiwan Univ. of S&T, Taiwan),C.-H. Wen (Nat. Taiwan Univ. of S&T, Taiwan),S.-W. Hsu (ITRI, Taiwan),C.-H. Chen (ITRI, Taiwan)
  • VHFp2-5 Evaluation of Motion Artifacts on OLED TVs J.-H. Bae (Univ. of Inha, Korea),C.-M. Yang (Univ. of Inha, Korea),K.-S. Shin (Univ. of Inha, Korea),H.-S. Jang (Univ. of Inha, Korea),C.-W. Kim (Univ. of Inha, Korea)
  • VHFp2-6 Effects of 3D Display on Change Detection Task and Subjective Task Difficulty Y. Masakura (Tokyo Univ. of Tech., Japan),T. Tamura (Tokyo Polytechnic Univ., Japan),S. Ohno (Tokyo Univ. of Tech., Japan)
  • VHFp2-7 A Method for Quantitative Assessment of Elderly Cognitive Function While Driving K. Miyabe (Meijo Univ., Japan),Y. Ogura (Meijo Univ., Japan),H. Yamasaki (Meijo Univ., Japan),M. Yamada (Meijo Univ., Japan),S. Yamamoto (Meijo Univ., Japan),T. Nakano (Meijo Univ., Japan)
  • VHFp2-8L Comparison of Visual Fatigue When Reading on Electronic Paper and Tablet LCDs H. Isono (Tokyo Denki Univ., Japan),H. Yaguchi (Tokyo Denki Univ., Japan)
  • VHFp2-9L Effect of Blue Light on Visual Fatigue When Reading on LED- Backlit Tablet LCDs H. Isono (Tokyo Denki Univ., Japan),A. Kumar (IIT-H, India),T. Kamimura (Tokyo Denki Univ., Japan),Y. Noguchi (Tokyo Denki Univ., Japan),H. Yaguchi (Tokyo Denki Univ., Japan)
  • VHFp2-10L A Novel Method of Display Evaluation through Development of Image-Measurement-Based Metric M. W. Lee (Samsung Elect., Korea),S. A. K. Ha (Samsung Elect., Korea),H. H. Park (Samsung Elect., Korea),J. H. Kim (Samsung Elect., Korea)
  • Workshop on Projection and Large-Area Displays and Their Components
  • PRJ1: Projection ARSpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Wed., Dec. 4 14:00-15:00 Mid-sized Hall B
  • Chair: D. Cuypers (imec, Belgium)Co-Chair: S. Shikama (Setsunan Univ., Japan)
  • PRJ1-1 Invited Wearable Communication Device Leads the Future of Optical Technology M. Takaso (Telepathy, USA),K. Suzuki (Telepathy, USA),T. Iguchi (Telepathy, USA)
  • PRJ1-2 Invited Projector-Based Augmented Reality in Medicine T. Nakaguchi (Chiba Univ., Japan)
  • PRJ1-3 Invited Projection Mapping Technology and Advanced Optical Features of Digital Projectors H. Yoshida (Christie Digital Syss., Japan),M. Hanzawa (Christie Digital Syss., Japan),P. Salvini (Christie Digital Syss., Canada),R. Anthony (Christie Digital Syss., Canada)
  • PRJ2: Projection Components
  • Wed., Dec. 4 15:40-17:20 Small Hall
  • Chair: T. Suzuki (JVC Kenwood, Japan)Co-Chair: Y. Asakura (Nittoh Kogaku, Japan)
  • PRJ2-1 Surface Structure Light Guide for See-Through High Performances True AR Glasses K. Sarayeddine (Optinvent, France),K. Mirza (Optinvent, France)
  • PRJ2-2 Demonstration of a Compact See-Through Head-Mounted Display with Light Guide Plate H.-C. Hung (Nat. Chiao Tung Univ., Taiwan),C.W. Chiang (Nat. Chiao Tung Univ., Taiwan),Y.-K. Hsu (Nat. Chiao Tung Univ., Taiwan),Y.-J. Chen (Nat. Chiao Tung Univ., Taiwan),Y.-C. Huang (Nat. Chiao Tung Univ., Taiwan),J.- W. Pan (Nat. Chiao Tung Univ., Taiwan, Chi Mei Medical Ctr., Taiwan)
  • PRJ2-3 Reducing the Fringing Field Effect of Phase-Only Spatial Light Modulator for Holographic Display L. Yang (Southeast Univ., China),J. Xia (Southeast Univ., China),X. Zhang (Southeast Univ., China),B. Wang (Southeast Univ., China)
  • PRJ2-4 Beam-Steering in Hollow Distributed Bragg Reflector Waveguides for RGB Imaging M. Nakahama (Tokyo Inst. of Tech., Japan),X. Gu (Tokyo Inst. of Tech., Japan),H. Sumimoto (Tokyo Inst. of Tech., Japan),F. Koyama (Tokyo Inst. of Tech., Japan)
  • PRJ2-5 Suppression of Flicker in Analog LCOS Panels Using AI2O3/SiO2 Alignment Layers D. Cuypers (imec, Belgium, Ghent Univ., Belgium),H. D. Smet (imec, Belgium, Ghent Univ., Belgium)
  • PRJ3: Projection Technologies
  • Thu., Dec. 5 9:00-10:20 Small Hall
  • Chair: F. P. Shevlin (DYOPTYKA, Ireland)Co-Chair: H. Kanayama (Panasonic, Japan)
  • PRJ3-1 Invited How the Environmental Changes in Projection Display Market? T. Suzuki (Techno Syss. Res., Japan),K. Kusumoto (Techno Syss. Res., Japan)
  • PRJ3-2 Invited Color Performance Evaluation of Different Business Projector Architectures B. Maximus (Barco, Belgium),M. Tarpan (Barco, Belgium),H. Nakano (Barco, Japan)
  • PRJ3-3 Interactive Laser Pico-Projection System Using a Fiber Bundle Combiner for Wavelength and Image Multiplexing M. Ide (Citizen Holdings, Japan),S. Fukaya (Citizen Holdings, Japan),K. Yoda (Citizen Holdings, Japan)
  • PRJ3-4 Liquid Cooling High Power Laser Phosphor Light Source for Digital Projection K. Li (Wavien, USA)
  • PRJ4: Laser & Speckle Reduction
  • Thu., Dec. 5 10:40-12:20 Small Hall
  • Chair: B. Maximus (Barco, Belgium)Co-Chair: T. Yagi (Mitsubishi Elec., Japan)
  • PRJ4-1 Speckle Contrast Measurement in Arbitrary Observation Distance T. Fukui (Oxide, Japan),K. Suzuki (Oxide, Japan),S. Kubota (Oxide, Japan)
  • PRJ4-2 Study of Microcapsule Diffuser for Speckle Reduction in Laser Display S. Okagaki (Mitsubishi Elec., Japan),J. Kondo (Mitsubishi Elec., Japan),K. Kojima (Mitsubishi Elec., Japan),Y. Nakano (Mitsubishi Elec., Japan),A. Miyata (Mitsubishi Elec., Japan),K. Kubo (Mitsubishi Elec., Japan),Y. Yoshida (Mitsubishi Elec., Japan)
  • PRJ4-3 Speckle-Reduced Zoomable Holographic Projection H. Yamanashi (Chiba Univ., Japan),T. Shimobaba (Chiba Univ., Japan),T. Kakue (Chiba Univ., Japan),M. Oikawa (Chiba Univ., Japan),N. Okada (Chiba Univ., Japan),Y. Endo (Chiba Univ., Japan),R. Hirayama (Chiba Univ., Japan),N. Takada (Kochi Univ., Japan),T. Ito (Chiba Univ., Japan)
