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Journal of photopolymer science and technology

Journal of photopolymer science and technology
紙雑誌雑誌タイトル
The Society of Photopolymer Science and Technology1993-<Z53-W515>
国立国会図書館
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Journal of photopolymer science and technology

Journal of photopolymer science and technology
記録メディアデジタル雑誌電子書籍・電子雑誌雑誌タイトル
Technical Association of Photopolymer, Japan2003<ISSN>
国立国会図書館全国の図書館
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Journal of photopolymer science and technology

Journal of photopolymer science and technology
紙雑誌雑誌タイトル
フォトポリマー懇話会 編フォトポリマー懇話会1988-<Z17-1205>
国立国会図書館全国の図書館
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Composite Membrane of Bi₂WO₆-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants

Composite Membrane of Bi₂WO₆-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants
紙デジタル記事
Xinyu Tang, Dongqing Liu, Yi Lu, Shun Zhou, Yuxuan Cheng, Qinxing Xie<Z53-W515>Journal of photopolymer science and technology37(5):2024p.545-560
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Wafer Edge Protection Layer : A Solution for Metal Contamination Issue in Advanced Patterning Process

Wafer Edge Protection Layer : A Solution for Metal Contamination Issue in Advanced Patterning Process
紙デジタル記事
Takanori Kudo, Joon Yeon Cho, Aritaka Hishida, Salem Mullen, Elizabeth Wolfer, Orest Polishchuk, Charito Antonio, Zhong Li<Z53-W515>Journal of photopolymer science and technology37(3):2024p.321-326
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Hybrid Soft Replica Molds for Residual Layer-Free Patterning

Hybrid Soft Replica Molds for Residual Layer-Free Patterning
紙デジタル記事
Yuri Nakamura, Jun Taniguchi<Z53-W515>Journal of photopolymer science and technology37(5):2024p.465-468
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The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides

The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides
紙デジタル記事
Shumpei Kajita, Kiyoshi Mori, Hideo Horibe<Z53-W515>Journal of photopolymer science and technology37(4):2024p.407-410
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A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography

A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography
紙デジタル記事
Kayoko Cho, Cong Que Dinh, Hikari Tomori, Seiji Nagahara, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu<Z53-W515>Journal of photopolymer science and technology37(3):2024p.251-256
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Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of p-Hydroxyazobenzene Derivative

Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of p-Hydroxyazobenzene Derivative
紙デジタル記事
Pyae Thu, Mina Han<Z53-W515>Journal of photopolymer science and technology37(2):2024p.221-226
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Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer

Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer
紙デジタル記事
Kenichi Takeuchi, Chiharu Koga, Tomoaki Shibata, Yu Aoki, Yukika Aoki<Z53-W515>Journal of photopolymer science and technology37(3):2024p.341-344
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Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography

Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography
紙デジタル記事
Yuki Kikuchi, Riko Taura, Kazuki Oi, Tomoki Iwaoka, Toshiyuki Horiuchi, Hiroshi Kobayashi<Z53-W515>Journal of photopolymer science and technology37(4):2024p.423-429
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Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge

Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge
紙デジタル記事
Yoshihisa Osano, Hiroyuki Fukue, Susumu Takabayashi, Shinsuke Kunitsugu, Yuichi Imai, Tatsuyuki Nakatani<Z53-W515>Journal of photopolymer science and technology37(4):2024p.391-396
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Novel EUV Underlayer Design for Metal Oxide Resist Patterning

Novel EUV Underlayer Design for Metal Oxide Resist Patterning
紙記事
Ji Young Hwang, Jung June Lee, Hyeon Woo Shin, Bon Ki Ku, Jae Hwan Sim, Jae Bong Lim<Z53-W515>Journal of photopolymer science and technology37(3):2024p.263-266
国立国会図書館全国の図書館

Green-Solvent Processed Green-Light Wavelength-Selective Organic Solar Cells Towards Agrivoltaics

Green-Solvent Processed Green-Light Wavelength-Selective Organic Solar Cells Towards Agrivoltaics
紙デジタル記事
Shreyam Chatterjee, Yohei Iimuro, Yasuyuki Watanabe, Yutaka Ie<Z53-W515>Journal of photopolymer science and technology37(2):2024p.191-195
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Advanced Development Techniques for Extreme : Tight Pitch Patterning

Advanced Development Techniques for Extreme : Tight Pitch Patterning
紙デジタル記事
Hikari Tomori, Cong Que Dinh, Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara, Soichiro Okada, Kayoko Cho, Junji Nakamura, Syuuya Yamasaki, Shoichi Terada, Makoto Muramatsu, Alexandra Krawicz, Kathleen McInerney, Nathan Antonovich, Lior Huli<Z53-W515>Journal of photopolymer science and technology37(3):2024p.245-250
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Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5°C with TiO₂-SiO₂ Gas-Permeable Porous Mold

Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5°C with TiO₂-SiO₂ Gas-Permeable Porous Mold
紙記事
Rio Yamagishi, Sayaka Miura, Mano Ando, Yuna Hachikubo, Naoto Sugino, Yoshiyuki Yokoyama, Kaori Yasuda, Satoshi Takei<Z53-W515>Journal of photopolymer science and technology37(5):2024p.457-463
国立国会図書館全国の図書館

Investigation Of Control of Water Contact Angle by Composition Control of SiCO[x]H[y] Film Formed on Si Substrate

Investigation Of Control of Water Contact Angle by Composition Control of SiCO[x]H[y] Film Formed on Si Substrate
紙記事
<Z53-W515>Journal of photopolymer science and technology37(3):2024p.345-350
国立国会図書館全国の図書館

Rapid Surface Treatment of Polytetrafluoroethylene using Ar - Atmospheric Pressure Microwave Plasma

Rapid Surface Treatment of Polytetrafluoroethylene using Ar - Atmospheric Pressure Microwave Plasma
紙デジタル記事
Masuhiro Kogoma, Kunihito Tanaka<Z53-W515>Journal of photopolymer science and technology37(4):2024p.385-390
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Degradation of Modified Polystyrenes Having Degradable Units by Near lnfrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator

Degradation of Modified Polystyrenes Having Degradable Units by Near lnfrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator
紙記事
Haruyuki Okamura, Kiwa Mihono<Z53-W515>Journal of photopolymer science and technology37(2):2024p.205-208
国立国会図書館全国の図書館

Meeting Challenges of Advanced Packaging Designs with a Preimidized Polymer as Dielectric Material

Meeting Challenges of Advanced Packaging Designs with a Preimidized Polymer as Dielectric Material
紙デジタル記事
Sanjay Malik, Binod De, Stephanie Dilocker, Raj Sakamuri, Juliet Kotyk<Z53-W515>Journal of photopolymer science and technology37(5):2024p.561-566
インターネットで読める国立国会図書館全国の図書館
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