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Journal of photopolymer science and technology

Journal of photopolymer science and technology
紙雑誌雑誌タイトル
The Society of Photopolymer Science and Technology1993-<Z53-W515>
国立国会図書館
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Journal of photopolymer science and technology

Journal of photopolymer science and technology
記録メディアデジタル雑誌電子書籍・電子雑誌雑誌タイトル
Technical Association of Photopolymer, Japan2003<ISSN>
国立国会図書館全国の図書館
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Journal of photopolymer science and technology

Journal of photopolymer science and technology
紙雑誌雑誌タイトル
フォトポリマー懇話会 編フォトポリマー懇話会1988-<Z17-1205>
国立国会図書館全国の図書館
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Composite Membrane of Bi₂WO₆-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants

Composite Membrane of Bi₂WO₆-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants
紙デジタル記事
Xinyu Tang, Dongqing Liu, Yi Lu, Shun Zhou, Yuxuan Cheng, Qinxing Xie<Z53-W515>Journal of photopolymer science and technology37(5):2024p.545-560
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Wafer Edge Protection Layer : A Solution for Metal Contamination Issue in Advanced Patterning Process

Wafer Edge Protection Layer : A Solution for Metal Contamination Issue in Advanced Patterning Process
紙デジタル記事
Takanori Kudo, Joon Yeon Cho, Aritaka Hishida, Salem Mullen, Elizabeth Wolfer, Orest Polishchuk, Charito Antonio, Zhong Li<Z53-W515>Journal of photopolymer science and technology37(3):2024p.321-326
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Hybrid Soft Replica Molds for Residual Layer-Free Patterning

Hybrid Soft Replica Molds for Residual Layer-Free Patterning
紙デジタル記事
Yuri Nakamura, Jun Taniguchi<Z53-W515>Journal of photopolymer science and technology37(5):2024p.465-468
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The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides

The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides
紙デジタル記事
Shumpei Kajita, Kiyoshi Mori, Hideo Horibe<Z53-W515>Journal of photopolymer science and technology37(4):2024p.407-410
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A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography

A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography
紙デジタル記事
Kayoko Cho, Cong Que Dinh, Hikari Tomori, Seiji Nagahara, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu<Z53-W515>Journal of photopolymer science and technology37(3):2024p.251-256
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Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of p-Hydroxyazobenzene Derivative

Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of p-Hydroxyazobenzene Derivative
紙デジタル記事
Pyae Thu, Mina Han<Z53-W515>Journal of photopolymer science and technology37(2):2024p.221-226
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Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer

Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer
紙デジタル記事
Kenichi Takeuchi, Chiharu Koga, Tomoaki Shibata, Yu Aoki, Yukika Aoki<Z53-W515>Journal of photopolymer science and technology37(3):2024p.341-344
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Green-Solvent Processed Green-Light Wavelength-Selective Organic Solar Cells Towards Agrivoltaics

Green-Solvent Processed Green-Light Wavelength-Selective Organic Solar Cells Towards Agrivoltaics
紙デジタル記事
Shreyam Chatterjee, Yohei Iimuro, Yasuyuki Watanabe, Yutaka Ie<Z53-W515>Journal of photopolymer science and technology37(2):2024p.191-195
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Advanced Development Techniques for Extreme : Tight Pitch Patterning

Advanced Development Techniques for Extreme : Tight Pitch Patterning
紙デジタル記事
Hikari Tomori, Cong Que Dinh, Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara, Soichiro Okada, Kayoko Cho, Junji Nakamura, Syuuya Yamasaki, Shoichi Terada, Makoto Muramatsu, Alexandra Krawicz, Kathleen McInerney, Nathan Antonovich, Lior Huli<Z53-W515>Journal of photopolymer science and technology37(3):2024p.245-250
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Novel EUV Underlayer Design for Metal Oxide Resist Patterning

Novel EUV Underlayer Design for Metal Oxide Resist Patterning
紙記事
Ji Young Hwang, Jung June Lee, Hyeon Woo Shin, Bon Ki Ku, Jae Hwan Sim, Jae Bong Lim<Z53-W515>Journal of photopolymer science and technology37(3):2024p.263-266
国立国会図書館全国の図書館

Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography

Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography
紙デジタル記事
Yuki Kikuchi, Riko Taura, Kazuki Oi, Tomoki Iwaoka, Toshiyuki Horiuchi, Hiroshi Kobayashi<Z53-W515>Journal of photopolymer science and technology37(4):2024p.423-429
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Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge

Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge
紙デジタル記事
Yoshihisa Osano, Hiroyuki Fukue, Susumu Takabayashi, Shinsuke Kunitsugu, Yuichi Imai, Tatsuyuki Nakatani<Z53-W515>Journal of photopolymer science and technology37(4):2024p.391-396
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Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity

Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity
紙デジタル記事
Riku Akabane, Kazumasa Okamoto, Takahiro Kozawa, Hiroto Kudo<Z53-W515>Journal of photopolymer science and technology37(3):2024p.293-298
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Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices

Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices
紙デジタル記事
Tomokazu Umeyama, Motohisa Kubota, Haoxuan Zhang, Rintaro Adachi, Akira Yamakata, Tomoyuki Koganezawa, Hiroshi Imahori<Z53-W515>Journal of photopolymer science and technology37(2):2024p.197-204
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High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor

High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor
紙デジタル記事
Yusuke Fukuzaki, Manami Fujii, Mitsuhito Suwa<Z53-W515>Journal of photopolymer science and technology37(1):2024p.95-100
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Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography

Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography
紙デジタル記事
Hiroshi Kobayashi, Motoki Kataoka, Shogo Komiya, Tomoki Iwaoka, Kazuki Oi, Toshiyuki Horiuchi<Z53-W515>Journal of photopolymer science and technology37(1):2024p.15-21
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Synthesis and Electrophoretic Deposition of Polyimide with Methacrylic Groups on the Side Chain

Synthesis and Electrophoretic Deposition of Polyimide with Methacrylic Groups on the Side Chain
紙デジタル記事
Yasuhiro Funayama, Rumana Nozawa, Ayumi Kobayashi, Kohei Iritani, Hideyuki Kikuchi, Takashi Yamashita<Z53-W515>Journal of photopolymer science and technology37(1):2024p.57-62
インターネットで読める国立国会図書館全国の図書館
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