  • PRJ4-4 Speckle Reduction for Illumination with Lasers and Stationary, Heat Sinked, Phosphors F. P. Shevlin (DYOPTYKA, Ireland)
  • PRJ4-5 Reliability Study on High Power 638 nm Broad Stripe LD with a Window-Mirror Structure T. Yagi (Mitsubishi Elec., Japan),H. Mitsuyama (Mitsubishi Elec., Japan),T. Nishida (Mitsubishi Elec., Japan),K. Kadoiwa (Mitsubishi Elec., Japan)
  • Poster PRJp: Projection
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • PRJp-1 Development of a Laser Head-Up Display with Multi-Event Information C.-Y. Chen (Nat. Yunlin Univ. of S&T, Taiwan),Q.-L. Deng (Nat. Chiao Tung Univ., Taiwan),Y.-C. Chen (ITRI, Taiwan),M.-C. Chou (ITRI, Taiwan),K.-Y. Chiu (Nat. Yunlin Univ. of S&T, Taiwan),C.-C. Su (Nat. Yunlin Univ. of S&T, Taiwan),P.-J. Wu (Nat. Chiao Tung Univ., Taiwan)
  • PRJp-2 A Collimated Illumination Beam Design for Compact Projection System C.-H. Lin (Nat. Yunlin Univ. of S&T, Taiwan),C.-Y. Hung (Nat. Yunlin Univ. of S&T, Taiwan),Y.-H. Chang (Nat. Yunlin Univ. of S&T, Taiwan),W.-C. Su (Nat. Changhua Univ. of Education, Taiwan)
  • PRJp-3 A Study of Optical Design of Local Dimming Projector with Liquid Crystal Elements W.-T. Li (Nat. Kaohsiung First Univ. of S&T, Taiwan),Y.-C. Chen (Nat. Kaohsiung First Univ. of S&T, Taiwan),Y.-C. Fang (Nat. Kaohsiung First Univ. of S&T, Taiwan)
  • PRJp-4 Withdrawn
  • PRJp-5 Full Color Image in a Holographic Head-Mounted Display W.-C. Su (Nat. Changhua Univ. of Education, Taiwan),L.-P. Chen (Nat. Changhua Univ. of Education, Taiwan),H.-T. Lin (Nat. Changhua Univ. of Education, Taiwan)
  • Workshop on Electronic Paper
  • EP1: New Displays
  • Wed., Dec. 4 14:00-15:25 Meeting Room 204
  • Chair: T. Fujisawa (DIC, Japan)Co-Chair: M. Higuchi (NIMS, Japan)
  • EP1-1 Invited Trend of Ch-LCD e-Paper Technologies J. Chen (ITRI, Taiwan),J.-W. Shiu (ITRI, Taiwan),C.-C. Tsai (ITRI, Taiwan),W.-W. Chiu (ITRI, Taiwan),C.-Y. Huang (ITRI, Taiwan)
  • EP1-2 Reverse-Type TN-LCD with Reflective Mode Showing Permanent Memory Display and Excellent Moving Picture Quality Y. Toko (Stanley Elec., Japan),K. Kato (Stanley Elec., Japan),R. Takahashi (Kogakuin Univ., Japan),T. Takahashi (Kogakuin Univ., Japan)
  • EP1-3 Novel Thermal Recording Medium Enabling Both Emissive and Reflective Multicolor Representations Consisting of Leuco Dyes and Luminescent Molecules K. Nakamura (Chiba Univ., Japan),Y. Kobayashi (Chiba Univ., Japan),K. Kanazawa (Chiba Univ., Japan),N. Kobayashi (Chiba Univ., Japan)
  • EP1-4 Alternating-Current-Driven Electrochemiluminescence for Solution-Based Multicolor Light-Emitting Device T. Nobeshima (Chiba Univ., Japan),M. Nakakomi (Chiba Univ., Japan),K. Nakamura (Chiba Univ., Japan),N. Kobayashi (Chiba Univ., Japan)
  • EP2: Electrochromic Displays
  • Wed., Dec. 4 15:40-17:10 Meeting Room 204
  • Chair: N. Kobayashi (Chiba Univ., Japan)Co-Chair: Y. Toko (Stanley Elec., Japan)
  • EP2-1 Invited Flexible Electrochromic Display T. Yashiro (Ricoh, Japan),Y. Okada (Ricoh, Japan),Y. Naijoh (Ricoh, Japan),S. Hirano (Ricoh, Japan),T. Sagisaka (Ricoh, Japan),D. Gotoh (Ricoh, Japan),M. Inoue (Ricoh, Japan),S. C. Kim (Ricoh, Japan),K. Tsuji (Ricoh, Japan),H. Takahashi (Ricoh, Japan),K. Fujimura (Ricoh, Japan)
  • EP2-2 Invited Silver Deposition Based Electrochromism as a Color e-Paper Technology A. Tsuboi (Chiba Univ., Japan),K. Nakamura (Chiba Univ., Japan),N. Kobayashi (Chiba Univ., Japan)
  • EP2-3 Stretchable Electrochromic Devices Using Metallo-Supramolecular Polymers J. Zhang (NIMS, Japan),T. Sato (NIMS, Japan),C.-W. Hu (NIMS, Japan),M. Higuchi (NIMS, Japan, JST- CREST, Japan)
  • EP2-4 Electrochromic Lens for Smart Glasses K. Yutani (Ricoh, Japan),S. C. Kim (Ricoh, Japan),S. Yamamoto (Ricoh, Japan),Y. Okada (Ricoh, Japan),Y. Naijoh (Ricoh, Japan),S. Hirano (Ricoh, Japan),D. Gotoh (Ricoh, Japan),M. Inoue (Ricoh, Japan),T. Sagisaka (Ricoh, Japan),T. Yashiro (Ricoh, Japan)
  • EP3: Electrophoretic Displays
  • Thu., Dec. 5 9:00-10:10 Meeting Room 204
  • Chair: G. Zhou (Philips Res., the Netherlands)Co-Chair: T. Kitamura (Chiba Univ., Japan)
  • EP3-1 Withdrawn
  • EP3-2 Invited Novel Concept for Smart Windows K.-M. H. Lenssen (Philips Res., the Netherlands),M. L. Trouwborst (Philips Res., the Netherlands),M. H. W. M. van Delden (Philips Res., the Netherlands)
  • EP3-3 Diagnostic of Electrophoretic Particles by Dielectric Dispersion Spectra A. Ando (Sakura Color Prods., Japan),R. Kiyoe (Sakura Color Prods., Japan),Y. Nishio (Kyoto Univ., Japan),H. Inoue (Sakura Color Prods., Japan),O. Sakai (Kyoto Univ., Japan)
  • EP3-4L Invited Optimum Approach for Product Development Which is Using Electrophoretic Paper-Like Display System K. Hashimoto (Sony, Japan)
  • EP4: Evaluations
  • Thu., Dec. 5 10:40-11:55 Meeting Room 204
  • Chair: N.-S. Roh (Samsung Display, Korea)Co-Chair: Y. Hotta (Ricoh, Japan)
  • EP4-1 Invited Comparison of e-Paper Displays, Transflective and Transmissive LCDs under Bright Ambient Light and Image Enhancement Algorithms for Optimized Grey Level and Color Perception K. Blankenbach (Pforzheim Univ., Germany),A. Sycev (Pforzheim Univ., Germany),S. Kurbatfinski (STZ Display Syss., Germany),M. Zobl (BMW Group, Germany)
