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Format 記事・論文

分子線エピタキシー法によるGaAs,AlGaAs単結晶薄膜の成長とその評価

岩井 嘉男 他

details

Title 分子線エピタキシー法によるGaAs,AlGaAs単結晶薄膜の成長とその評価
Author 岩井 嘉男 他
Place of Publication (Country Code) JP
Description 記事分類: 電気工学--電気材料・部品
Year of Publication(W3CDTF) 1988
NDLC ZM2
Target Audience 一般
Material Type 記事・論文
is part of (URI Form) https://iss.ndl.go.jp/books/R100000002-I000000002512-00
is part of (ISSN Form) 03750191
is part of (ISSN-L Form) 03750191
Magazine-which-carries-the-article name 大阪工業大学紀要. 理工篇 = Memoirs of Osaka Institute of Technology. Series A, Science & technology / 大阪工業大学紀要委員会 編
Printing volume 32
Printing number 2
Printing page p143~155
Language(ISO639-2 Form) jpn : 日本語

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