ヘルプ
ヘルプ

検索結果 157 件

Etch characteristics of ZrO2 thin films in high density plasma (Special issue: Recent advances in dry process and related technologies)

Etch characteristics of ZrO2 thin films in high density plasma (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Jong-Chang Woo, Gwan-Ha Kim, Dong-Pyo Kim 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HD03-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Kinetics of chemical changes in phenol formaldehyde based polymeric films etched in N2O and O2 inductively coupled plasmas: a comparative study (Special issue: Recent advances in dry process and related technologies)

Kinetics of chemical changes in phenol formaldehyde based polymeric films etched in N2O and O2 inductively coupled plasmas: a comparative study (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Kwang-Ho Kwon, Nam-Ki Min, Seung-Youl Kang 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HA02-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 著者標目Kwang-Ho Kwon Nam-Ki Min Seung-Youl Kang

Prediction of fluctuations in plasma-wall interactions using an equipment engineering system (Special issue: Recent advances in dry process and related technologies)

Prediction of fluctuations in plasma-wall interactions using an equipment engineering system (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Masanaga Fukasawa, Atsushi Kawashima, Nobuyuki Kuboi 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HC01-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Improvement of pattern-to-pattern critical dimension variation by model based method in gate polycrystalline silicon etching process (Special issue: Recent advances in dry process and related technologies)

Improvement of pattern-to-pattern critical dimension variation by model based method in gate polycrystalline silicon etching process (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Koji Tamura, Tasuku Yoshioka, Kiyoshige Ohmori 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HC02-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Effect of heat treatment on electrical properties of amorphous oxide semiconductor In-Ga-Zn-O film as a function of oxygen flow rate (Special issue: Recent advances in dry process and related technologies)

Effect of heat treatment on electrical properties of amorphous oxide semiconductor In-Ga-Zn-O film as a function of oxygen flow rate (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Chulho Jung, Duckjin Kim, Yong Kyu Kang 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK02-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 著者標目Chulho Jung Duckjin Kim Yong Kyu Kang

Inductively coupled plasma etching of chemical-vapor-deposited amorphous carbon in N2/O2/Ar chemistries (Special issue: Recent advances in dry process and related technologies)

Inductively coupled plasma etching of chemical-vapor-deposited amorphous carbon in N2/O2/Ar chemistries (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Hag Joo Lee, Bong Soo Kwon, Young Rok Park 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HD05-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Effects of mask and necking deformation on bowing and twisting in high-aspect-ratio contact hole etching (Special issue: Recent advances in dry process and related technologies)

Effects of mask and necking deformation on bowing and twisting in high-aspect-ratio contact hole etching (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Masatoshi Miyake, Nobuyuki Negishi, Masaru Izawa 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HE01-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Reduction of leakage currents in bottom-gate N-channel metal-induced crystallization through a cap layer polycrystalline silicon thin-film transistors by applying off-bias stress (Special issue: Recent advances in dry process and related technologies)

Reduction of leakage currents in bottom-gate N-channel metal-induced crystallization through a cap layer polycrystalline silicon thin-film transistors by applying off-bias stress (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Dong Han Kang, Beom Seok Oh, Mi Kyung Park 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK01-1～3
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Improvement of the light extraction efficiency in n-ZnO:Ga/p-Si heterojunction light emitting diodes by a SiO2 current-blocking layer (Special issue: Recent advances in dry process and related technologies)

Improvement of the light extraction efficiency in n-ZnO:Ga/p-Si heterojunction light emitting diodes by a SiO2 current-blocking layer (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Won Suk Han, Young Yi Kim, Bo Hyun Kong 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK03-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Mechanism and CHARM2 evaluation of P-channel metal oxide semiconductor threshold voltage drop during high density plasma heat-up process (Special issue: Recent advances in dry process and related technologies)

Mechanism and CHARM2 evaluation of P-channel metal oxide semiconductor threshold voltage drop during high density plasma heat-up process (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Dong-Hwan Kim, Jeongyun Lee, Min-Sung Kim 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HF02-1～3
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 著者標目Dong-Hwan Kim Jeongyun Lee Min-Sung Kim

Fabrication and characterization of dye-sensitized solar cell using TiO2-nanotube particles by anodic oxidation (Special issue: Recent advances in dry process and related technologies)

Fabrication and characterization of dye-sensitized solar cell using TiO2-nanotube particles by anodic oxidation (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Youl-Moon Sung, Ki-Young Chun, Dong-Joo Kwak 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK07-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 参照Study on the Fabrication of Paint-Type Si Quant......electrochemiluminescence cell application
  • 参照...rays to 134 μm in Length Highly-......s up to 220 µm in length: use in water photoele......anotube Arrays in Dye-Sensitized...... Backside illuminated dye-sensit......lectrodes Removing Structural Di...... Arrays:  Reducing the Dimension......port and Recombination in Dye-Sensitized Solar Cells