  • EP4-2 Invited The First Half of Process on the Way Toward International Standard for Electronic Paper Displays T. Takahashi (Dai Nippon Printing, Japan, Elect. Paper Consortium, Japan),K. Hyodo (Konica Minolta, Japan, Elect. Paper Consortium, Japan)
  • EP4-3 Invited Why Paper is Superior to Computer Displays in Cross-Reference Reading for Multiple Documents? H. Shibata (Fuji Xerox, Japan),K. Takano (Fuji Xerox, Japan, Univ. of Electro-Commun., Japan),K. Omura (Fuji Xerox, Japan)
  • Poster EPp: Electronic Paper
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • EPp-1 Preparation of Functional Paper Sheets Utilizing Twisting Ball Technology H. Aoki (Tokai Univ., Japan),M. Yukawa (Tokai Univ., Japan),S. Maeda (Tokai Univ., Japan)
  • EPp-2 Writable Electronic Paper Based on Twisting Ball Type Electronic Paper Y. Komazaki (Univ. of Tokyo, Japan),T. Torii (Univ. of Tokyo, Japan)
  • EPp-3 Increasing Rewriting Speed of Optical Rewritable e-Paper by Process Optimization J. Sun (Hong Kong Univ. of S&T, Hong Kong)
  • EPp-4L Effect of External Additive on Display Characteristics in Toner Display K. K. C. Kumara (Chiba Univ., Japan),S. Nakamura (Chiba Univ., Japan),N. Miyagawa (Chiba Univ., Japan),T. Kitamura (Chiba Univ., Japan)
  • EPp-5L Organic Conducting Polypyrrole-Silica Nanocomposite Particles as the Display Elements for Electronic Papers T. Sugiura (Tokai Univ., Japan),H. Aoki (Tokai Univ., Japan),J. Shindo (Tokai Univ., Japan),R. Tanizaki (Tokai Univ., Japan),S. Maeda (Tokai Univ., Japan)
  • EPp-6L Transparent-Mirror-Black Three-Way Electrochromic Smart Window Composed of a Pair of ITO-Coated Flexible Plastic Films M. Oikawa (Sendai Nat. College of Tech., Japan),R. Onodera (Sendai Nat. College of Tech., Japan),S. Seki (Sendai Nat. College of Tech., Japan),K. Yamada (Tokyo Polytechnic Univ., Japan),E. Harada (Tokyo Polytechnic Univ., Japan),Y. Sawada (Tokyo Polytechnic Univ., Japan),T. Mizuno (Univ. of Electro-Commun., Japan),T. Uchida (Tokyo Polytechnic Univ., Japan)
  • EPp-7L The Effect of Angle on Visibility during Reading E-Books by Age Groups Y. Ishii (Nagoya Univ., Japan),R. Cui (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),M. Miyao (Nagoya Univ., Japan)
  • EPp-8L The Effects of Environmental Illuminance on Visibility during Reading E-Books R. Cui (Nagoya Univ., Japan),Y. Ishii (Nagoya Univ., Japan),T. Kojima (Nagoya Univ., Japan),M. Miyao (Nagoya Univ., Japan)
  • Workshop on MEMS and Emerging Technologies for Future Displays and Devices
  • MEET1: Fundamental Components and Process Technologies
  • Thu., Dec. 5 9:05-10:25 Meeting Room 206
  • Chair: D. Pribat (Sungkyunkwan Univ., Korea)Co-Chair: S. Coe-Sullivan (QD Vision, USA)
  • MEET1-1 Invited Graphene for Field Emission Applications W. Milne (Univ. of Cambridge, UK, Kyung Hee Univ., Korea),T. Hallam (Trinity College, Ireland),G. S. Duesberg (Trinity College, Ireland),C. Li (Southeast Univ., China),W. Lei (Southeast Univ., China),B. Wang (Southeast Univ., China),M. T. Cole (Univ. of Cambridge, UK)
  • MEET1-2 Invited Carbon Nanotube Electron Beams for High Efficiency Lighting Bulb K. C. Park (Kyung Hee Univ., Korea),J. S. Kang (Kyung Hee Univ., Korea),H. R. Lee (Kyung Hee Univ., Korea),S. Y. Park (Kyung Hee Univ., Korea)
  • MEET1-3 Invited Development of Smart Digital X-ray Tubes by Optimizing Carbon anotube Field Emitters and Their Driving Y.-H. Song (ETRI, Korea, Univ. of S&T, Korea),J.-W. Kim (ETRI, Korea, Univ. of S&T, Korea),J.W. Jeong (ETRI, Korea),J.-T. Kang (ETRI, Korea),S. Choi (ETRI, Korea),J. Choi (ETRI, Korea),S. Ahn (ETRI, Korea, Sun Moon Univ., Korea)
  • MEET1-4 Cathodoluminescence from Electron Beam Crystallized Silicon Thin Films S. Y. Park (Kyung Hee Univ., Korea),J. S. Kang (Kyung Hee Univ., Korea),H. R. Lee (Kyung Hee Univ., Korea),S. W. Lee (Kyung Hee Univ., Korea),K. C. Park (Kyung Hee Univ., Korea)
  • MEET2: EL Quantum Dots Technologies
  • Thu., Dec. 5 10:40-12:00 Meeting Room 206
  • Chair: J. Jang (Kyung Hee Univ., Korea)Co-Chair: T. Yatsui (Univ. of Tokyo, Japan)
  • MEET2-1 Invited Electroluminescent Quantum Dots for Lighting and Displays B. S. Mashford (QD Vision, USA),M. Stevenson (QD Vision, USA),C. Hamilton (QD Vision, USA),Z. Zhou (QD Vision, USA),C. Breen (QD Vision, USA),J. S. Steckel (QD Vision, USA),S. Coe-Sullivan (QD Vision, USA),P. T. Kazlas (QD Vision, USA)
  • MEET2-2 Invited Quantum-Dot Light-Emitting Diodes for Full-Color Displays C. Lee (Seoul Nat. Univ., Korea),M. Park (Seoul Nat. Univ., Korea),J. Lim (Seoul Nat. Univ., Korea),J. Kwak (Dong-A Univ., Korea),K. Char (Seoul Nat. Univ., Korea),S. Lee (Seoul Nat. Univ., Korea),J. Kim (KETI, Korea),C. J. Han (KETI, Korea),B. Yoo (KETI, Korea),M. S. Oh (KETI, Korea),J. Lee (KETI, Korea)
  • MEET2-3 Highly Uniform Transfer Mold Quantum Dot Light Emitting Diodes R. Matsuhana (Shizuoka Univ., Japan),M. Nakamoto (Shizuoka Univ., Japan),J. Moon (Shizuoka Univ., Japan)
  • MEET2-4 Invited Pick-and-Place Transfer of Quantum Dot for Full-Color Display B. L. Choi (Samsung Advanced Inst. of Tech., Korea),T.-H. Kim (Samsung Advanced Inst. of Tech., Korea),K.-S. Cho (Samsung Advanced Inst. of Tech., Korea),E. K. Lee (Samsung Advanced Inst. of Tech., Korea),D.-Y. Chung (Samsung Advanced Inst. of Tech., Korea),J. Y. Ku (Samsung Advanced Inst. of Tech., Korea),J. M. Kim (Univ. of Oxford, UK),S. Hwang (Samsung Advanced Inst. of Tech., Korea)
  • MEET3: Emerging Quantum Dots Technologies
