検索結果 15 件
紙デジタル記事
国立国会図書館全国の図書館
- 要約等...dvanced resist materials which I have b......en involved in for more than a qu......ft-off process for fabrication of......esistive heads for storage device......hen to 193 nm) for higher resolut......esist invented for 1 μm resolutio......ivotal role in microlithography in the foreseeable future.
- 参照...able processes for edible pharmac......sitive Low CTE Materials Self-Consisten......al Development for Fine Patternin......ion Polyesters for EUV Lithograph...... Self Assembly Materials for Semiconductor ......ion Polyethers for EUV Lithography
- 参照...lecular resist for deep UV lithog......hous molecular materials—molecular desi......hous Molecular Materials A Positive-Wor......gh Sensitivity for Nanometer Lithography Materials for future lithogr......ositive resist for projection lit......e mid‐UV Glass Formation and Phas......se Vinyl ether formulations for step and flash......tion Inhibitor for the Design of ......et lithography for 500-nm devices......olefin resists for sub-100-nm lit......ign of Resists for Semiconductor ......eloping resist materials Kinetics, ther......s photoresists for advanced litho......loping high-performance 193-nm si......ent of high-performance 193-nm positive resist b...
紙デジタル記事
国立国会図書館全国の図書館
- 要約等...ist candidates for 157nm material......g 157nm resist materials based on the f......ithographic performance of some of these polymer...
- 参照...Fluoropolymers for 157-nm Resist Materials Fluoropolymer ......rption Spectra for Alicyclic and Heterocyclic Co...
デジタル記事
インターネットで読める全国の図書館
- 要約等...dvanced resist materials which I have b......en involved in for more than a qu......ft-off process for fabrication of......esistive heads for storage device......hen to 193 nm) for higher resolut......esist invented for 1 μm resolutio......ivotal role in microlithography in the foreseeable future.
デジタル記事
インターネットで読める全国の図書館
- 要約等...ist candidates for 157nm material......g 157nm resist materials based on the f......ithographic performance of some of these polymer...
デジタル記事
全国の図書館
- 参照Synthesis of Fluorinated Materials for 193-nm Immersi......Fluoropolymers for 157-nm Resist Materials Fluoropolymer ......polymer Resist for 157-nm Lithogr......ective Coating for 157-nm Lithography
デジタル記事
全国の図書館
- 件名Polymers and Plastics Materials Chemistry Organic Chemistry
紙図書
国立国会図書館全国の図書館
- 件名...-- Congresses. Microlithography -- Materials -- Congresses.......electronics -- Materials -- Congresses.
- 著者標目...n of Polymeric Materials: Science and Engineering. Ame...
紙図書
全国の図書館
- 件名... -- Congresses Microlithography -- Materials -- Congresses ......electronics -- Materials -- Congresses
- 件名（識別子）... -- Congresses Microlithography -- Materials -- Congresses ......electronics -- Materials -- Congresses
- 著者標目...n of Polymeric Materials : Science and Engineering Ame...
紙図書
国立国会図書館全国の図書館
- 内容細目...nd W.E. Spicer Microlithography with soft x ra......dulated source for fluorescence l......asurements and for time-resolved ......e in condensed materials / George S. Br......nce microprobe for chemical analysis / C.J. Spar...
デジタル記事
インターネットで読める全国の図書館
- 要約等...can be used to formulate chemical......plified resist materials have been prep......ds. All of the materials operate on the......le most of the materials also operate v......re. The resist materials are useful in dry development...
- 件名Materials Chemistry Organic Chemistry P...
デジタル文書・図像類
インターネットで読める全国の図書館
- 並列タイトル等（連結）The Study of Low Molecular‐Weight Resist Materials (LMR) for Microlithography
- 並列タイトル等The Study of Low Molecular‐Weight Resist Materials (LMR) for Microlithography
デジタル記事
全国の図書館
- 件名Polymers and Plastics Materials Chemistry Organic Chemistry
- 参照...quioxane A New Formation Process ......ydrolysates to Form High Molecular Weight Polyme...
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