ZnO nanowall structures synthesized by radio frequency magnetron sputtering method (Special issue: Recent advances in dry process and related technologies)

ZnO nanowall structures synthesized by radio frequency magnetron sputtering method (Special issue: Recent advances in dry process and related technologies)
デジタル記事
In Soo Kim, Do Yun Kim, In June Kim 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HJ02-1～3
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 著者標目In Soo Kim Do Yun Kim In June Kim

Improvement of surface morphology of polymer waveguides for high sensitivity optical biosensor by chemical mechanical polishing (Special issue: Recent advances in dry process and related technologies)

Improvement of surface morphology of polymer waveguides for high sensitivity optical biosensor by chemical mechanical polishing (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Soon Woo Kwon, Woo Seok Yang, Hyung Man Lee 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK05-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO2 films on glass substrate (Special issue: Recent advances in dry process and related technologies)

Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO2 films on glass substrate (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Mika Hojo, Kunio Okimura<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HK06-1～6
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Dependence of plasma density on air gap length of resonant cavity with bottom plate replaced by high-density plasma (Special issue: Recent advances in dry process and related technologies)

Dependence of plasma density on air gap length of resonant cavity with bottom plate replaced by high-density plasma (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Sumio Kogoshi, Yu Yoshioka, Noboru Katayama 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HB01-1～4
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Synchronous pulse plasma operation upon source and bias radio frequencys for inductively coupled plasma for highly reliable gate etching technology (Special issue: Recent advances in dry process and related technologies)

Synchronous pulse plasma operation upon source and bias radio frequencys for inductively coupled plasma for highly reliable gate etching technology (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Ken Tokashiki, Hong Cho, Samer Banna 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HD01-1～11
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Drying and roasting of cocoa and coffee (Advances in drying science and technology)

Drying and roasting of cocoa and coffee (Advances in drying science and technology)
紙図書
edited by Ching Lik Hii and Flávio Meira Borém.CRC Press[2020]<PC61-D1>
国立国会図書館
  • 要約等"The drying and roasting of cocoa and ......critical roles in governing the formation......vor precursors in the early stag......avor and aroma in the later stage during processing. Hence, qualities of the finished chocolate......iscusses the principles and practices of drying and roasting of cocoa and ...... beans, processing equipment, fl......book will also include recent sc......s whom are leading experts in the drying and roasting aspects of co...... coffee processing."--
  • 件名Cocoa processing. Cocoa trade. Coffee--Processing. Coffee industry.
  • タイトル標目Advances in drying science & technology.

Gas-phase synthesis of silicon nanoparticles and mixing with graphite powders by using counter-flow injection (Special issue: Recent advances in dry process and related technologies)

Gas-phase synthesis of silicon nanoparticles and mixing with graphite powders by using counter-flow injection (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Yonghyun Cho, Kwangsu Kim, Jaeho Cho 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HH02-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 参照...bon nanotube reinforced Cu matri......Particle paths in three-dimensio......of study: Opposing jet mixing system Electr......thod for Producing Spatially Uniform Aerosols in a Low Pressure......rties of poly(vinyl butyral)/TiO......ion and growth in single-stage aeros......anoparticles Using SiH4 Pyrolysi......re Study of mixing and chemical reaction in RIM A numerica......of flow and mixing characteristics of laminar confined impinging streams A met......h energy multiring-type mill Ult......y particle coating for improving the flowability of cohesive ...

Effect of temperature/humidity treatment conditions on interfacial adhesion energy between inkjet-printed Ag and polyimide (Special issue: Recent advances in dry process and related technologies)

Effect of temperature/humidity treatment conditions on interfacial adhesion energy between inkjet-printed Ag and polyimide (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Sung-Cheol Park, Young-Bae Park<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HL02-1～6
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765

Etching characteristics of VO2 thin films using inductively coupled Cl2/Ar plasma (Special issue: Recent advances in dry process and related technologies)

Etching characteristics of VO2 thin films using inductively coupled Cl2/Ar plasma (Special issue: Recent advances in dry process and related technologies)
デジタル記事
Yong-Hyun Ham, Alexander Efremov, Nam-Ki Min 他<Z53-A375>Japanese journal of applied physics : JJAP48(8) (2) 2009.8p.08HD04-1～5
インターネットで読める国立国会図書館全国の図書館
  • 掲載誌（国立国会図書館永続的識別子）info:ndljp/pid/11226765
  • 著者標目Yong-Hyun Ham Alexander Efremov Nam-Ki Min