  • Thu., Dec. 5 13:30-14:30 Meeting Room 206
  • Chair: K. C. Park (Kyung Hee Univ., Korea)Co-Chair: C. Lee (Seoul Nat. Univ., Korea)
  • MEET3-1 Invited Quantum-Dot Light Emitting Diodes for Improvements of Brightness and Efficiency J. Jang (Kyung Hee Univ., Korea),A. Castan (Kyung Hee Univ., Korea),H.-M. Kim (Kyung Hee Univ., Korea)
  • MEET3-2 Invited Photoluminescent Quantum Dots in Display Products J. S. Steckel (QD Vision, USA),R. Colby (QD Vision, USA),W. Liu (QD Vision, USA),K. Hutchinson (QD Vision, USA),C. Breen (QD Vision, USA),J. Ritter (QD Vision, USA),S. Coe-Sullivan (QD Vision, USA)
  • MEET3-3 Invited Recent Progress of Nanophotonic Device Operated by a Dressed Photon T. Yatsui (Univ. of Tokyo, Japan)
  • MEET4: Novel Materials and Components
  • Thu., Dec. 5 15:10-16:25 Meeting Room 206
  • Chair: W. Milne (Univ. of Cambridge, UK)Co-Chair: Y.-H. Song (ETRI, Korea)
  • MEET4-1 Invited Graphene Synthesis on Thin Metal Films Y. W. Kim (Sungkyunkwan Univ., Korea),E. Moyen (Sungkyunkwan Univ., Korea),D. Pribat (Sungkyunkwan Univ., Korea)
  • MEET4-2 Invited Direct Observation of Al2O3 Barrier Film Properties Made by Low Temperature Atomic Layer Deposition onto Fluorescent AIQ3 Molecular Films T. Maindron (CEA-LETI, France),B. Aventurier (CEA-LETI, France),T. Jullien (CEA-LETI, France),J.-Y. Simon (CEA-LETI, France),E. Viasnoff (CEA-LETI, France)
  • MEET4-3 Invited Compact DC Modeling of Organic Field-Effect Transistors Y. Bonnassieux (École Polytechnique, France),C. H. Kim (École Polytechnique, France),G. Horowitz (École Polytechnique, France)
  • MEET4-4 Withdrawn
  • MEET4-5L High Performance Solid State Thermoelectric Power Generation Modules for Self-Powered Electronics X. Wang (GMZ Energy, USA),B. Yu (GMZ Energy, USA),M. Engber (GMZ Energy, USA),T. Pantha (GMZ Energy, USA),M. Cleary (GMZ Energy, USA),J. Yang (GMZ Energy, USA),Y. Zhang (Boise State Univ., USA),G. Joshi (GMZ Energy, USA),Y. Ma (GMZ Energy, USA),I. Chao (GMZ Energy, USA)
  • MEET5: MEMS Imaging and Sensing
  • Thu., Dec. 5 16:50-17:50 Meeting Room 206
  • Chair: Y. Bonnassieux (École Polytechnique, France)Co-Chair: T. Maindron (CEA-LETI, France)
  • MEET5-1 Invited Hands On Access Fabrication Facility for MEMS Development and Production K. Totsu (Tohoku Univ., Japan),M. Moriyama (Tohoku Univ., Japan),Y. Suzuki (Tohoku Univ., Japan),T. Ono (Tohoku Univ., Japan),S. Yoshida (Tohoku Univ., Japan),M. Esashi (Tohoku Univ., Japan)
  • MEET5-2 Localized Microplasma Generation in MEMS Gas Channel R. Sato (Toyota Tech. Inst., Japan),D. Yasumatsu (Toyota Tech. Inst., Japan),S. Kumagai (Toyota Tech. Inst., Japan),M. Hori (Nagoya Univ., Japan),M. Sasaki (Toyota Tech. Inst., Japan)
  • MEET5-3 Commercial Sub-THz Video Camera G. E. Tsydynzhapov (Terasense Dev. Labs., Russia),V. M. Muravev (Terasense Dev. Labs., Russia),A. A. Fortunatov (Terasense Dev. Labs., Russia),I. V. Kukushkin (Terasense Dev. Labs., Russia)
  • Workshop on Display Electronic Systems
  • DES1: Vehicle Applications
  • Wed., Dec. 4 14:05-15:15 Main Hall B
  • Chair: K. Morita (NTSEL, Japan)Co-Chair: H. Okumura (Toshiba, Japan)
  • DES1-1 Invited Recovery of Sustained Attention by Brief Stimulus Exposure in the Peripheral Visual Field K. Uchikawa (Tokyo Inst. of Tech., Japan),D. Endou (Tokyo Inst. of Tech., Japan),K. Fukuda (Tokyo Inst. of Tech., Japan)
  • DES1-2 Invited Obstacle Detection System Using Stereo Vision for Driver Assistance K. Saneyoshi (Tokyo Inst. of Tech., Japan)
  • DES1-3 Development of Full-Color HD Resolution Automobile HUD User Interface Z. Chen (Southeast Univ., China),Y. Tang (Southeast Univ., China),B. Wang (Southeast Univ., China)
  • INP2/DES2: AR/VR Interactive SystemsSpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Wed., Dec. 4 15:40-17:20 Mid-sized Hall B
  • Chair: N. Sakata (Osaka Univ., Japan)Co-Chair: N. Hashimoto (Citizen Holdings, Japan)
  • INP2/DES2-1 Invited Reality Beyond Its Physicality M. Inami (Keio Univ., Japan)
  • INP2/DES2-2 Invited A Tablet Interface for Laying Out AR Objects-Outlook of Relationship with Smartphone and AR- N. Sakata (Osaka Univ., Japan),R. Nagashima (Osaka Univ., Japan),S. Nishida (Osaka Univ., Japan)
  • INP2/DES2-3 Invited The Possibility of the Eyeglass-Type Mobile Phone T. Horikoshi (NTT DoCoMo, Japan)
  • INP2/DES2-4 A Cartoon-Character Costume with Active Facial Expression Y. Oka (Niigata Univ., Japan),M. Yamamoto (Niigata Univ., Japan)
  • DES3: Human Perceptions in Augmented RealitySpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Thu., Dec. 5 10:40-12:10 Mid-sized Hall B
  • Chair: T. Kuroda (Kyoto Univ. Hospital, Japan)Co-Chair: K. Makita (AIST, Japan)
  • DES3-1 Invited How AR Reforms Social Medical System? T. Kuroda (Kyoto Univ. Hospital, Japan),Y. Kuroda(Osaka Univ., Japan),K. Hori(Gunma Pref. College of HealthSci., Japan),N. Ohboshi (Kinki Univ., Japan)
  • DES3-2 Invited Augmenting Human Experience with Perception-Based Displays Utilizing Illusions T. Narumi (Univ. of Tokyo, Japan)
  • DES3-3 Invited Blue Light Matters: The Eye Is a Camera and a Clock! K. Tsubota (Keio Univ., Japan)
  • DES3-4L Effectiveness of Freehand Modeling by BlueGrotto for CSCW in VR Space T. Oyoshi (Muroran Inst. of Tech., Japan),Y. Miwa (Muroran Inst. of Tech., Japan),N. Shichijo (Muroran Inst. of Tech., Japan),S. Saga (Muroran Inst. of Tech., Japan)
  • DES4/VHF1: Sensing Technologies for Virtual/Augmented RealitySpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Thu., Dec. 5 13:30-14:45 Mid-sized Hall B
  • Chair: M. Kanbara (Nara Inst. of S&T, Japan)Co-Chair: J. Bergquist (Nokia, Japan)
  • DES4/VHF1-1 Invited Position and Direction Estimation System of User's Viewpoint for Wide Indoor Environment M. Kanbara (Nara Inst. of S&T, Japan)
  • DES4/VHF1-2 Useful Field of View in Augmented Reality: Comparison Between Distribution of Attention under Binocular and Monocular Observation A. Kitamura (Osaka Univ., Japan),H. Naito (Osaka Univ., Japan),T. Kimura (Kansai Univ. of Welfare Scis., Japan),K. Shinohara (Osaka Univ., Japan),T. Sasaki (Toshiba, Japan),H. Okumura (Toshiba, Japan)
  • DES4/VHF1-3 Invited e-Heritage, Cyber Archaeology, and Cloud Museum T. Oishi (Univ. of Tokyo, Japan),K. Ikeuchi (Univ. of Tokyo, Japan)
  • DESS: Display Driving (1)
  • Fri., Dec. 6 9:00-10:20 Small Hall
  • Chair: T. N. Ruckmongathan (Raman Res. Inst., India)Co-Chair: T. Yamamoto (NHK, Japan)
  • DES5-1 Invited Micro Pulse Width Modulation for Grayscales in Display Devices T. N. Ruckmongathan (Raman Res. Inst., India)
  • DES5-2 A New Smart Charge Sharing Method for Liquid Crystal Displays with Lower Power Consumption in Z-Inversion S.-R. Kim (Kyung Hee Univ., Korea),J.-M. Kim (Kyung Hee Univ., Korea),M. Kim (Kyung Hee Univ., Korea),J. W. Kim (Homestead High School, USA),S.-W. Lee (Kyung Hee Univ., Korea)
  • DES5-3 New Pixel Circuit Based on a-IGZO TFTs for Blue-Phase LCDs P.-C. Lai (Nat. Cheng Kung Univ., Taiwan),M.-H. Cheng (Nat. Cheng Kung Univ., Taiwan),C.-D. Tu (AU Optronics, Taiwan),C.-L: Lin (Nat. Cheng Kung Univ., Taiwan)
  • DES5-4L Micro Pulse Width Modulation to Drive Matrix LCDs T. N. Ruckmongathan (Raman Res. Inst., India)
  • DES6: Display Driving (2)
  • Fri., Dec. 6 10:40-12:00 Small Hall
  • Chair: 0.-K. Kwon (Hanyang Univ., Korea)Co-Chair: S. Ono (Panasonic, Japan)
  • DES6-1 Invited A Pixel Structure Using the Negative Feedback Method for High Resolution AMOLED Displays O.-K. Kwon (Hanyang Univ., Korea),S.-K. Hong (Hanyang Univ., Korea),N.-H. Keum (Hanyang Univ., Korea)
  • DES6-2 A Low-Power Scan Driver Using a-IGZO TFTs for 10-in. WQXGA AMFPDs J.-Y. Kim (Hanyang Univ., Korea),S.-J. Ahn (Hanyang Univ., Korea),C.-H. Lee (Hanyang Univ., Korea),S.-K. Hong (Hanyang Univ., Korea),O.-K. Kwon (Hanyang Univ., Korea)
  • DES6-3 Invited Digital Drive as an Enabling Technology for AMOLED Displays C. Xu (Saarland Univ., Germany),P. Volkert (Saarland Univ., Germany)•
  • DES7: Low Power Systems
  • Fri., Dec. 6 13:30-14:50 Small Hall
  • Chair: H. Okumura (Toshiba, Japan)Co-Chair: A. Nagase (Mitsubishi Elec., Japan)
  • DES7-1 Invited A Novel Color Reflective LCD Using Memory-in-Pixel Technologies with Newly-Designed System and Pixel Structure M. Tamaki (Japan Display, Japan),Y. Fukunaga (Japan Display, Japan),M. Mitsui (Japan Display, Japan),K. Maeda (Japan Display, Japan),M. Kabe (Japan Display, Japan),Y. Teranishi (Japan Display, Japan),T. Nakanishi (Japan Display, Japan),H. Omori (Japan Display, Japan),S. Hayashi (Japan Display, Japan),N. Takasaki (Japan Display, Japan),F. Goto (Japan Display, Japan),T. Harada (Japan Display, Japan),S. Kimura (Japan Display, Japan)
  • DES7-2 Invited Image Compression IF Technologies for Low Power FPDs H. Okumura (Toshiba, Japan)
  • DES7-3 Invited Low Power Image Sensor Technologies J. Deguchi (Toshiba, Japan)
  • DES7-4 Efficient Local Dimming Algorithm for LCDs with Single-Edge LED Backlight D. Schäfer (Saarland Univ., Germany),T. Jung (Saarland Univ., Germany),M. Krause (Saarland Univ., Germany),C. Xu (Saarland Univ., Germany)
  • DES8: Display Electronic Systems
  • Fri., Dec. 6 15:10-16:15 Small Hall
  • Chair: A. Sakaigawa (Japan Display, Japan)Co-Chair: R. Hattori (Kyushu Univ., Japan)
  • DES8-1 Invited Electronic Paper System Using High Resolution Electrophoretic Display S. Nebashi (Seiko Epson, Japan),Y. Kodama (Seiko Epson, Japan),I. Hayaishi (Seiko Epson, Japan),K. Kajino (Seiko Epson, Japan),Y. Kuchiki (Seiko Epson, Japan)
  • DES8-2 A 3-Gbps Integrated-Stream Protocol Plus for Ultra High-Definition TFT-LCD Applications H.-C. Wang (AU Optronics, Taiwan),W.-C. Huang (AU Optronics, Taiwan),H.-D. Lin (AU Optronics, Taiwan),C.-H. Yang (AU Optronics, Taiwan)
  • DES8-3 Efficient Edge Directed Unsharp Masking Super Resolution K. S. Peng (Nat. Tsing Hua Univ., Taiwan),F. C. Lin (Nat. Chiao Tung Univ., Taiwan),H.-P. D. Shieh (Nat. Chiao Tung Univ., Taiwan),Y. P. Huang (Nat. Chiao Tung Univ., Taiwan)
  • Poster DESp: Display Electronics and Systems
  • Thu., Dec. 5 14:50-17:50 Main Hall C
  • DESp-1 Dynamic Dimming Algorithm for Low Power and High Image Quality Using Edge-Type LED Backlight L. Yang (Xi'an Jiaotong Univ., China),C. Li (Shenzhen China Star Optoelect. Tech., China),Y. Chen (Shenzhen China Star Optoelect. Tech., China),H. Li (Shenzhen China Star Optoelect. Tech., China),J. He (Shenzhen China Star Optoelect. Tech., China),L. Chu (Shenzhen China Star Optoelect. Tech., China),Z. Tu (Xi'an Jiaotong Univ., China),X. Zhang (Xi'an Jiaotong Univ., China)
  • DESp-2 LED Module Integrated with Microcontroller, Sensors, and Wireless Communication K. Sato (Univ. of Tokushima, Japan),A. Tsuji (Univ. of Tokushima, Japan),S. Suyama (Univ. of Tokushima, Japan),H. Yamamoto (CREST, Japan)
  • DESp-3 Image Upscaling Ringing Suppression Using Adaptive Edge Detection Method K.-S. Peng (Nat. Tsing Hua Univ., Taiwan),F.-C. Lin (Nat. Chiao Tung Univ., Taiwan),H.-P. D. Shieh (Nat. Chiao Tung Univ., Taiwan),Y.-P. Huang (Nat. Chiao Tung Univ., Taiwan)
  • DESp-4 Eyeglass-Based Hands-Free Videophone Using Fish-Eye Cameras and HMD S. Kimura (NTT DoCoMo, Japan),T. Horikoshi (NTT DoCoMo, Japan)
  • DESp-5L Weighted Roll-Off Scheme for Low Power Local Dimming Liquid Crystal Displays S.-K. Kim (Kyung Hee Univ., Korea),E. Song (Kyung Hee Univ., Korea),H. Nam (Kyung Hee Univ., Korea)
  • Workshop on Flexible Displays
  • FMC5/FLX1: Flexible Materials
  • Thu., Dec. 5 13:30-14:30 Main Hall A
  • Chair: Y. Mizushima (Corning, Japan)Co-Chair: M. Kimura, (Nagaoka Univ. of Tech., Japan)
  • FMC5/FLX1-1 Invited Highly Transparent and Conductive Carbon Nanotube Film on Plastic: Cellulose-Assisted Film Deposition Followed by Solution and Photonic Processing Y. Kim (AIST, Japan),Y. Yokota (AIST, Japan),S. Shimada (AIST, Japan),R. Azumi (AIST, Japan),T. Saito (AIST, Japan),N. Minami (AIST, Japan)
  • FMC5/FLX1-2 Invited Challenges toward Reliable Evaluation of High Water Barrier Property S. Hara (AIST, Japan, CEREBA, Japan),A. Suzuki (CEREBA, Japan),H. Takahagi (CEREBA, Japan)
  • FMC5/FLX1-3 Invited Novel Materials for Printable Electronics Y. Ikeda (Teijin, Japan),T. Imamura (Teijin, Japan),Y. Tomizawa (Teijin, Japan),T. Shiro (Teijin, Japan, NanoGram, USA)
  • FLX2: Advanced Processes for Flexible Displays
  • Thu., Dec. 5 15:15-16:20 Main Hall A
  • Chair: T. Kamata (AIST, Japan)Co-Chair: Y. Mishima (FUJIFILM, Japan)
  • FLX2-1 Invited The Potential of Carrier Laminated Ultra-Thin Glass Technology Corresponding to Sheet-to-Sheet Process for Thinner and Flexible Displays Y. Matsuyama (Asahi Glass, Japan),K. Ebata (Asahi Glass, Japan),D. Uchida (Asahi Glass, Japan),T. Higuchi (Asahi Glass, Japan),S. Kondo (AGC America, USA)
  • FLX2-2 Investigation of Roll to Sheet Imprinting for a Process to Fabricate TFTs H. Koyama (Toppan Printing, Japan, JAIST, Japan),K. Fukada (JAIST, Japan),Y. Murakami (JAIST, Japan, JSR, Japan),S. Inoue (JAIST, Japan),T.Shimoda (JAIST, Japan, JST-ERATO, Japan)
  • FLX2-3 Development of a Wet-On-Wet Process for a Fully-Printed TFT Fabrication Y. Kusaka (AIST, Japan),K. Sugihara(Tokyo Electron, Japan),M. Koutake (DIC, Japan),H. Ushijima (AIST, Japan)
  • FLX3: Carbon Related Materials
  • Thu., Dec. 5 16:50-18:05 Main Hall A
  • Chair: H. Fujikake (Tohoku Univ., Japan)Co-Chair: T. Furukawa (Yamagata Univ., Japan)
  • FLX3-1 Invited Fabrication of Carbon Nanotube TFT for Sheet Electronic Device by Printing Method H. Endoh (NEC, Japan),S. Yorozu (NEC, Japan),F. Nihey (NEC, Japan, TASC, Japan),H. Numata (NEC, Japan, TASC, Japan),T. Sekitani(Univ. of Tokyo, Japan),T. Someya(Univ. of Tokyo, Japan)
  • FLX3-2 Invited Carbon Nanotube Transparent Conductive Films for Flexible Display Applications D. J. Arthur (South West NanoTechs., USA),R. P. Silvy (South West NanoTechs., USA),Y. Tan (South West NanoTechs., USA),P. Wallis (South West NanoTechs., USA)
  • FLX3-3 Invited Double-Walled Carbon Nanotube Transparent Conductive Film for Next Generation Flexible Device T. Oi (Toray Inds., Japan),H. Nishino (Toray Inds., Japan),K. Sato (Toray Inds., Japan),O. Watanabe (Toray Inds., Japan),S. Honda (Toray Inds., Japan),M. Suzuki (Toray Inds., Japan)
  • FLX4: Substrates and Materials for Flexible Displays
  • Fri., Dec. 6 9:00-10:30 Conference Hall
  • Chair: T. Shiro (Teijin, Japan)Co-Chair: T. Eguchi (Sumitomo Bakelite, Japan)
  • FLX4-1 Invited Low Coefficient of Linear Thermal Expansion Polyimide Film for TFT Device Substrate T. Okuyama (Toyobo, Japan),I. Kobayashi (Toyobo, Japan),N. Watanabe (Toyobo, Japan),T. Tsuchiya (Toyobo, Japan),M. Nakamura (Toyobo, Japan)
  • FLX4-2 Invited Development of High Barrier Film for OLED Devices K. Hirabayashi (Konica Minolta, Japan),H. Ito (Konica Minolta, Japan),T. Mori (Konica Minolta, Japan)
  • FLX4-3 Gas Barrier Film Formation with Silazane Coating Material N. Satake (AZ Elect. Materials Manufacturing Japan, Japan),S. Kawato (AZ Elect. Materials Manufacturing Japan, Japan),Y. Ozaki (AZ Elect. Materials Manufacturing Japan, Japan),M. Kobayashi (AZ Elect. Materials Manufacturing Japan, Japan)
  • FLX4-4 Application of Laser Fusing Cutting for Ultra-Thin Glass N. Inayama (Nippon Elec. Glass, Japan),T. Fujii (Nippon Elec. Glass, Japan)
  • FLX5: Advanced Devices and Materials
  • Fri., Dec. 6 10:40-11:55 Conference Hall
  • Chair: H. Maeda (DNP, Japan)Co-Chair: K. Akamatsu (Sony, Japan)
  • FLX5-1 Invited Flexible Pressure Sensor Array Fabricated by Printing Method S. Uemura (AIST, Japan),Y. Watanabe (AIST, Japan),S. Hoshino (AIST, Japan),H. Sakai (AIST, Japan),K. Tokoro (AIST, Japan),H. Tokuhisa (AIST, Japan),T. Kodzasa (AIST, Japan),M. Yoshida (AIST, Japan)
  • FLX5-2 Invited Flexible Piezoelectric Films with Alternate Rows of Optical Isomers of Poly-Lactic Acid Film T. Yoshida (Teijin, Japan),A. Kato (Teijin, Japan),T. Yoshimura (Teijin, Japan),Y. Tajitsu (Kansai Univ., Japan)
  • FLX5-3 Invited Development of Materials and Innovative Deposition Processes for Organic TFTs J. Brill (BASF SE, Germany, InnovationLab, Germany),T. Musiol (BASF SE, Germany, InnovationLab, Germany),D. Kaelblein (BASF SE, Germany, InnovationLab, Germany),T. Gessner (BASF SE, Germany, InnovationLab, Germany),T. Staudt (BASF SE, Germany, InnovationLab, Germany)
  • FLX6: Flexible Oxide TFTSpecial Topics of Interest on Oxide TFT
  • Fri., Dec. 6 13:30-14:15 Conference Hall
  • Chair: M. Ito (Toppan Printing, Japan)Co-Chair: K. Uemura (Nippon Steel Sumitomo Metal, Japan)
  • FLX6-1L High Performance Top-Gate Oxide TFT on Plastic Substrate for Flexible OLED Displays H. S. Shin (LG Display, Korea),S. M. Lee (LG Display, Korea),S. Oh (LG Display, Korea),J.-U. Bae (LG Display, Korea),W. Shin (LG Display, Korea),I. B. Kang (LG Display, Korea)
  • FLX6-2L Evaluation of Two Flexible Substrate Technologies by Low Temperature (200℃) IGZO TFT Process C.-C. Chen (Tianma Micro-Elect. Group, China),H.-C. Zang (Tianma Micro-Elect. Group, China),S.-T. Huo (Tianma Micro-Elect. Group, China),Z.-H. Ling (Tianma Micro-Elect. Group, China),J. Ma (Tianma Micro-Elect. Group, China),X.-F. Li (Shanghai Univ., China),L.-L. Chen (Shanghai Univ., China),J.-H. Zhang (Shanghai Univ., China)
  • FLX6-3L Low-Temperature IGZO TFT Backplane and Its Application in Flexible AMOLED Displays on Ultrathin Polymer Films J.-L. P.J. van der Steen (Holst Ctr., the Netherlands),A. K. Tripathi (Holst Ctr., the Netherlands),J. Maas (Holst Ctr., the Netherlands),K. van Diesen-Tempelaars (Holst Ctr., the Netherlands),L. van Leuken (Holst Ctr., the Netherlands),G. de Haas (Holst Ctr., the Netherlands),B. van der Putten (Holst Ctr., the Netherlands),I. Yakimets (Holst Ctr., the Netherlands),F. Li (Holst Ctr., the Netherlands),T. Ellis (Holst Ctr., the Netherlands),T. van Mol (Holst Ctr., the Netherlands),G. Gelinck (Holst Ctr., the Netherlands),K. Myny (imec, Belgium),P. Vicca (imec, Belgium),S. Smout (imec, Belgium),M. Ameys (imec, Belgium),T. H. Ke (imec, Belgium),S. Steudel (imec, Belgium),M. Nag (imec, Belgium),S. Schols (imec, Belgium),J. Genoe (imec, Belgium),P. Heremans (imec, Belgium),Y. Fukui (Panasonic, Japan),S. Green (Victrex Polymer Solutions, UK)
  • Poster FLXp: Flexible Display Technologies
  • Thu., Dec. 5 9:00-12:00 Main Hall C
  • FLXp-1 Screen-Printing Fabrication of Interconnections for TFT Y. Maeda (JAIST, Japan),K. Fukada (JAIST, Japan),A. Matoba (Ind. Res. Inst. of Ishikawa, Japan),S. Takagi (Tokyo Process Service, Japan),S. Inoue (JAIST, Japan),T.Shimoda (JAIST, Japan, JST-ERATO, Japan)
  • FLXp-2 Preparation of Ruthenium Metal and Ruthenium Oxide Thin Films by a Low-Temperature Solution Process Y. Murakami (JSR, Japan, JAIST, Japan),P. T. Tue (JAIST, Japan),H. Tsukada (JAIST, Japan, Mitsubishi Materials Elect. Chems., Japan),J. Li (JAIST, Japan, JST-ERATO, Japan),T. Shimoda (JAIST, Japan, JST-ERATO, Japan)
  • FLXp-3 Withdrawn
  • FLXp-4 Development of Ch-LC Microencapsulated Flexible Displays with Reduced Driving Voltage and Much Simplified Manufacturing Process S.-G. Kang (Hanyang Univ., Korea, Image Lab, Korea),H. T. Jang (Hanyang Univ., Korea),Y.-J. Lee (Hanyang Univ., Korea),J.-H. Kim (Hanyang Univ., Korea)
  • FLXp-5 Withdrawn
  • FLXp-6 Hybrid Inorganic-Organic Multilayer Structures for Flexible Moisture-Barrier Films of Flexible OLED Lightings S.-W. Seo (Sungkyunkwan Univ., Korea),E. Jung (Sungkyunkwan Univ., Korea),H. Lee (Sungkyunkwan Univ., Korea),S. M. Cho (Sungkyunkwan Univ., Korea)
  • FLXp-7 Metal Grid Embedded Transparent Electrode for Flexible OLEDs H. Lee (Sungkyunkwan Univ., Korea),S.-W. Seo (Sungkyunkwan Univ., Korea),E. Jung (Sungkyunkwan Univ., Korea),S. M. Cho (Sungkyunkwan Univ., Korea)
  • FLXp-8 Colorful ThermoformableLCD and Its Sequential Segment Driving W.-T. Chen (ITRI, Taiwan),M.-H. Yang (ITRI, Taiwan),C.-C. Tsai (ITRI, Taiwan),R.-L. Chang (ITRI, Taiwan),C.-L. Chin (ITRI, Taiwan),Y.-Z. Lee (ITRI, Taiwan),J.-L. Chen (ITRI, Taiwan)
  • FLXp-9L A 5-in. Flexible AMOLED on PEN Substrate Driven by Ln-IZO TFTs Based on Anodic Aluminum Oxide H. Xu (South China Univ. of Tech., China),M. Xu (South China Univ. of Tech., China),J. Pang (Guangzhou New Vision Opto-Elect. Tech., China),J. Zou (South China Univ. of Tech., China),H. Tao (South China Univ. of Tech., China),M. Li (South China Univ. of Tech., China),D. Luo (South China Univ. of Tech., China),L. Wang (South China Univ. of Tech., China),J. Peng (South China Univ. of Tech., China, Guangzhou New Vision Opto-Elect. Tech., China)
  • FLXp-10L The Effect of Isopropyl Alcohol and Silicon Dioxide Nanoparticle on the Reflection Loss for Single Crystalline Silicon C. Wei (Tatung Univ., Taiwan),C.-M. Hu (Tatung Univ., Taiwan)
  • FLXp-11L Damage-Induced Black Spot Expansion of Thin-Film Encapsulated OLED Devices S. Zhu (Kunshan New Flat Panel Display Tech. Ctr., China),H. Hirayama (Kunshan New Flat Panel Display Tech. Ctr., China),X. Huang (Kunshan New Flat Panel Display Tech. Ctr., China)
  • Workshop on Touch Panels and Input Technologies
  • INP1: Touch Panel (1) & Haptics
  • Wed., Dec. 4 14:00-15:25 Small Hall
  • Chair: H. Noma (Ritsumeikan Univ., Japan)Co-Chair: H.-S. Koo (Minghsin Univ. of S&T, Taiwan)
  • INP1-t Invited Risk Management for Pressure Ulcers Using MEMS Tactile Sensor H. Noma (Ritsumeikan Univ., Japan),K. Lee (Osaka Univ., Japan)
  • INP1-2 Invited A Deformation Detection Touch Panel using a Piezoelectric Poly(L-lactic acid) Film M. Ando (Murata Manufacturing, Japan, Kansai Univ., Japan),H. Kawamura (Murata Manufacturing, Japan),H. Kitada (Murata Manufacturing, Japan),Y. Sekimoto (Murata Manufacturing, Japan),T. Inoue (Murata Manufacturing, Japan),S. Nishikawa (Mitsui Chems., Japan),M. Yoshida (Mitsui Chems., Japan),K. Tanimoto (Mitsui Chems., Japan),Y. Tajitsu (Kansai Univ., Japan)
  • INP1-3 Driving Schema of High Integrated Panel with TSP and 3D D.-W. Kuo (Chunghwa Picture Tubes, Taiwan),J.-S. Liao (Chunghwa Picture Tubes, Taiwan),H.-H. Chen (Chunghwa Picture Tubes, Taiwan),H.-M. Su (Chunghwa Picture Tubes, Taiwan),W.-T. Tseng (Chunghwa Picture Tubes, Taiwan)
  • INP1-4L AdDetect: Recognition above the Surface in Multi-Touch Tabletop Environments T. Terada (Hokkaido Univ., Japan),H. Nonaka (Hokkaido Univ., Japan),T. Yoshikawa (Hokkaido Univ., Japan),H. Mi (Univ. of Tokyo, Japan),M. Sugimoto (Hokkaido Univ., Japan)
  • INP2/DES2: AR/VR Interactive SystemsSpecial Topics of Interest on Augmented Reality and Virtual Reality
  • Wed., Dec. 4 15:40-17:20 Mid-sized Hall B
  • Chair: N. Sakata (Osaka Univ., Japan)Co-Chair: N. Hashimoto (Citizen Holdings, Japan)
  • INP2/DES2-1 Invited Reality Beyond Its Physicality M. Inami (Keio Univ., Japan)
  • INP2/DES2-2 Invited A Tablet Interface for Laying Out AR Objects-Outlook of Relationship with Smartphone and AR- N. Sakata (Osaka Univ., Japan),R. Nagashima (Osaka Univ., Japan),S. Nishida (Osaka Univ., Japan)
  • INP2/DES2-3 Invited The Possibility of the Eyeglass-Type Mobile Phone T. Horikoshi (NTT DoCoMo, Japan)
  • INP2/DES2-4 A Cartoon-Character Costume with Active Facial Expression Y. Oka (Niigata Univ., Japan),M. Yamamoto (Niigata Univ., Japan)
  • INP3: Touch Panel (2)
  • Thu., Dec. 5 13:30-15:00 Small Hall
  • Chair: R. Hattori (Kyushu Univ., Japan)Co-Chair: M. Miyamoto (Sharp, Japan)
  • INP3-1 Invited Single ITO Layer Multi-Touch Sensor Panel R. Hattori (Kyushu Univ., Japan),K. Kyoung (Kyushu Univ., Japan),R. Yoneda (Kyushu Univ., Japan)
  • INP3-2 Invited How to Realize High SNR Projected Capacitive Touch Systems with Very Large Format M. Miyamoto (Sharp, Japan)
  • INP3-3 Noise Immunity Enhancement for Capacitive Touch-Screens D. Sugimoto (NLT Techs., Japan),H. Haga (NLT Techs., Japan),K. Takatori (NLT Techs., Japan),H. Asada (NLT Techs., Japan)
  • INP3-4 High Efficient Anti-Noise Touch in Cell Display C.-Y. Hsu (Chunghwa Picture Tubes, Taiwan),S.-Z. Peng (Chunghwa Picture Tubes, Taiwan),S.-H. Huang (Chunghwa Picture Tubes, Taiwan),H.-H. Chen (Chunghwa Picture Tubes, Taiwan),H.-M. Su (Chunghwa Picture Tubes, Taiwan)
  • INP4: 3D/2D Imaging Systems
  • Thu., Dec. 5 15:10-16:30 Small Hall
  • Chair: C. Niclass (Toyota Central R&D Labs., Japan)Co-Chair: K. Kagawa (Shizuoka Univ., Japan)
  • INP4-1 Invited Long-Range 3D Imaging in CMOS for Road Environment Recognition C. Niclass (Toyota Central R&D Labs., Japan),M. Soga (Toyota Central R&D Labs., Japan),H. Matsubara (Toyota Central R&D Labs., Japan),M. Ogawa (Toyota Central R&D Labs., Japan),M. Kagami (Toyota Central R&D Labs., Japan),T. Yamashita (Toyota Central R&D Labs., Japan),T. Naito (Toyota Central R&D Labs., Japan)
  • INP4-2 Time-Multiplexed 3D Camera System with an Electro-Optical Filter Alternately Transmitting Visible and Near Infrared Radiation J. Shin (Samsung Advanced Inst. of Tech., Korea),J. Osterman (LC-Tec Displays AB, Sweden),B. Kang (Samsung Advanced Inst. of Tech., Korea),K. Lee (Samsung Advanced Inst. of Tech., Korea),J. D.K. Kim (Samsung Advanced Inst. of Tech., Korea)
  • INP4-3 Optical Pixel-Sensor Array Using TFT Technology as Image-Scan/Fingerprint Panel A.-T. Cho (AU Optronics, Taiwan),C. Chang (AU Optronics, Taiwan),Z.-S. Zheng (AU Optronics, Taiwan),J.-F. Cho (AU Optronics, Taiwan),H.-L. Hsieh (AU Optronics, Taiwan),J.-H. Jan (AU Optronics, Taiwan),J.-W. Chen (AU Optronics, Taiwan),A. Liu (AU Optronics, Taiwan),R.-C. Cheng (AU Optronics, Taiwan),J.-P. Tseng (AU Optronics, Taiwan),J.-J. Chang (AU Optronics, Taiwan),M.-F. Chiang (AU Optronics, Taiwan),Y.-C. Lin (AU Optronics, Taiwan)
  • INP4-4L Multi-Mode Simultaneous Image Acquisition with Integrated Compound-Eye Camera for Human Interface: Wide-Angle Video, 3D Gesture Recognition, and Eye Tracking K. Kagawa (Shizuoka Univ., Japan),K. Shimonomura (Ritsumeikan Univ., Japan),S. Kawahito (Shizuoka Univ., Japan)
  • Poster INPp: Touch Panel
  • Thu., Dec. 5 9:00-12:00 Main Hall C
  • INPp-1 Touch Sensing Optimization for Large Size Capacitive Touch Panel C. Ye (China Star Optoelect. Tech., China),C. Chang (China Star Optoelect. Tech., China),R. Fu (China Star Optoelect. Tech., China),J. Qiu (China Star Optoelect. Tech., China),Y. Lin (China Star Optoelect. Tech., China)
  • INPp-2 A-Si Touch Driver Integrating with Gate Driver for Flat Panel Display Application G.-T. Zheng (Nat. Tsing Hua Univ., Taiwan),M.-C. Wu (Nat. Tsing Hua Univ., Taiwan),P.-T. Liu (Nat. Chiao Tung Univ., Taiwan),R.-J. Chen (Nat. Chiao Tung Univ., Taiwan),F.-J. Yang (Nat. Chiao Tung Univ., Taiwan),C.-Y. Wu (Giantplus Tech., Taiwan)
  • INPp-3 A Novel Stylus for LCD Base on Capacitive Touch Y.-L. Ho (Chunghwa Picture Tubes, Taiwan),M.-C. Weng (Chunghwa Picture Tubes, Taiwan),Y.-C. Chen (Chunghwa Picture Tubes, Taiwan),H.-H. Chen (Chunghwa Picture Tubes, Taiwan),H.-M. Su (Chunghwa Picture Tubes, Taiwan),W.-Z. Zeng (Chunghwa Picture Tubes, Taiwan)
  • INPp-4 Multi-Source Touch Implementation in Multi-Touch System J.-H. Chen (AU Optronics, Taiwan),Y.-C. Kang (AU Optronics, Taiwan)

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